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Plasma characteristics of 355 nm and 532 nm laser deposition of Al-doped ZnO films

https://doi.org/10.1016/j.surfcoat.2016.03.087
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Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

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The 26 checked references that resolve
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Effects of oxygen pressure on n-ZnO/p-Si heterojunctions fabricated using pulsed laser deposition
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Advantage of dual-confined plasmas over conventional and facing-target plasmas for improving transparent-conductive properties in Al doped ZnO thin films
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Study of Plasma Properties for the Low‐Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering
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Optical Design and Fabrication of Fully Sputtered CdTe/CdS Solar Cells
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The 2 references without a DOI — listed, not checked
no DOI — not checkedLow temperature growth of undoped and Al-doped ZnO films by pulsed laser deposition
no DOI — not checked10.1016/j.surfcoat.2016.03.087_bb0110
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