Reference health
Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
20/20 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
3 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.
The 20 checked references that resolve
resolves10.1021/cm0608903
Ozone-Based Atomic Layer Deposition of Alumina from TMA: Growth, Morphology, and Reaction Mechanism
resolves10.1063/1.2357886
<i>In situ</i> reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3
resolves10.1116/1.577226
The reaction pathway for the growth of alumina on high surface area alumina and in ultrahigh vacuum by a reaction between trimethyl aluminum and water
resolves10.1016/0039-6028(94)00578-8
Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence
resolves10.1103/PhysRevB.68.161302
Atomic layer deposition of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Al</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>on H-passivated Si: <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi mathvariant="normal">Al</mml:mi><mml:mo>(</mml:mo><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">CH</mml:mi></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mo>)</mml:mo></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mi mathvariant="normal">OH</mml:mi></mml:math>surface reactions with<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi mathvariant="normal">H</mml:mi><mml:mo>/</mml:mo><mml:mi mathvariant="normal">S</mml:mi><mml:mi mathvariant="normal">i</mml:mi><mml:mn/><mml:mo>(</mml:mo><mml:mn>100</mml:mn><mml:mo>)</mml:mo><mml:mo>−</mml:mo><mml:mn>2</mml:mn><mml:mn/><mml:mo>×</mml:mo><mml:mn>1</mml:mn></mml:math>
resolves10.1063/1.2924406
Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
resolves10.1149/1.2737629
Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor
resolves10.1016/S0040-6090(00)00890-7
Effect of water dose on the atomic layer deposition rate of oxide thin films
resolves10.1016/S0040-6090(96)08934-1
Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry
resolves10.1016/j.tsf.2004.09.035
Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
resolves10.1063/1.2338776
Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers
resolves10.1063/1.1585129
Nucleation and interface formation mechanisms in atomic layer deposition of gate oxides
resolves10.1080/03602457808080878
Catalytic Aluminas: Surface Models and Characterization of Surface Sites
resolves10.1016/0920-5861(95)00163-8
A case study: surface chemistry and surface structure of catalytic aluminas, as studied by vibrational spectroscopy of adsorbed species
resolves10.1021/jp050766r
Diffuse Reflectance FTIR Study of the Interaction of Alumina Surfaces with Ozone and Water Vapor
resolves10.1021/la010103a
In Situ Quartz Crystal Microbalance and Quadrupole Mass Spectrometry Studies of Atomic Layer Deposition of Aluminum Oxide from Trimethylaluminum and Water
resolves10.1116/1.2905250
Plasma-assisted atomic layer deposition of Ta2O5 from alkylamide precursor and remote O2 plasma
The 3 references without a DOI — listed, not checked
no DOI — not checked2023073122204306200_c1
no DOI — not checkedProceedings of 6th International Conference on Atomic Layer Deposition
no DOI — not checkedProceedings of 7th International Conference on Atomic Layer Deposition
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carried a retraction notice at that time. It says nothing about the quality, findings,
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