Reference health
Effect of thickness on optoelectronic properties of ITO thin films
36/36 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
16 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.
The 36 checked references that resolve
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An alternative approach for charge decay measurement to assess the suitability of materials
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The effects of various annealing regimes on the microstructure and physical properties of ITO (In2O3:Sn) thin films deposited by electron beam evaporation for solar energy applications
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Enhancement of optical transmittance and electrical resistivity of post-annealed ITO thin films RF sputtered on Si
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Thickness dependence of structural, electrical and optical properties of indium tin oxide (ITO) films deposited on PET substrates
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Electric field induced metal–insulator transition in VO2 thin film based on FTO/VO2/FTO structure
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Effects of an additional magnetic field in ITO thin film deposition by magnetron sputtering
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Effects of heat treatment on properties of ITO films prepared by rf magnetron sputtering
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Antistatic process of dielectric thin films using low pressure discharge plasma
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Thickness dependence of electrical properties of ITO film deposited on a plastic substrate by RF magnetron sputtering
resolves10.1016/j.solmat.2015.05.036
Work function and interface control of amorphous IZO electrodes by MoO3 layer grading for organic solar cells
resolves10.1016/j.apsusc.2018.01.318
The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films
resolves10.1016/j.apsusc.2007.07.080
ITO/Au/ITO multilayer thin films for transparent conducting electrode applications
resolves10.1016/j.apsusc.2019.05.106
The optical analyses of the multilayer transparent electrode and the formation of ITO/Mesh-Ag/ITO multilayers for enhancing an optical transmittance
resolves10.1016/j.ceramint.2019.05.143
Structure and physical properties evolution of ITO film during amorphous-crystalline transition using a highly effective annealing technique
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Influence of RF magnetron sputtering conditions on the properties of transparent conductive gallium-doped magnesium zinc oxide thin films
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A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film
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Properties of Indium Tin Oxide Thin Films Deposited on Polymer Substrates
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Characterization of the ITO/p-Si/Al contacts produced by thermal evaporation
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Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature
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Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low temperature
resolves10.1016/j.vacuum.2019.04.029
Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering
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Enhanced uniformity in electrical and optical properties of ITO thin films using a wide thermal annealing system
resolves10.1016/j.apsusc.2019.03.275
Optimization of low temperature RF-magnetron sputtering of indium tin oxide films for solar cell applications
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Determination of the thickness and optical constants of amorphous silicon
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Antireflective coatings on large scale substrates produced by reactive twin-magnetron sputtering
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Pulsed laser deposition of ITO nanorods in argon and OLED applications
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Structural, optical and electrical properties of DC sputtered indium saving indium-tin oxide (ITO) thin films
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Electrical and mechanical properties of antistatic PVC films containing multi-layer graphene
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High transmittance in IR region of conductive ITO/AZO multilayers deposited by RF magnetron sputtering
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Surface-dependent conductivity, transition type, and energy band structure in amorphous indium tin oxide films
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Influence of oxygen/argon reaction gas ratio on optical and electrical characteristics of amorphous IGZO thin films coated by HiPIMS process
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Synthesis and characterization of Sb-doped SnO2-(CeO2-TiO2) composite thin films deposited on glass substrates for antistatic electricity and UV-shielding
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Effect of ITO target crystallinity on the properties of sputtering deposited ITO films
The 16 references without a DOI — listed, not checked
no DOI — not checkedUser Manual for JCI-Graph
no DOI — not checkedUser Manual: JCI 176 Charge Measuring Sample Support
no DOI — not checkedUser Manual: JCI 155v5 Charge Decay Test Unit
no DOI — not checkedCorona charging of practical materials for charge decay measurements
no DOI — not checkedNew figure of merit
no DOI — not checkedScience and technology of nanostructured magnetic materials
no DOI — not checkedInternational Standard (2015), Electrostatics – Part 2-1: Measurement methods – Ability of materials and products to dissipate static electric charge, IEC 61340-2-1.
no DOI — not checkedX-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials
no DOI — not checkedIT0 films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering
no DOI — not checkedAmorphous to crystalline transition and optoelectronic properties of nanocrystalline indium tin oxide (ITO) films sputtered with high rf power at room temperature
no DOI — not checkedStudy of the morphological change of amorphous ITO films after temperature-humidity treatment
no DOI — not checkedA study of low temperature crystallization of amorphous thin film indium-tin-oxide
no DOI — not checkedThickness dependence of In2O3: Sn film growth
no DOI — not checkedSemiconductor Material and Device Characterization
no DOI — not checkedLarge scale antireflective coatings on glass produced by reactive magnetron sputtering
no DOI — not checkedIndium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature
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