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Mechanistic details of atomic layer deposition (ALD) processes for metal nitride film growth
61/61 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
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The 61 checked references that resolve
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Atomic layer deposition of tungsten disulphide solid lubricant thin films
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Self‐Limited Pore Size Reduction of Mesoporous Silica Membranes via Pyridine‐Catalyzed Silicon Dioxide ALD
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Chemical Vapor Deposition Methods for the Controlled Preparation of Supported Catalytic Materials
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Surface characteristics and activity in selective oxidation of -xylene of supported VO catalysts prepared by standard impregnation and atomic layer deposition
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AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin‐Film Processing
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A study of ZnTe films grown on glass substrates using an atomic layer evaporation method
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Atomic layer epitaxy of III–V compounds using metalorganic and hydride sources
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A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches
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Measurements of Electron-Transfer Rates of Charge-Storage Molecular Monolayers on Si(100). Toward Hybrid Molecular/Semiconductor Information Storage Devices
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Surface Chemistry in the Atomic Layer Deposition of TiN Films from TiCl<sub>4</sub> and Ammonia
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TiN Diffusion Barrier Grown by Atomic Layer Deposition Method for Cu Metallization
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Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition
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<i>Tert</i>-butylamine and Allylamine as Reductive Nitrogen Sources in Atomic Layer Deposition of TaN Thin Films
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A comparative study of the diffusion barrier properties of TiN and ZrN
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Influence of the preferred orientation and thickness of zirconium nitride films on the diffusion property in copper
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The 17 references without a DOI — listed, not checked
no DOI — not checked10.1016/j.molcata.2007.06.010_bib6
no DOI — not checked10.1016/j.molcata.2007.06.010_bib7
no DOI — not checked10.1016/j.molcata.2007.06.010_bib8
no DOI — not checked10.1016/j.molcata.2007.06.010_bib11
no DOI — not checked10.1016/j.molcata.2007.06.010_bib12
no DOI — not checked10.1016/j.molcata.2007.06.010_bib14
no DOI — not checked10.1016/j.molcata.2007.06.010_bib18
no DOI — not checked10.1016/j.molcata.2007.06.010_bib19
no DOI — not checked10.1016/j.molcata.2007.06.010_bib29
no DOI — not checked10.1016/j.molcata.2007.06.010_bib36
no DOI — not checked10.1016/j.molcata.2007.06.010_bib43
no DOI — not checked10.1016/j.molcata.2007.06.010_bib46
no DOI — not checked10.1016/j.molcata.2007.06.010_bib57
no DOI — not checked10.1016/j.molcata.2007.06.010_bib61
no DOI — not checked10.1016/j.molcata.2007.06.010_bib65
no DOI — not checked10.1016/j.molcata.2007.06.010_bib67
no DOI — not checked10.1016/j.molcata.2007.06.010_bib77
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