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Two-Step Mesa Structure GaN p-n Diodes With Low ON-Resistance, High Breakdown Voltage, and Excellent Avalanche Capabilities

https://doi.org/10.1109/led.2019.2955720
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20/20 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

The 20 checked references that resolve
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Over 3.0 $\hbox{GW/cm}^{2}$ Figure-of-Merit GaN p-n Junction Diodes on Free-Standing GaN Substrates
resolves10.1109/TED.2013.2266664
High Voltage Vertical GaN p-n Diodes With Avalanche Capability
resolves10.1109/LED.2013.2294175
3.7 kV Vertical GaN PN Diodes
resolves10.1109/TED.2014.2360861
Vertical Power p-n Diodes Based on Bulk GaN
resolves10.1109/LED.2015.2456914
Avalanche Capability of Vertical GaN p-n Junctions on Bulk GaN Substrates
resolves10.1016/j.microrel.2015.07.012
Reliability studies of vertical GaN devices based on bulk GaN substrates
resolves10.1002/pssa.201700501
Direct Observation of High Current Density Area by Microscopic Electroluminescence Mapping in Vertical GaN p–n Junction Diodes
resolves10.7567/JJAP.57.04FG09
5.0 kV breakdown-voltage vertical GaN p–n junction diodes
resolves10.7567/1347-4065/ab0cfa
4.9 kV breakdown voltage vertical GaN p–n junction diodes with high avalanche capability
resolves10.1109/JQE.2009.2022046
Double Mesa Sidewall Silicon Carbide Avalanche Photodiode
resolves10.1088/1361-6463/aaaf9d
The 2018 GaN power electronics roadmap
resolves10.1007/978-3-642-04830-2
Technology of Gallium Nitride Crystal Growth
resolves10.1109/LED.2015.2478907
Vertical GaN p-n Junction Diodes With High Breakdown Voltages Over 4 kV
resolves10.7567/JJAP.52.028007
High-Breakdown-Voltage and Low-Specific-on-Resistance GaN p–n Junction Diodes on Free-Standing GaN Substrates Fabricated Through Low-Damage Field-Plate Process
resolves10.1109/LED.2015.2474817
4-kV and 2.8-$\text{m}\Omega $ -cm<sup>2</sup> Vertical GaN p-n Diodes With Low Leakage Currents
resolves10.1016/j.nimb.2017.05.034
Ion-irradiation damage on GaN p-n junction diodes by inductively coupled plasma etching and its recovery by thermal treatment
resolves10.1002/pssc.200674719
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resolves10.1016/j.jcrysgro.2007.10.014
Fabrication of 3-in GaN substrates by hydride vapor phase epitaxy using void-assisted separation method
resolves10.1002/pssa.201000976
Over 1.0 kV GaN <i>p</i>–<i>n</i> junction diodes on free‐standing GaN substrates
resolves10.5573/JSTS.2018.18.5.645
Gallium Nitride PIN Avalanche Photodiode with Double-step Mesa Structure
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