Every reference with a DOI in the deposited reference list resolved to a known
work in Crossref or DataCite at the dated check, and none carried a retraction,
withdrawal, or removal notice.
The 69 checked references that resolve
resolves10.1063/1.119233Synthesis and control of conductivity of ultraviolet transmitting β-Ga2O3 single crystals
resolves10.1143/JJAP.47.8506Growth of β-Ga<sub>2</sub>O<sub>3</sub> Single Crystals by the Edge-Defined, Film Fed Growth Method
resolves10.1063/1.4945267Temperature-dependent capacitance–voltage and current–voltage characteristics of Pt/Ga2O3 (001) Schottky barrier diodes fabricated on <i>n</i>––Ga2O3 drift layers grown by halide vapor phase epitaxy
resolves10.1063/1.4821858Depletion-mode Ga2O3 metal-oxide-semiconductor field-effect transistors on β-Ga2O3 (010) substrates and temperature dependence of their device characteristics
resolves10.1063/1.3674287Gallium oxide (Ga2O3) metal-semiconductor field-effect transistors on single-crystal β-Ga2O3 (010) substrates
resolves10.1063/1.4879800High-voltage field effect transistors with wide-bandgap <i>β</i>-Ga2O3 nanomembranes
resolves10.1109/LED.2018.2830184Enhancement-Mode Ga<sub>2</sub>O<sub>3</sub> Vertical Transistors With Breakdown Voltage >1 kV
resolves10.1109/LED.2016.2635579High-Performance Depletion/Enhancement-ode $\beta$ -Ga2O3 on Insulator (GOOI) Field-Effect Transistors With Record Drain Currents of 600/450 mA/mm
resolves10.1109/LED.2018.2810858Schottky Barrier Rectifier Based on (100) $\beta$ -Ga<sub>2</sub>O<sub>3</sub> and its DC and AC Characteristics
resolves10.1109/LED.2017.2696986First Demonstration of Ga<sub>2</sub>O<sub>3</sub>Trench MOS-Type Schottky Barrier Diodes
resolves10.1021/ja01123a039Polymorphism of Ga<sub>2</sub>O<sub>3</sub> and the System Ga<sub>2</sub>O<sub>3</sub>—H<sub>2</sub>O
resolves10.1103/PhysRev.140.A316Optical Absorption and Photoconductivity in the Band Edge of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>β</mml:mi><mml:mo>−</mml:mo><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Ga</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>
resolves10.1063/1.3086392Surface morphology and electronic structure of bulk single crystal β-Ga2O3(100)
resolves10.7567/JJAP.55.1202BDStructural evaluation of defects in β-Ga<sub>2</sub>O<sub>3</sub> single crystals grown by edge-defined film-fed growth process
resolves10.1021/acs.inorgchem.6b02244Crystal Structure and Ferroelectric Properties of ε-Ga<sub>2</sub>O<sub>3</sub> Films Grown on (0001)-Sapphire
resolves10.1063/1.4950867Hexagonal phase-pure wide band gap ε-Ga2O3 films grown on 6H-SiC substrates by metal organic chemical vapor deposition
resolves10.1063/1.4986478Anisotropic thermal conductivity of β-Ga2O3 at elevated temperatures: Effect of Sn and Fe dopants
resolves10.7567/JJAP.52.051101Formation of Semi-Insulating Layers on Semiconducting β-Ga<sub>2</sub>O<sub>3</sub> Single Crystals by Thermal Oxidation
resolves10.1063/1.371289Role of oxygen vacancy defect states in the <i>n</i>-type conduction of β-Ga2O3
resolves10.1007/BF00324340H2-induced changes in electrical conductance of ?-Ga2O3 thin-film systems
resolves10.1007/s002160050379Decomposition of methane on polycrystalline thick films of Ga 2 O 3 investigated by thermal desorption spectroscopy with a mass spectrometer
