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Effects of laser wavelength and fluence on the growth of ZnO thin films by pulsed laser deposition

https://doi.org/10.1016/0169-4332(94)00405-6
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23/23 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

4 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 23 checked references that resolve
resolves10.1016/0022-0248(94)90968-7
Growth of ZnO films on GaAs substrates with a SiO2 buffer layer by RF planar magnetron sputtering for surface acoustic wave applications
resolves10.1063/1.110913
Force sensing microcantilever using sputtered zinc oxide thin film
resolves10.1143/JJAP.33.L283
Metalorganic Chemical Vapor Deposition of ZnO Using D<sub>2</sub>O as Oxidant
resolves10.1016/0040-6090(94)90653-X
Aluminum-doped zinc oxide transparent conductors deposited by the sol-gel process
resolves10.1016/0040-6090(93)90364-U
Growth of textured ZnO:In thin films by chemical spray deposition
resolves10.1143/JJAP.29.334
Zinc Oxide Thin Films Prepared by the Electron-Cyclotron-Resonance Plasma Sputtering Method
resolves10.1063/1.354152
Dual-ion-beam sputter deposition of ZnO films
resolves10.1016/0040-6090(94)90230-5
Preparation of ZnO films by reactive evaporation
resolves10.1116/1.572219
Highly oriented ZnO films grown by laser evaporation
resolves10.1016/0039-6028(83)90486-7
Laser-induced sputtering of ZnO, TiO2, CdSe and GaP near threshold laser fluence
resolves10.1016/0040-6090(92)90554-O
Characterization of pulsed laser deposited zinc oxide
resolves10.1016/0040-6090(93)90769-L
Preparation of indium tin oxide films at room temperature by pulsed laser deposition
resolves10.1063/1.108278
Correlation between target-substrate distance and oxygen pressure in pulsed laser deposition of YBa2Cu3O7
resolves10.1063/1.352231
Low-temperature conductivity of ZnO films prepared by chemical vapor deposition
resolves10.1063/1.328618
Properties of zinc oxide films prepared by the oxidation of diethyl zinc
resolves10.1002/sia.740180107
X‐ray photoelectron spectroscopy analysis of copper and zinc oxides and sulphides
resolves10.1116/1.1312732
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings
resolves10.1016/0040-6090(91)90074-8
R.f. planar magnetron sputtered ZnO films I: Structural properties
resolves10.1364/AO.13.000274
Observation of Laser-induced Explosion of Solid Materials and Correlation with Theory
resolves10.1063/1.104118
Subsurface heating effects during pulsed laser evaporation of materials
resolves10.1016/0040-6090(94)90408-1
Peculiarities of laser melting and evaporation of superconducting ceramics
resolves10.1016/0040-6090(94)90412-X
Time-resolved measurements of plume shielding during ArF laser ablation of silicon
resolves10.1088/0022-3735/9/11/032
A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film
The 4 references without a DOI — listed, not checked
no DOI — not checked10.1016/0169-4332(94)00405-6_bib1
no DOI — not checked10.1016/0169-4332(94)00405-6_bib13
no DOI — not checked10.1016/0169-4332(94)00405-6_bib14
no DOI — not checkedV. Craciun, D. Craciun, J. Elders, J. Gardeniers and I.W. Boyd, unpublished.
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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