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Towards the implementation of atomic layer deposited In2O3:H in silicon heterojunction solar cells

https://doi.org/10.1016/j.solmat.2017.01.011
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36/36 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

The 36 checked references that resolve
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Reduction of Optical Loss in Hydrogenated Amorphous Silicon/Crystalline Silicon Heterojunction Solar Cells by High-Mobility Hydrogen-Doped In<sub>2</sub>O<sub>3</sub>Transparent Conductive Oxide
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Hydrogenated indium oxide window layers for high-efficiency Cu(In,Ga)Se2 solar cells
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Potential gain in photocurrent generation for Cu(In,Ga)Se<sub>2</sub> solar cells by using In<sub>2</sub>O<sub>3</sub> as a transparent conductive oxide layer
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Influence of transparent conductive oxides on passivation of a-Si:H/c-Si heterojunctions as studied by atomic layer deposited Al-doped ZnO
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resolves10.1021/cm103637t
Indium Oxide Atomic Layer Deposition Facilitated by the Synergy between Oxygen and Water
resolves10.1021/acsami.5b04420
Electron Scattering and Doping Mechanisms in Solid-Phase-Crystallized In<sub>2</sub>O<sub>3</sub>:H Prepared by Atomic Layer Deposition
resolves10.1103/PhysRev.136.B864
Inhomogeneous Electron Gas
resolves10.1103/PhysRev.140.A1133
Self-Consistent Equations Including Exchange and Correlation Effects
resolves10.1103/PhysRevLett.77.3865
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resolves10.1039/B701176H
Structure and stability of the (001) α-quartz surface
resolves10.1063/1.2832630
An experimental study of charge distribution in crystalline and amorphous Si nanoclusters in thin silica films
resolves10.1103/PhysRevB.38.6084
Microscopic structure of the<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">SiO</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>/Si interface
resolves10.1063/1.94565
Probing the transition layer at the SiO2-Si interface using core level photoemission
resolves10.1063/1.4941298
<i>In situ</i> photoluminescence study of plasma-induced damage at the <i>a</i>-Si:H/c-Si interface
resolves10.1063/1.2913320
Staebler–Wronski-like formation of defects at the amorphous-silicon–crystalline silicon interface during illumination
resolves10.1103/PhysRevB.83.233301
Very fast light-induced degradation of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi>a</mml:mi></mml:mrow></mml:math>-Si:H/<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi>c</mml:mi></mml:mrow></mml:math>-Si(100) interfaces
resolves10.1063/1.3601485
Effect of ion bombardment on the a-Si:H based surface passivation of c-Si surfaces
resolves10.1149/1.3552663
Ion and Photon Surface Interaction during Remote Plasma ALD of Metal Oxides
resolves10.1063/1.2432297
Abruptness of a-Si:H∕c-Si interface revealed by carrier lifetime measurements
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