Reference health
Atomic Layer Deposition
132/132 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
31 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.
The 132 checked references that resolve
resolves10.1063/1.1940727
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
resolves10.1063/1.4757907
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
resolves10.1149/1.3205051
ALD Applications Beyond Outside IC Technology - Existing and Emerging Possibilities
resolves10.1016/j.surfcoat.2007.05.009
Batch ALD: Characteristics, comparison with single wafer ALD, and examples
resolves10.1116/1.3609974
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
resolves10.1039/b810922b
Novel mixed alkylamido-cyclopentadienyl precursors for ALD of ZrO2 thin films
resolves10.1021/cm301594p
Novel Heteroleptic Precursors for Atomic Layer Deposition of TiO<sub>2</sub>
resolves10.1063/1.96930
Growth process in atomic layer epitaxy of Zn chalcogenide single crystalline films on (100)GaAs
resolves10.1063/1.336038
Effect of growth temperature on the electronic energy band and crystal structure of ZnS thin films grown using atomic layer epitaxy
resolves10.1021/ja8090388
Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium
resolves10.1149/1.1882012
Atomic Layer Deposition of Molybdenum Nitride Thin Films for Cu Metallizations
resolves10.1149/1.1401082
Atomic Layer Deposition of Ta(Al)N(C) Thin Films Using Trimethylaluminum as a Reducing Agent
resolves10.1016/S0040-6090(99)01076-7
Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction
resolves10.1063/1.2161117
Ultrahigh x-ray reflectivity from W∕Al2O3 multilayers fabricated using atomic layer deposition
resolves10.1149/1.1890726
Atomic Layer Deposition of Hexagonal-Phase Ta[sub 2]O[sub 5] Using TaF[sub 5] and H[sub 2]O
resolves10.1088/0953-2048/6/9/001
Chemical vapour deposition of high-T<sub>c</sub>superconducting thin films
resolves10.1063/1.2939102
Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications
resolves10.1016/S0169-4332(03)00175-2
Effect of annealing in processing of strontium titanate thin films by ALD
resolves10.1002/cvde.19970030404
Volatile Metal β‐Diketonates: ALE and CVD precursors for electroluminescent device thin films
resolves10.1002/cvde.200306288
Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)<sub>3</sub> and Oxygen
resolves10.1149/1.1595312
Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum
resolves10.1021/cm7030224
Atomic Layer Deposition of Iridium Oxide Thin Films from Ir(acac)<sub>3</sub> and Ozone
resolves10.1016/j.mseb.2004.12.081
Recent developments in the MOCVD and ALD of rare earth oxides and silicates
resolves10.1149/1.1648025
Atomic Layer Deposition of Strontium Tantalate Thin Films from Bimetallic Precursors and Water
resolves10.1002/1521-3862(20020903)8:5<199::AID-CVDE199>3.0.CO;2-U
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water
resolves10.1021/cm020357x
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
resolves10.1149/1.2825763
Atomic Layer Deposition of ZrO2 Thin Films with High Dielectric Constant on TiN Substrates
resolves10.1016/j.jcrysgro.2009.10.028
Growth and phase stabilization of HfO2 thin films by ALD using novel precursors
resolves10.1002/adem.200800316
Atomic Layer Deposition of High‐<i>k</i> Oxides of the Group 4 Metals for Memory Applications
resolves10.1557/jmr.2004.19.2.447
Atomic layer deposition of tantalum nitride for ultrathin liner applications in advanced copper metallization schemes
resolves10.1116/1.2345205
Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants
resolves10.1039/B405891G
Bismuth precursors for atomic layer deposition of bismuth-containing oxide films
resolves10.1116/1.3643349
Study of amorphous lithium silicate thin films grown by atomic layer deposition
resolves10.1021/ic0345424
Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates
resolves10.1021/cm050624+
Atomic Layer Deposition of Y<sub>2</sub>O<sub>3</sub> Thin Films from Yttrium Tris(<i>N</i>,<i>N</i>‘-diisopropylacetamidinate) and Water
