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Enhancement of Local Photovoltaic Current at Ferroelectric Domain Walls in BiFeO3

https://doi.org/10.1038/srep43070
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21/21 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

3 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 21 checked references that resolve
resolves10.1038/nmat2373
Conduction at domain walls in oxide multiferroics
resolves10.1103/PhysRevLett.105.197603
Domain Wall Conductivity in La-Doped<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mi>BiFeO</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:math>
resolves10.1103/PhysRevLett.107.127601
Conduction through 71° Domain Walls in<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mi>BiFeO</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:math>Thin Films
resolves10.1038/ncomms2839
Free-electron gas at charged domain walls in insulating BaTiO3
resolves10.1103/PhysRevB.81.224118
Landau theory of domain wall magnetoelectricity
resolves10.1002/adma.201402558
Spintronic Functionality of BiFeO<sub>3</sub> Domain Walls
resolves10.1103/RevModPhys.84.119
Domain wall nanoelectronics
resolves10.1038/nmat2114
Direct imaging of the spatial and energy distribution of nucleation centres in ferroelectric materials
resolves10.1038/ncomms4120
Stationary domain wall contribution to enhanced ferroelectric susceptibility
resolves10.1103/PhysRevLett.109.257602
Effect of 90° Domain Walls and Thermal Expansion Mismatch on the Pyroelectric Properties of Epitaxial<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:msub><mml:mi>PbZr</mml:mi><mml:mn>0.2</mml:mn></mml:msub><mml:msub><mml:mi>Ti</mml:mi><mml:mn>0.8</mml:mn></mml:msub><mml:msub><mml:mi mathvariant="bold">O</mml:mi><mml:mn>3</mml:mn></mml:msub></mml:math>Thin Films
resolves10.1038/nnano.2009.451
Above-bandgap voltages from ferroelectric photovoltaic devices
resolves10.1103/PhysRevLett.107.126805
Efficient Photovoltaic Current Generation at Ferroelectric Domain Walls
resolves10.1038/ncomms3835
Role of domain walls in the abnormal photovoltaic effect in BiFeO3
resolves10.1134/1.1387133
Bulk photovoltaic effect in noncentrosymmetric crystals
resolves10.1080/00150198508012774
Studies of optical damage in lithium niobate in the presence of thermal gradients
resolves10.1103/PhysRevLett.109.236601
First-Principles Calculation of the Bulk Photovoltaic Effect in Bismuth Ferrite
resolves10.1038/ncomms1261
Tip-enhanced photovoltaic effects in bismuth ferrite
resolves10.1007/s003400050175
Light-induced charge transport processes in photorefractive crystals I: Models and experimental methods
resolves10.1002/adma.201004143
Atomic‐Scale Evolution of Local Electronic Structure Across Multiferroic Domain Walls
resolves10.1103/PhysRevLett.95.247603
Depletion Layers and Domain Walls in Semiconducting Ferroelectric Thin Films
resolves10.1103/PhysRevB.85.045312
Domain wall conduction in multiaxial ferroelectrics
The 3 references without a DOI — listed, not checked
no DOI — not checkedBorkar H., Pal P., Barvat A., Tomar M., Gupta V., Scott J. F. & Kumar A. Optically Active Novel Lead-Free Relaxor Ferroelectrics. J. of Phys.: Condens. Matter 28, 265901 (2016).
no DOI — not checkedSturman, B. I. & Fridkin, V. M. Photovoltaic and Photo-refractive Effects in Noncentrosymmetric Materials. (Gordon and Breach Science Publisher, Philadelphia, Reading, Paris, Montreux, Tokyo, Melbourne, 1992).
no DOI — not checkedM. A. Lampert & P. Mark Current injection in solids. (Academic Press, New York, London, Toronto, SanFrancisco, (1970).
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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