Every reference with a DOI in the deposited reference list resolved to a known
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The 42 checked references that resolve
resolves10.1038/20148Electronic mechanism of hardness enhancement in transition-metal carbonitrides
resolves10.1063/1.2178394Structural and mechanical properties of TaZrN films: Experimental and <i>ab initio</i> studies
resolves10.1016/j.actamat.2018.04.033Valence electron concentration as an indicator for mechanical properties in rocksalt structure nitrides, carbides and carbonitrides
resolves10.1007/BF00810062Lattice parameters and thermal expansion of ?-VN1?x from 298?1000 K
resolves10.1103/PhysRevB.81.104107Electronic mechanism for toughness enhancement in<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mtext>Ti</mml:mtext></mml:mrow><mml:mi>x</mml:mi></mml:msub><mml:msub><mml:mi>M</mml:mi><mml:mrow><mml:mn>1</mml:mn><mml:mo>−</mml:mo><mml:mi>x</mml:mi></mml:mrow></mml:msub><mml:mtext>N</mml:mtext></mml:mrow></mml:math>(<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi>M</mml:mi><mml:mo>=</mml:mo><mml:mtext>Mo</mml:mtext></mml:mrow></mml:math>and W)
resolves10.1007/s11837-013-0676-2Improved Diffusion-Resistant Ability of Multicomponent Nitrides: From Unitary TiN to Senary High-Entropy (TiTaCrZrAlRu)N
resolves10.1016/j.matdes.2012.11.001Dense and smooth amorphous films of multicomponent FeCoNiCuVZrAl high-entropy alloy deposited by direct current magnetron sputtering
resolves10.1134/S1063785012070127Reproducibility of the single-phase structural state of the multielement high-entropy Ti-V-Zr-Nb-Hf system and related superhard nitrides formed by the vacuum-arc method
resolves10.1134/S1063784215080228Influence of residual pressure and ion implantation on the structure, elemental composition, and properties of (TiZrAlYNb)N nitrides
resolves10.3390/e20090624Effects of Nitrogen Content on the Structure and Mechanical Properties of (Al0.5CrFeNiTi0.25)Nx High-Entropy Films by Reactive Sputtering
resolves10.3390/e18060226Nano-Crystallization of High-Entropy Amorphous NbTiAlSiWxNy Films Prepared by Magnetron Sputtering
resolves10.1002/adma.201707512Mechanochemical‐Assisted Synthesis of High‐Entropy Metal Nitride via a Soft Urea Strategy
resolves10.1116/1.3426296Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti–Zr–N and Ti–Ta–N
resolves10.3103/S106345761306004XThe effect of the deposition parameters of nitrides of high-entropy alloys (TiZrHfVNb)N on their structure, composition, mechanical and tribological properties
resolves10.1063/1.368137Enhanced mechanical hardness in epitaxial nonisostructural Mo/NbN and W/NbN superlattices
resolves10.1063/1.2956594Hardness of covalent compounds: Roles of metallic component and d valence electrons
resolves10.1103/PhysRevB.84.045115Formation enthalpies by mixing GGA and GGA<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mo>+</mml:mo></mml:mrow></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi>U</mml:mi></mml:mrow></mml:math>calculations
resolves10.1021/cm702327gLi−Fe−P−O<sub>2</sub> Phase Diagram from First Principles Calculations
resolves10.1016/j.elecom.2010.01.010Thermal stabilities of delithiated olivine MPO4 (M=Fe, Mn) cathodes investigated using first principles calculations
resolves10.1107/S0108768102006948New developments in the Inorganic Crystal Structure Database (ICSD): accessibility in support of materials research and design
resolves10.1016/j.commatsci.2014.10.037The Materials Application Programming Interface (API): A simple, flexible and efficient API for materials data based on REpresentational State Transfer (REST) principles
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