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A study of the picostructure of sputtered ZrN films
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31/31 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
4 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.
The 31 checked references that resolve
resolves10.1016/0257-8972(91)90052-X
On picostructural models of physically vapor-deposited films of titanium nitride
resolves10.1016/0257-8972(90)90114-R
Residual stress and strain distribution anomalies in TiN films deposited by physical vapor deposition
resolves10.1016/0257-8972(90)90077-P
Aspects of residual stress measurements in TiN prepared by reactive sputtering
resolves10.1016/0040-6090(82)90273-5
Optical constants and spectral selectivity of titanium carbonitrides
resolves10.1103/PhysRevB.28.3214
Vacancy effects in the x-ray photoelectron spectra of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi mathvariant="normal">Ti</mml:mi><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">N</mml:mi></mml:mrow><mml:mrow><mml:mi>x</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math>
resolves10.1016/0040-6090(89)90044-8
Residual stress in physically vapor deposited films: A study of deviations from elastic behavior
resolves10.1016/0257-8972(90)90171-8
Anomalies in the lattice parameters and residual stress of coatings made by physical vapor deposition methods
resolves10.1016/S0040-6090(05)80056-2
A contribution to the study of poisson's ratios and elasticconstants of TiN, ZrN and HfN
resolves10.1007/BF00774537
Modulus of normal elasticity of porosity-free titanium and zirconium nitrides
resolves10.1016/S0257-8972(89)80004-0
Influence of crystallographic orientation, residual strains, crystallite size and microhardness on erosion in ZrN coating
resolves10.1016/0257-8972(87)90176-9
Zirconium nitride films prepared by cathodic arc plasma deposition process
resolves10.1016/0257-8972(87)90182-4
Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings
resolves10.1016/0040-6090(80)90490-3
Tribological coatings deposited by red-hot rod target sputtering
resolves10.1016/0257-8972(90)90167-B
Improved corrosion resistance of physical vapour deposition coated TiN and ZrN
resolves10.1116/1.577428
Low-energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure
resolves10.1116/1.577596
Magnetic field and substrate position effects on the ion/deposition flux ratio in magnetron sputtering
resolves10.1116/1.573651
Reactively sputtered nitrides and carbides of titanium, zirconium, and hafnium
resolves10.1016/0257-8972(88)90002-3
Positron annihilation spectroscopy of the defect structure of sputter-deposited TiN
resolves10.1016/0042-207X(88)90172-8
Structure, properties and applications of TiN coatings produced by sputter ion plating
resolves10.1016/0040-6090(91)90220-R
X-ray elastic constants, stress profiling and composition of physically vapor deposited ZrN films
resolves10.1016/0040-6090(89)90622-6
The relationship between residual stress, X-ray elastic constants and lattice parameters in TiN films made by physical vapor deposition
resolves10.1016/0040-6090(88)90409-9
Positron lifetime study of vacancy defects in non- stoichiometric TiNx and TiCx films
The 4 references without a DOI — listed, not checked
no DOI — not checkedJ. P. Schaffer, A. J. Perry and J. Brunner, to be published.
no DOI — not checked10.1016/0257-8972(91)90053-Y_BIB13
no DOI — not checked10.1016/0257-8972(91)90053-Y_BIB32
no DOI — not checked10.1016/0257-8972(91)90053-Y_BIB33
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