Reference health
Optical function of atomic layer deposited alumina (0.5–41.0 nm) from 191 to 1688 nm by spectroscopic ellipsometry with brief literature review
50/50 checkable references clean · checked 2026-07-23
Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.
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The 50 checked references that resolve
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Atomic layer deposition (ALD): from precursors to thin film structures
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Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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Applications of atomic layer deposition to nanofabrication and emerging nanodevices
resolves10.1016/j.ccr.2013.03.019
Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films
resolves10.1116/1.4795859
Effects of catalyst thickness on the fabrication and performance of carbon nanotube-templated thin layer chromatography plates
resolves10.1556/JPC.27.2014.3.1
Atomic layer deposition of aluminum-free silica onto patterned carbon nanotube forests in the preparation of microfabricated thin-layer chromatography plates
resolves10.1016/j.mattod.2014.04.026
A brief review of atomic layer deposition: from fundamentals to applications
resolves10.1016/j.tsf.2013.11.112
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
resolves10.1529/biophysj.106.099721
Effect of Surface Treatment on Diffusion and Domain Formation in Supported Lipid Bilayers
resolves10.1021/cm802195b
Atomic Layer Deposition of Aluminum Oxide Thin Films from a Heteroleptic, Amidinate-Containing Precursor
resolves10.1063/1.4868300
Growth of crystalline Al2O3 via thermal atomic layer deposition: Nanomaterial phase stabilization
resolves10.1116/1.4941918
Growth per cycle of alumina atomic layer deposition on nano- and micro-powders
resolves10.1016/j.surfcoat.2016.06.064
Atomic layer deposition of aluminum oxide on modified steel substrates
resolves10.1007/s10854-014-2111-z
Structure and refractive index of thin alumina films grown by atomic layer deposition
resolves10.1016/S0040-6090(01)01678-9
Thin film atomic layer deposition equipment for semiconductor processing
resolves10.1063/1.4922267
Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation
resolves10.1021/acsami.5b03598
Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)
resolves10.1021/acsomega.7b00443
Chemically Stable Atomic-Layer-Deposited Al<sub>2</sub>O<sub>3</sub> Films for Processability
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Structural Characterization by SIMS of Alumina Coatings on Stainless Steel
resolves10.1021/ed400401c
Assigning Oxidation States to Organic Compounds via Predictions from X-ray Photoelectron Spectroscopy: A Discussion of Approaches and Recommended Improvements
resolves10.1021/ac00163a024
Surface analysis: x-ray photoelectron spectroscopy and Auger electron spectroscopy
resolves10.1116/1.5043297
Tutorial on interpreting x-ray photoelectron spectroscopy survey spectra: Questions and answers on spectra from the atomic layer deposition of Al2O3 on silicon
resolves10.1021/acs.analchem.5b03181
Porous, High Capacity Coatings for Solid Phase Microextraction by Sputtering
resolves10.1364/AO.48.005407
Optical properties of Al_2O_3 thin films grown by atomic layer deposition
resolves10.1016/j.apsusc.2007.06.011
Optical and mechanical properties of alumina films fabricated on Kapton polymer by plasma immersion ion implantation and deposition using different biases
resolves10.2514/1.T4229
Optical Properties of Variable-Composition Aluminum/Alumina Thin Films, Part 1
resolves10.2514/1.T4230
Optical Properties of Variable-Composition Aluminum/Alumina Thin Films, Part 2
resolves10.1116/1.1577132
Microstructural and optical properties of aluminum oxide thin films prepared by off-plane filtered cathodic vacuum arc system
resolves10.1063/1.365643
The relationship between the distribution of electronic states and the optical absorption spectrum of an amorphous semiconductor: An empirical analysis
resolves10.1016/j.matlet.2013.03.049
The optical properties of alumina films prepared by electron beam evaporation at oblique incidence
resolves10.1016/j.tsf.2015.09.003
Optical properties of aluminum oxide thin films and colloidal nanostructures
resolves10.1016/S0040-6090(96)08855-4
Refractive index and adhesion of Al2O3 thin films obtained from different processes — a comparative study
resolves10.1149/1.2177047
Low Temperature (<100°C) Deposition of Aluminum Oxide Thin Films by ALD with O[sub 3] as Oxidant
resolves10.1016/j.tsf.2008.04.060
Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry
resolves10.1063/1.120454
Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition
resolves10.1116/1.4997439
Eagle XG® glass: Optical constants from 196 to 1688 nm (0.735–6.33 eV) by spectroscopic ellipsometry
resolves10.1116/1.4954226
Eagle XG® glass, optical constants from 230 to 1690 nm (0.73 - 5.39 eV) by spectroscopic ellipsometry
resolves10.1116/1.5046735
Polydimethylsiloxane: Optical properties from 191 to 1688 nm (0.735–6.491 eV) of the liquid material by spectroscopic ellipsometry
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Bruggeman effective medium approach for modelling optical properties of porous silicon: comparison with experiment
The 7 references without a DOI — listed, not checked
no DOI — not checked2023080809461000300_c6
no DOI — not checked2023080809461000300_c14
no DOI — not checked2023080809461000300_c28
no DOI — not checkedAtoms, Ions, and Their Electronic Structure
no DOI — not checked2023080809461000300_c41
no DOI — not checkedA User's Guide to Ellipsometry
no DOI — not checkedSee supplementary material at https://doi.org/10.1116/1.5114827 for information on additional optimization experiments on the deposition of thin alumina films.
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