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The Endocyclic Carbon Substituent of Guanidinate and Amidinate Precursors Controlling Atomic Layer Deposition of InN Films

https://doi.org/10.1021/acs.jpcc.9b07005
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30/30 checkable references clean · checked 2026-07-24

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

3 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 30 checked references that resolve
resolves10.1063/1.1595135
Indium nitride (InN): A review on growth, characterization, and properties
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Recent advances in the MOVPE growth of indium nitride
resolves10.1021/acs.jpcc.9b00482
Methylamines as Nitrogen Precursors in Chemical Vapor Deposition of Gallium Nitride
resolves10.1021/cg3016172
Epitaxial Growth of Cubic and Hexagonal InN Thin Films via Plasma-Assisted Atomic Layer Epitaxy
resolves10.1063/1.4946786
Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100)
resolves10.1116/1.5079279
Atomic layer deposition of InN using trimethylindium and ammonia plasma
resolves10.1039/C3DT52746H
Indium-tris-guanidinates: a promising class of precursors for water assisted atomic layer deposition of In <sub>2</sub> O <sub>3</sub> thin films
resolves10.1002/chem.201802317
Obtaining a Low and Wide Atomic Layer Deposition Window (150–275 °C) for In<sub>2</sub>O<sub>3</sub> Films Using an In<sup>III</sup> Amidinate and H<sub>2</sub>O
resolves10.1039/C7DT01280B
New amidinate complexes of indium( <scp>iii</scp> ): promising CVD precursors for transparent and conductive In <sub>2</sub> O <sub>3</sub> thin films
resolves10.1116/1.5002634
Thermal study of an indium trisguanidinate as a possible indium nitride precursor
resolves10.1021/am501331w
Oxygen-Free Atomic Layer Deposition of Indium Sulfide
resolves10.1063/1.464913
Density-functional thermochemistry. III. The role of exact exchange
resolves10.1103/PhysRevB.37.785
Development of the Colle-Salvetti correlation-energy formula into a functional of the electron density
resolves10.1063/1.3382344
A consistent and accurate<i>ab initio</i>parametrization of density functional dispersion correction (DFT-D) for the 94 elements H-Pu
resolves10.1016/0927-0256(96)00008-0
Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set
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Efficient iterative schemes for<i>ab initio</i>total-energy calculations using a plane-wave basis set
resolves10.1063/1.2841941
Optimization methods for finding minimum energy paths
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From ultrasoft pseudopotentials to the projector augmented-wave method
resolves10.1143/JPSJ.59.3455
A New Slab Model Approach for Electronic Structure Calculation of Polar Semiconductor Surface
resolves10.1016/0042-207X(88)90004-8
Nucleation and growth of thin films
resolves10.1103/PhysRevB.76.075313
In adlayers on<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>c</mml:mi></mml:math>-plane InN surfaces: A polarity-dependent study by x-ray photoemission spectroscopy
resolves10.1103/PhysRevLett.101.106803
Absence of Fermi-Level Pinning at Cleaved Nonpolar InN Surfaces
resolves10.1063/1.3238286
Surface structure and chemical states of a-plane and c-plane InN films
resolves10.1016/j.actamat.2006.07.031
Raman study of gap mode and lattice disorder effect in InN films prepared by plasma-assisted molecular beam epitaxy
resolves10.1016/j.ccr.2013.03.015
Amidinates, guanidinates and iminopyrrolidinates: Understanding precursor thermolysis to design a better ligand
The 3 references without a DOI — listed, not checked
no DOI — not checkedFrisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Scalmani, G.; Barone, V.; Petersson, G. A.; Nakatsuji, H. Gaussian 16, Revision B.01 ; Gaussian, Inc: Wallingford CT 2016.
no DOI — not checkedCRC Handbook of Chemistry and Physics
no DOI — not checkedMaterials Science and Engineering 8th Edition ISV with WileyPLUS Set
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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