resolves10.1063/1.4916078Anisotropic thermal conductivity in single crystal β-gallium oxide
resolves10.1088/0268-1242/30/2/024006Temperature-dependent thermal conductivity in Mg-doped and undoped<i>β</i>-Ga<sub>2</sub>O<sub>3</sub>bulk-crystals
resolves10.1063/1.4927742Lattice thermal conductivity in β-Ga2O3 from first principles
resolves10.7567/APEX.8.031101High-mobility β-Ga<sub>2</sub>O<sub>3</sub>($\bar{2}01$) single crystals grown by edge-defined film-fed growth method and their Schottky barrier diodes with Ni contact
resolves10.1039/C6RA14010FElectronic structure and optical property of metal-doped Ga
<sub>2</sub>
O
<sub>3</sub>
: a first principles study
resolves10.1063/1.4966999Characterization of channel temperature in Ga2O3 metal-oxide-semiconductor field-effect transistors by electrical measurements and thermal modeling
resolves10.1109/LED.2016.25681393.8-MV/cm Breakdown Strength of MOVPE-Grown Sn-Doped <inline-formula> <tex-math notation="LaTeX">$\beta $ </tex-math> </inline-formula>-Ga<sub>2</sub>O<sub>3</sub>MOSFETs
resolves10.7567/APEX.10.041101Enhancement-mode Ga<sub>2</sub>O<sub>3</sub> MOSFETs with Si-ion-implanted source and drain
resolves10.1063/1.4960651Effect of front and back gates on β-Ga2O3 nano-belt field-effect transistors
resolves10.1063/1.5018238High breakdown voltage quasi-two-dimensional β-Ga2O3 field-effect transistors with a boron nitride field plate
resolves10.1063/1.5000735β-Ga2O3 on insulator field-effect transistors with drain currents exceeding 1.5 A/mm and their self-heating effect
resolves10.1109/LED.2016.2609202Al2O3/ $\beta $ -Ga2O3(-201) Interface Improvement Through Piranha Pretreatment and Postdeposition Annealing
resolves10.7567/JJAP.55.1202B5Epitaxially grown crystalline Al<sub>2</sub>O<sub>3</sub> interlayer on β-Ga<sub>2</sub>O<sub>3</sub>(010) and its suppressed interface state density
resolves10.7567/JJAP.55.1202B6Epitaxial growth and electric properties of γ-Al<sub>2</sub>O<sub>3</sub>(110) films on β-Ga<sub>2</sub>O<sub>3</sub>(010) substrates
resolves10.1109/LED.2016.2570521Interface State Density in Atomic Layer Deposited SiO<sub>2</sub>/<inline-formula> <tex-math notation="LaTeX">$\beta $ </tex-math> </inline-formula>-Ga<sub>2</sub>O<sub>3</sub>(<inline-formula> <tex-math notation="LaTeX">$\bar {2}01$ </tex-math> </inline-formula>) MOSCAPs
resolves10.1063/1.4991400Temperature dependent quasi-static capacitance-voltage characterization of SiO2/β-Ga2O3 interface on different crystal orientations
resolves10.1063/1.5031183C-V and J-V investigation of HfO2/Al2O3 bilayer dielectrics MOSCAPs on (100) <i>β</i>-Ga2O3
resolves10.1109/LED.2018.2841899Charge Trapping in Al<sub>2</sub>O<sub>3</sub>/$\beta$ -Ga<sub>2</sub>O<sub>3</sub>-Based MOS Capacitors
resolves10.1007/s11664-016-5121-1Investigation of Different Metals as Ohmic Contacts to β-Ga2O3: Comparison and Analysis of Electrical Behavior, Morphology, and Other Physical Properties
resolves10.1063/1.4979789High pulsed current density <i>β</i>-Ga2O3 MOSFETs verified by an analytical model corrected for interface charge
resolves10.7567/APEX.10.124201Depletion-mode vertical Ga<sub>2</sub>O<sub>3</sub>trench MOSFETs fabricated using Ga<sub>2</sub>O<sub>3</sub>homoepitaxial films grown by halide vapor phase epitaxy
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