Every reference with a DOI in the deposited reference list resolved to a known
work in Crossref or DataCite at the dated check, and none carried a retraction,
withdrawal, or removal notice.
The 68 checked references that resolve
resolves10.1063/1.124036Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon
resolves10.1063/1.1375018Physical and electrical characterization of ultrathin yttrium silicate insulators on silicon
resolves10.1063/1.2991340Performance enhancement of n-channel inversion type InxGa1−xAs metal-oxide-semiconductor field effect transistor using <i>ex situ</i> deposited thin amorphous silicon layer
resolves10.1063/1.2829586<i>In situ</i> H2S passivation of In0.53Ga0.47As∕InP metal-oxide-semiconductor capacitors with atomic-layer deposited HfO2 gate dielectric
resolves10.1149/1.1394112Chemical Etching Characteristics of GaAs(100) Surfaces in Aqueous HF Solutions
resolves10.1063/1.98415Nearly ideal electronic properties of sulfide coated GaAs surfaces
resolves10.1063/1.343316Comparison of surface properties of sodium sulfide and ammonium sulfide passivation of GaAs
resolves10.1088/1742-6596/100/4/042002Electrical and material characterization of atomic-layer-deposited Al<sub>2</sub>O<sub>3</sub> gate dielectric on ammonium sulfide treated GaAs substrates
resolves10.1063/1.348380Synchrotron radiation photoemission analysis for (NH4)2S<i>x</i>-treated GaAs
resolves10.1143/JJAP.30.L786Surface Structure of InAs (001) Treated with (NH<sub>4</sub>)<sub>2</sub>S<sub>x</sub> Solution
resolves10.1063/1.360074A mild electrochemical sulfur passivation method for GaAs(100) surfaces
resolves10.1109/TED.2007.900678Simplified Surface Preparation for GaAs Passivation Using Atomic Layer-Deposited High- $\kappa$ Dielectrics
resolves10.1149/1.1878032Wet Chemical Treatment in Hydrazine-Sulfide Solutions for Sulfide and Nitride Monomolecular Surface Films on GaAs(100)
resolves10.1149/1.2823454Improved Electrical Properties of Gd[sub 2]O[sub 3]∕GaAs Capacitor with Modified Wet-Chemical Clean and Sulfidization Procedures
resolves10.1149/1.2990714Performance Improvement of (NH[sub 4])[sub 2]S[sub x]-Treated III–V Compounds Multijunction Solar Cell Using Surface Treatment
resolves10.1063/1.2338751Hafnium oxide gate dielectrics on sulfur-passivated germanium
resolves10.1063/1.2838471Hf
O
2
gate dielectric on (NH4)2S passivated (100) GaAs grown by atomic layer deposition
resolves10.1063/1.2806190GaAs metal-oxide-semiconductor capacitors using atomic layer deposition of HfO2 gate dielectric: Fabrication and characterization
resolves10.1143/JJAP.47.3441Metamorphic In<sub>0.53</sub>Ga<sub>0.47</sub>As Metal–Oxide–Semiconductor Structure on a GaAs Substrate with ZrO<sub>2</sub> High-k Dielectrics
resolves10.1063/1.371682Barrier height enhancement of Ag/n-GaAs and Ag/n-InP Schottky diodes prepared by P2S5/(NH4)2Sx and HF treatments
resolves10.1016/j.susc.2008.12.009Surface electronic properties of sulfur-treated GaAs determined by surface photovoltage measurement and its computer simulation
resolves10.1002/pssa.200306773Effects of (NH4)2S passivation on the performance of graded-base InGaAs/InP HBTs
resolves10.1063/1.363130Photoluminescence and x-ray photoelectron spectroscopy study of S-passivated InGaAs(001)
resolves10.1063/1.121941Passivation of InGaAs surfaces and InGaAs/InP heterojunction bipolar transistors by sulfur treatment
resolves10.1016/0038-1101(95)00046-VA novel passivation technology of InGaAs surfaces using Si interface control layer and its application to field effect transistor
resolves10.1109/LED.2008.2008827High-Performance $\hbox{In}_{0.7}\hbox{Ga}_{0.3}\hbox{As}$ -Channel MOSFETs With High-$\kappa$ Gate Dielectrics and $\alpha$-Si Passivation
resolves10.1063/1.2363959InGaAs metal-oxide-semiconductor capacitors with HfO2 gate dielectric grown by atomic-layer deposition
resolves10.1063/1.2920438Self-aligned n-channel metal-oxide-semiconductor field effect transistor on high-indium-content In0.53Ga0.47As and InP using physical vapor deposition HfO2 and silicon interface passivation layer