resolves10.1002/ejic.201100262
Group 11 Amidinates and Guanidinates: Potential Precursors for Vapour Deposition
resolves10.1063/1.102337
Sequential surface chemical reaction limited growth of high quality Al2O3 dielectrics
resolves10.1016/0022-0248(88)90374-0
A novel atmospheric pressure technique for the deposition of ZnS by atomic layer epitaxy using dimethylzinc
resolves10.1016/S0022-0248(01)01759-6
Atomic layer deposition of ZnS thin films based on diethyl zinc and hydrogen sulfide
resolves10.1149/1.1390884
Growth of SrTiO[sub 3] and BaTiO[sub 3] Thin Films by Atomic Layer Deposition
resolves10.1016/j.jallcom.2005.10.061
Rare-earth oxide thin films for gate dielectrics in microelectronics
resolves10.1063/1.1630696
Structural and dielectric properties of thin ZrO2 films on silicon grown by atomic layer deposition from cyclopentadienyl precursor
resolves10.1149/1.2162447
HfO[sub 2] Films Grown by ALD Using Cyclopentadienyl-Type Precursors and H[sub 2]O or O[sub 3] as Oxygen Source
resolves10.1016/j.tsf.2011.11.088
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen
resolves10.1021/cm102904f
Atomic Layer Deposition of Antimony and its Compounds Using Dechlorosilylation Reactions of Tris(triethylsilyl)antimony
resolves10.1021/cm902180d
In Situ Reaction Mechanism Studies on Atomic Layer Deposition of Sb<sub>2</sub>Te<sub>3</sub> and GeTe from (Et<sub>3</sub>Si)<sub>2</sub>Te and Chlorides
resolves10.1063/1.2181651
Supercritical-carbon dioxide-assisted cyclic deposition of metal oxide and metal thin films
resolves10.1116/1.1887231
Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates
resolves10.1116/1.3670876
Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide
resolves10.1116/1.2753846
Deposition of TiN and HfO2 in a commercial 200mm remote plasma atomic layer deposition reactor
resolves10.1149/1.2737629
Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor
resolves10.1149/1.2344843
Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
resolves10.1116/1.3659699
Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
resolves10.1116/1.3670745
Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition
resolves10.1002/adma.201000766
High‐Speed Spatial Atomic‐Layer Deposition of Aluminum Oxide Layers for Solar Cell Passivation
resolves10.1016/S0169-4332(97)00307-3
Processing of catalysts by atomic layer epitaxy: modification of supports
resolves10.1088/0957-4484/16/7/010
Conformal nanocoating of zirconia nanoparticles by atomic layer deposition in a fluidized bed reactor
resolves10.1116/1.2393299
Rotary reactor for atomic layer deposition on large quantities of nanoparticles
resolves10.1016/0141-9382(92)90102-W
Thin-film electroluminescence: high performance without complexity
resolves10.1016/j.electacta.2012.12.007
Tantalum oxide nanocoatings prepared by atomic layer and filtered cathodic arc deposition for corrosion protection of steel: Comparative surface and electrochemical analysis
resolves10.1088/0268-1242/27/7/074002
Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing
resolves10.1002/adma.201200397
Emerging Applications of Atomic Layer Deposition for Lithium‐Ion Battery Studies
resolves10.1063/1.118898
Titanium oxide/aluminum oxide multilayer reflectors for “water-window” wavelengths
resolves10.1016/S0022-0248(97)00198-X
Atomic layer epitaxy of AlP and its application to X-ray multilayer mirror
resolves10.1016/S0040-6090(96)08890-6
Introducing atomic layer epitaxy for the deposition of optical thin films
resolves10.1116/1.2132326
Filling high aspect-ratio nano-structures by atomic layer deposition and its applications in nano-optic devices and integrations
resolves10.1002/adma.200501077
Conformally Back‐Filled, Non‐close‐packed Inverse‐Opal Photonic Crystals
resolves10.1063/1.1609240
High-filling-fraction inverted ZnS opals fabricated by atomic layer deposition
resolves10.1016/j.mee.2006.01.047
Free-standing inductive grid filter for infrared radiation rejection
resolves10.1109/LPT.2003.820484
Erbium-Doped Waveguides Fabricated With Atomic Layer Deposition Method
