At the dated check, the references listed below either did not resolve in
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The 44 checked references that resolve
resolves10.1016/j.solmat.2017.06.024Exceeding conversion efficiency of 26% by heterojunction interdigitated back contact solar cell with thin film Si technology
resolves10.1143/jjap.31.3518Development of New a-Si/c-Si Heterojunction Solar Cells: ACJ-HIT (Artificially Constructed Junction-Heterojunction with Intrinsic Thin-Layer)
resolves10.1103/physrevb.76.035326Model for a-Si:H/c-Si interface recombination based on the amphoteric nature of silicon dangling bonds
resolves10.1063/1.3641899Improved amorphous/crystalline silicon interface passivation by hydrogen plasma treatment
resolves10.1063/1.3455900Interplay of amorphous silicon disorder and hydrogen content with interface defects in amorphous/crystalline silicon heterojunctions
resolves10.1063/1.2956668Stretched-exponential a-Si:H∕c-Si interface recombination decay
resolves10.1063/1.2783972Boron-doped a-Si:H∕c-Si interface passivation: Degradation mechanism
resolves10.1103/physrevb.85.113302Kinetics of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>a</mml:mi></mml:math>-Si:H bulk defect and<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>a</mml:mi></mml:math>-Si:H/<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>c</mml:mi></mml:math>-Si interface-state reduction
resolves10.1002/pip.2959Device physics underlying silicon heterojunction and passivating‐contact solar cells: A topical review
resolves10.1063/1.2432297Abruptness of a-Si:H∕c-Si interface revealed by carrier lifetime measurements
resolves10.1063/1.2426900Impact of epitaxial growth at the heterointerface of a-Si:H∕c-Si solar cells
resolves10.1016/j.tsf.2012.02.020Impact of a-Si:H hydrogen depth profiles on passivation properties in a-Si:H/c-Si heterojunctions
resolves10.1116/1.589798Secondary ion mass spectrometry depth profiling of ultralow-energy ion implants: Problems and solutions
resolves10.1063/1.334142Secondary ion mass spectrometry: Depth profiling of shallow As implants in silicon and silicon dioxide
resolves10.1063/1.2559975Effects of a-Si:H layer thicknesses on the performance of a-Si:H∕c-Si heterojunction solar cells
resolves10.1063/1.1457535Depth profiling of silicon–hydrogen bonding modes in amorphous and microcrystalline Si:H thin films by real-time infrared spectroscopy and spectroscopic ellipsometry
resolves10.1016/j.egypro.2017.09.310Recent developments in the industrial silicon heterojunction process chain enabling efficiencies up to 22.7%
resolves10.1016/j.egypro.2016.07.115Ozone-based Surface Conditioning Focused on an Improved Passivation for Silicon Heterojunction Solar Cells
resolves10.1016/j.apsusc.2012.03.170Electronic interface properties of silicon substrates after ozone based wet-chemical oxidation studied by SPV measurements
resolves10.1007/s10854-014-1925-zLow-temperature sintering properties of the screen-printed silver paste for a-Si:H/c-Si heterojunction solar cells
resolves10.1063/1.367101Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation
resolves10.1063/1.117723Contactless determination of current–voltage characteristics and minority-carrier lifetimes in semiconductors from quasi-steady-state photoconductance data
resolves10.3791/53452Quantification of Hydrogen Concentrations in Surface and Interface Layers and Bulk Materials through Depth Profiling with Nuclear Reaction Analysis
resolves10.1063/1.337144Investigation of the growth kinetics of glow-discharge hydrogenated amorphous silicon using a radical separation technique
resolves10.1103/physrevb.76.073202Relation of the<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi><mml:mo></mml:mo><mml:mi mathvariant="normal">H</mml:mi></mml:mrow></mml:math>stretching frequency to the nanostructural<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi><mml:mo></mml:mo><mml:mi mathvariant="normal">H</mml:mi></mml:mrow></mml:math>bulk environment
resolves10.1103/physrevlett.54.562Orientational Ordering and Melting of Molecular<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">H</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>in an<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>a</mml:mi></mml:math>-Si Matrix: NMR Studies
resolves10.1103/physrevb.83.195205Dielectric function of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi>a</mml:mi></mml:mrow></mml:math>-Si:H based on local network structures
resolves10.1103/physrevb.83.165314Band lineup in amorphous/crystalline silicon heterojunctions and the impact of hydrogen microstructure and topological disorder
resolves10.1103/physrevb.62.16808Hydrogen elimination model of the formation of hydrogen bonding structures during the growth of hydrogenated amorphous silicon by plasma CVD
resolves10.1063/1.4861404Amorphous silicon oxide window layers for high-efficiency silicon heterojunction solar cells
resolves10.1007/bf01016517Influence of plasma excitation frequency fora-Si:H thin film deposition
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