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Transparent conductive Tb-doped ZnO films prepared by rf reactive magnetron sputtering

https://doi.org/10.1016/j.matlet.2005.02.062

16/16 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

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The 16 checked references that resolve

resolves10.1016/S0040-6090(99)00158-3

Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering

resolves10.1116/1.1340659

Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol–gel process

resolves10.1016/S0042-207X(01)00323-2

Performances presented by zinc oxide thin films deposited by r.f. magnetron sputtering

resolves10.1143/JJAP.23.L280

Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

resolves10.1063/1.1320032

Transparent conducting films of ZnO–ZrO2: Structure and properties

resolves10.1143/JJAP.30.L441

Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor Deposition

resolves10.1063/1.349258

The effects of deposition rate on the structural and electrical properties of ZnO:Al films deposited on (112̄0) oriented sapphire substrates

resolves10.1063/1.351977

Atmospheric pressure chemical vapor deposition of gallium doped zinc oxide thin films from diethyl zinc, water, and triethyl gallium

resolves10.1016/0040-6090(91)90067-8

Studies on electron transport properties and the Burstein-Moss shift in indium-doped ZnO films

resolves10.1016/0040-6090(94)90736-6

Aluminium content dependence of milky transparent conducting ZnO:Al films with textured surface prepared by d.c. magnetron sputtering

resolves10.1016/0040-6090(90)90223-Z

Optical and electrical properties of Ga2O3-doped ZnO films prepared by r.f. sputtering

resolves10.1023/A:1008961314500

Effect of mixing ratio and pH on the reaction between Ca4(PO4)2O and CaHPO4

resolves10.1016/0040-6090(91)90472-A

Grain boundary scattering in aluminium-doped ZnO films

resolves10.1016/S0040-6090(00)01891-5

The effect of deposition temperature on the properties of Al-doped zinc oxide thin films

resolves10.1143/JJAP.25.L776

Highly Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

resolves10.1143/JJAP.24.L781

Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

The 1 reference without a DOI — listed, not checked

no DOI — not checked10.1016/j.matlet.2005.02.062_bib11

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