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Direct fabrication of graphene on SiO2 enabled by thin film stress engineering

https://doi.org/10.1038/srep05049
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42/42 checkable references clean · checked 2026-07-22

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

2 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 42 checked references that resolve
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Growth of Bilayer Graphene on Insulating Substrates
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Scalable and Direct Growth of Graphene Micro Ribbons on Dielectric Substrates
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Grain-boundary engineering markedly reduces susceptibility to intergranular hydrogen embrittlement in metallic materials
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The 2 references without a DOI — listed, not checked
no DOI — not checkedZhiping Xu & Markus, J. B. Interface structure and mechanics between graphene and metal substrates: a first-principles study. J. Phys.: Condens. Matter 22, 485301 (2010).
no DOI — not checkedHutchinson, J. W. Mixed mode cracking in layered materials. Adv. Appl. Mech. 29, 191 (1992).
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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