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<i>In situ</i> x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O2 cryoetching process

https://doi.org/10.1063/1.3085957
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11/11 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

3 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 11 checked references that resolve
resolves10.1016/S0169-4332(00)00328-7
Plasma etching: principles, mechanisms, application to micro- and nano-technologies
resolves10.1109/JMEMS.2002.800928
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures
resolves10.1063/1.99382
Low-temperature reactive ion etching and microwave plasma etching of silicon
resolves10.1116/1.580939
Etching of Si at low temperatures using a SF6 reactive ion beam: Effect of the ion energy and current density
resolves10.1088/0960-1317/14/2/004
Passivation mechanisms in cryogenic SF<sub>6</sub>/O<sub>2</sub>etching process
resolves10.1149/1.2826280
Two Cryogenic Processes Involving SF[sub 6], O[sub 2], and SiF[sub 4] for Silicon Deep Etching
resolves10.1016/j.mee.2007.01.048
The passivation layer formation in the cryo-etching plasma process
resolves10.1116/1.2210946
Oxidation threshold in silicon etching at cryogenic temperatures
resolves10.1088/0022-3727/38/18/012
Silicon columnar microstructures induced by an SF<sub>6</sub>/O<sub>2</sub>plasma
resolves10.1063/1.2133896
Si O x F y passivation layer in silicon cryoetching
resolves10.1063/1.336133
Reaction of atomic fluorine with silicon
The 3 references without a DOI — listed, not checked
no DOI — not checkedF. Lärmer and A. Schilp, German Patent No. DE4241045 (23 June 1994).
no DOI — not checked2023062501234952300_c12
no DOI — not checkedPrinciples of Plasma Discharges and Materials Processing
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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