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Structure and phase formation in Cu–Mn alloy thin films deposited at room temperature

https://doi.org/10.1016/j.actamat.2012.09.034
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18/18 checkable references clean · checked 2026-07-22

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

6 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 18 checked references that resolve
resolves10.1143/APEX.2.036503
Chemical Vapor Deposition of Mn and Mn Oxide and their Step Coverage and Diffusion Barrier Properties on Patterned Interconnect Structures
resolves10.1063/1.2750402
Growth behavior of self-formed barrier at Cu–Mn∕SiO2 interface at 250–450°C
resolves10.1063/1.1993759
Self-forming diffusion barrier layer in Cu–Mn alloy metallization
resolves10.1063/1.2773699
Growth kinetics and thermal stability of a self-formed barrier layer at Cu-Mn∕SiO2 interface
resolves10.1063/1.3068500
Phase identification of self-forming Cu–Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure
resolves10.1063/1.3569146
Interdiffusion and barrier layer formation in thermally evaporated Mn/Cu heterostructures on SiO2 substrates
resolves10.1361/105497198770342661
Cu-Mn (copper-manganese)
resolves10.1007/BF02652163
The cu-mn (copper-manganese) system
resolves10.1063/1.1707462
An X-Ray Study of the Copper-Manganese Binary Alloy System
resolves10.1088/0305-4608/11/1/008
A diffraction study of γ-Mn-Cu alloys
resolves10.1017/S1431927608080380
Electron Diffraction Based Analysis of Phase Fractions and Texture in Nanocrystalline Thin Films, Part I: Principles
resolves10.1016/S0040-6090(98)01760-X
Columnar growth structure and evolution of wavy interface morphology in amorphous and polycrystalline multilayered thin films
resolves10.1116/1.1601610
Microstructural evolution during film growth
resolves10.1017/S1431927611012803
Electron Diffraction Based Analysis of Phase Fractions and Texture in Nanocrystalline Thin Films, Part III: Application Examples
resolves10.1016/j.actamat.2006.06.002
The efficient cluster packing model – An atomic structural model for metallic glasses
resolves10.1021/j100812a027
THE DENSITY OF LIQUID COPPER FROM ITS MELTING POINT (1356°K.) TO 2500°K. AND AN ESTIMATE OF ITS CRITICAL CONSTANTS<sup>1,2</sup>
resolves10.1016/j.tsf.2009.12.095
Growth of nanocomposite in eutectic Cu–Ag films
resolves10.1016/j.jallcom.2008.07.187
Amorphous and nanocrystalline sputtered Mg–Cu thin films
The 6 references without a DOI — listed, not checked
no DOI — not checkedNational Physical Laboratory. <http://resource.npl.co.uk/mtdata/phdiagrams/cumn.htm>.
no DOI — not checked10.1016/j.actamat.2012.09.034_b0045
no DOI — not checked10.1016/j.actamat.2012.09.034_b0050
no DOI — not checked10.1016/j.actamat.2012.09.034_b0060
no DOI — not checked10.1016/j.actamat.2012.09.034_b0070
no DOI — not checked10.1016/j.actamat.2012.09.034_b0075
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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