Every reference with a DOI in the deposited reference list resolved to a known
work in Crossref or DataCite at the dated check, and none carried a retraction,
withdrawal, or removal notice.
The 49 checked references that resolve
resolves10.1063/1.344051GaSb booster cells for over 30% efficient solar-cell stacks
resolves10.1109/16.822293Characterization and simulation of GaSb device-related properties
resolves10.1063/1.365356The physics and technology of gallium antimonide: An emerging optoelectronic material
resolves10.1109/16.902740Efficiency and power density potential of combustion-driven thermophotovoltaic systems using GaSb photovoltaic cells
resolves10.1139/p81-245Electron transport and conduction band structure of GaSb
resolves10.1103/PhysRev.95.51Some Properties of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>p</mml:mi></mml:math>-Type Gallium Antimonide between 15°K and 925°K
resolves10.1103/PhysRevB.19.3159Electrical transport mechanism in the conduction band of gallium antimonide studied from Hall-mobility and transverse-magnetoresistance measurements
resolves10.1016/0038-1101(94)00142-3Simulation of bandgap narrowing and incomplete ionization in strained Si1−xGex alloys on 〈001〉 Si substrate (for temperatures from 40 K up to 400 K)
resolves10.1109/T-ED.1982.20698Electron and hole mobilities in silicon as a function of concentration and temperature
resolves10.1063/1.372274Empirical low-field mobility model for III–V compounds applicable in device simulation codes
resolves10.1063/1.114974Temperature dependence of minority and majority carrier mobilities in degenerately doped GaAs
resolves10.1007/BF02651744Growth and characterization of undoped and N-type (Te) doped MOVPE grown gallium antimonide
resolves10.1063/1.337881GaSb films grown by vacuum chemical epitaxy using triethyl antimony and triethyl gallium sources
resolves10.1143/JJAP.17.2091Molecular Beam Epitaxy of GaSb and GaSb<sub><i>x</i></sub>As<sub>1-<i>x</i></sub>
resolves10.1007/BF02652109N- type doping of gallium antimonide and aluminum antimonide grown by molecular beam epitaxy using lead telluride as a tellurium dopant source
resolves10.1116/1.586767Molecular-beam epitaxial growth of high-mobility <i>n</i>-GaSb
resolves10.1103/PhysRev.96.576Electrical and Optical Properties of Intermetallic Compounds. II. Gallium Antimonide
resolves10.1103/PhysRev.121.1087Electrical Properties of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>n</mml:mi></mml:math>-Type GaSb
resolves10.1063/1.363135Carrier compensation and scattering mechanisms in <i>p</i>-GaSb
resolves10.1016/S0022-0248(96)00543-XPhotoluminescence and electrical properties of MOVPE-grown zinc-doped gallium antimonide on gallium arsenide
resolves10.1063/1.322626Concentration-dependent absorption and spontaneous emission of heavily doped GaAs
resolves10.1063/1.321330Concentration dependence of the absorption coefficient for <i>n</i>− and <i>p</i>−type GaAs between 1.3 and 1.6 eV
resolves10.1016/0927-0248(95)00082-8TPV cell IV curve testing with varying black body emission temperatures, intensities, and cell temperatures
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