resolves10.1063/1.3054348Half-cycle atomic layer deposition reaction studies of Al2O3 on (NH4)2S passivated GaAs(100) surfaces
resolves10.1103/PhysRevB.53.4604Sulfide-passivated GaAs(001). I. Chemistry analysis by photoemission and reflectance anisotropy spectroscopies
resolves10.1063/1.2764438Impact of surface chemical treatment on capacitance-voltage characteristics of GaAs metal-oxide-semiconductor capacitors with Al2O3 gate dielectric
resolves10.1103/PhysRevB.50.14237Photoelectron core-level spectroscopy and scanning-tunneling-microscopy study of the sulfur-treated GaAs(100) surface
resolves10.1063/1.3089688Temperature and frequency dependent electrical characterization of HfO2/InxGa1−xAs interfaces using capacitance-voltage and conductance methods
resolves10.1063/1.2901167Effects of interfacial sulfidization and thermal annealing on the electrical properties of an atomic-layer-deposited Al2O3 gate dielectric on GaAs substrate
resolves10.1063/1.1873037Deoxidation of gallium arsenide surface via silicon overlayer: A study on the evolution of the interface state density
resolves10.1063/1.3120546Detection of Ga suboxides and their impact on III-V passivation and Fermi-level pinning
resolves10.1063/1.1494123Electron spin resonance study of interface defects in atomic layer deposited hafnium oxide on Si
resolves10.1109/TED.2009.2016027Effect of Parasitic Resistance and Capacitance on Performance of InGaAs HEMT Digital Logic Circuits
resolves10.1149/1.2981608In-Situ Studies of Interfacial Bonding of High-k Dielectrics for CMOS Beyond 22nm
resolves10.1063/1.2432410<scp>WSXM</scp>: A software for scanning probe microscopy and a tool for nanotechnology
resolves10.1103/PhysRevB.61.12988Geometrical structure of the<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mfrac><mml:mrow><mml:mn>1</mml:mn></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:mfrac><mml:mo>−</mml:mo><mml:mi mathvariant="normal">M</mml:mi><mml:mi mathvariant="normal">L</mml:mi></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mo>(</mml:mo><mml:mn>2</mml:mn><mml:mn/><mml:mo>×</mml:mo><mml:mn>1</mml:mn><mml:mo>)</mml:mo></mml:math>and<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mfrac><mml:mrow><mml:mn>1</mml:mn></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:mfrac><mml:mo>−</mml:mo><mml:mi mathvariant="normal">M</mml:mi><mml:mi mathvariant="normal">L</mml:mi></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mo>(</mml:mo><mml:mn>2</mml:mn><mml:mn/><mml:mo>×</mml:mo><mml:mn>3</mml:mn><mml:mo>)</mml:mo></mml:math>Ba/Si(001) interfaces
resolves10.1063/1.3475499Identification and thermal stability of the native oxides on InGaAs using synchrotron radiation based photoemission
resolves10.1063/1.3249577The significance of core-level electron binding energies on the proper analysis of InGaAs interfacial bonding
resolves10.1063/1.2931031In0.53Ga0.47As based metal oxide semiconductor capacitors with atomic layer deposition ZrO2 gate oxide demonstrating low gate leakage current and equivalent oxide thickness less than 1nm
resolves10.1116/1.1532737Preparation of clean GaAs(100) studied by synchrotron radiation photoemission
resolves10.1016/j.apsusc.2004.01.067Synchrotron photoemission spectroscopy study of ammonium hydroxide etching to prepare well-ordered GaAs(1 0 0) surfaces
resolves10.1143/JJAP.31.L721Characterization of Oxidized GaAs (001) Surfaces Using Temperature Programed Desorption and X-Ray Photoelectron Spectroscopy
resolves10.1063/1.114636Chemical bonding and structure of the sulfur treated GaAs(111)B surface
resolves10.1063/1.101780Vacuum ultraviolet photoelectron spectroscopy of (NH4)2S-treated GaAs (100) surfaces
resolves10.1149/1.3375606(NH<sub>4</sub>)<sub>2</sub>S Passivation of High-k/In<sub>0.53</sub>Ga<sub>0.47</sub>As Interfaces: A Systematic Study of (NH<sub>4</sub>)<sub>2</sub>S Concentration
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