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Reference of Temperature and Time during tempering process for non-stoichiometric FTO films

https://doi.org/10.1038/srep15001
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18/18 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

4 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 18 checked references that resolve
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Preferential orientation of fluorine-doped SnO2 thin films: The effects of growth temperature
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Structural and optical properties and photoluminescence mechanism of fluorine-doped SnO2 films during the annealing process
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High Thermal Performance of SnO<sub>2</sub>:F Thin Transparent Heaters with Scattered Metal Nanodots
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Heat treatment and bending of low- E glass
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Characteristics of electron beam evaporated nanocrystalline SnO2 thin films annealed in air
resolves10.1016/j.tsf.2013.02.099
Effect of glass tempering on microstructure and functional properties of SnO2:F thin film prepared by atmosphere pressure chemical vapor deposition
resolves10.1016/j.matlet.2007.08.042
Effects of water on the structure and properties of F-doped SnO2 films
resolves10.1016/S0040-6090(01)01667-4
Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor
resolves10.1088/0022-3727/13/6/023
Electrical properties of undoped In<sub>2</sub>O<sub>3</sub>films prepared by reactive evaporation
resolves10.1016/j.tsf.2006.01.001
Structural, electrical and optical characteristics of SnO2:Sb thin films by ultrasonic spray pyrolysis
resolves10.1007/BF00356009
Effect of heavy doping in SnO2:F films
resolves10.1016/j.tsf.2009.02.109
Optical properties of SnO2:F films deposited by atmospheric pressure CVD
resolves10.1016/j.matlet.2012.07.055
Effects of heat treatment on the chemical states of O1s and Sn3d at the surface of SnOx:F films by APCVD
resolves10.1016/j.matlet.2014.07.012
Evolution of element distribution at the interface of FTO/SiO x C y films with X-ray photoelectron spectroscopy
resolves10.1016/S0040-6090(01)00982-8
XPS study of the L-CVD deposited SnO2 thin films exposed to oxygen and hydrogen
resolves10.1016/S0040-6090(97)00733-5
Annealing effects on opto-electronic properties of sputtered and thermally evaporated indium-tin-oxide films
resolves10.1016/0165-1633(87)90012-8
Evaluation and control of the properties of thin sputtered silver films for spectrally selective coatings
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The 4 references without a DOI — listed, not checked
no DOI — not checkedRenewable Energy World. Review Issue 2004–2005, 7, 86 (2004).
no DOI — not checkedYang, J. K. et al. Studies on the structural and electrical properties of F-doped SnO2 film prepared by APCVD. Appl. Surf. Sci. 257, 10499–10502 (2011).
no DOI — not checkedKwok, R. W. M. XPS Peak Fitting Program for WIN95/98 XPSPEAK Version 4.1, Department of Chemistry, The Chinese University of Hong Kong.
no DOI — not checkedWagner, C. D., Riggs, W. M., Davis, L. E., Moulder, J. F. & Mnilenberger, G. E. Handbook of X-Ray Photoelectron Spectros-copy, Perkin-Elmer, Eden Prairie, MN, 1979.
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