resolves10.1103/PhysRevLett.99.264801
Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics
resolves10.1016/S0169-4332(00)00205-1
Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reactions
resolves10.1021/cm050704d
Nucleation and Growth during Al<sub>2</sub>O<sub>3</sub> Atomic Layer Deposition on Polymers
resolves10.1149/1.1931471
Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition
resolves10.1002/cvde.200306289
Atomic Layer Deposition of Photocatalytic TiO<sub>2</sub> Thin Films from Titanium Tetramethoxide and Water
resolves10.1021/cm062576e
Atomic Layer Deposition of Nanostructured TiO<sub>2</sub> Photocatalysts via Template Approach
resolves10.1088/0022-3727/39/9/R01
Ultra-thin film encapsulation processes for micro-electro-mechanical devices and systems
resolves10.1063/1.1570926
Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices
resolves10.1016/j.actamat.2006.06.009
Growth, structure, and tribological behavior of atomic layer-deposited tungsten disulphide solid lubricant coatings with applications to MEMS
resolves10.1016/S0924-4247(02)00319-9
Atomic layer deposited protective coatings for micro-electromechanical systems
resolves10.1016/j.sna.2006.07.002
Alternative dielectric films for rf MEMS capacitive switches deposited using atomic layer deposited Al2O3/ZnO alloys
resolves10.1021/nl052453d
Atomic Layer Deposition on Suspended Single-Walled Carbon Nanotubes via Gas-Phase Noncovalent Functionalization
resolves10.1038/nature04796
Ge/Si nanowire heterostructures as high-performance field-effect transistors
resolves10.1002/adma.200305209
Al<sub>2</sub>O<sub>3</sub> Nanotubes Fabricated by Wet Etching of ZnO/Al<sub>2</sub>O<sub>3</sub> Core/Shell Nanofibers
resolves10.1021/nl060708x
Fabrication and Device Characterization of Omega-Shaped-Gate ZnO Nanowire Field-Effect Transistors
resolves10.1002/adma.200600728
Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self‐Assembled Polymeric Templates
resolves10.1021/ja0532887
Atomic Layer Deposition in Nanometer-Level Replication of Cellulosic Substances and Preparation of Photocatalytic TiO<sub>2</sub>/Cellulose Composites
resolves10.1016/j.msec.2006.06.006
Exploitation of atomic layer deposition for nanostructured materials
resolves10.1021/cm0303080
Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition
resolves10.1016/S0376-7388(99)00016-2
CVD modification and vapor/gas separation properties of nanoporous alumina membranes
resolves10.1016/j.mee.2006.10.085
Si/Al2O3/ZnO:Al capacitor arrays formed in electrochemically etched porous Si by atomic layer deposition
resolves10.1002/adma.200400446
Template‐Assisted Fabrication of Dense, Aligned Arrays of Titania Nanotubes with Well‐Controlled Dimensions on Substrates
resolves10.1063/1.2712057
Ferromagnetic nanotubes by atomic layer deposition in anodic alumina membranes
resolves10.1021/nl060413j
Atomic Layer Deposition on Biological Macromolecules: Metal Oxide Coating of Tobacco Mosaic Virus and Ferritin
resolves10.1021/nl061851t
Controlled Replication of Butterfly Wings for Achieving Tunable Photonic Properties
resolves10.1002/adma.200700079
Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
resolves10.1002/adma.201104129
Atomic Layer Deposition of Nanostructured Materials for Energy and Environmental Applications
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no DOI — not checkedJuppo, M. Ph.D. Thesis, University of Helsinki, 2001.
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no DOI — not checkedSchuisky, M. Ph.D. Thesis, University of Uppsala, 2000.
no DOI — not checkedSundqvist, J. Ph.D. Thesis, University of Uppsala, 2003.
no DOI — not checkedPilvi, T. Ph.D. Thesis, University of Helsinki, 2008.
no DOI — not checked10.1016/B978-0-08-096532-1.00401-5_bib63
no DOI — not checkedSuntola, T. S.; Pakkala, A. J.; Lindfors, S. G. U.S. Patent 4389973, 1983.
no DOI — not checkedSuntola, T. S.; Pakkala, A. J.; Lindfors, S. G. U.S. Patent 4413022, 1983.
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