Reference health
Effect of the pulse bias voltage parameters on the properties and composition of ZrN coatings deposited by vacuum arc method
8/8 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
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The 8 checked references that resolve
resolves10.1016/j.surfcoat.2012.07.037
Superhard nanocrystalline Ti–Cu–N coatings deposited by vacuum arc evaporation of a sintered cathode
resolves10.17223/00213411/62/5/106
Synthesis of single-layer ZrN coatings by vacuum arc plasma-assisted method at filtration of plasma flow
resolves10.1134/S1063784216070252
Possibilities of structural engineering in multilayer vacuum-arc ZrN/CrN coatings by varying the nanolayer thickness and application of a bias potential
resolves10.1134/S1070363215050485
Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes
resolves10.1016/j.surfcoat.2018.02.064
Low-energy high-current plasma immersion implantation of nitrogen ions in plasma of non-self-sustained arc discharge with thermionic and hollow cathodes
resolves10.1007/s40195-017-0536-0
Effects of Substrate Pulse Bias Duty Cycle on the Microstructure and Mechanical Properties of Ti–Cu–N Films Deposited by Magnetic Field-Enhanced Arc Ion Plating
The 2 references without a DOI — listed, not checked
no DOI — not checkedJPCS_1347_1_012131bib1
no DOI — not checkedJPCS_1347_1_012131bib8
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checked 2026-07-23 — re-checked daily as this page is visited; titles and statuses come from Crossref and DataCite and are not part of the signed record
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