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Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order

25/25 checkable references clean · checked 2026-07-22

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

2 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 25 checked references that resolve

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Dynamics of Block Copolymers: Theory and Experiment

resolves10.1557/mrs2005.249

Block Copolymer Lithography: Merging “Bottom-Up” with “Top-Down” Processes

resolves10.1126/science.1157626

Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

resolves10.1126/science.1159352

Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates

resolves10.1126/science.1162950

Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays

resolves10.1002/9783527610570

Block Copolymers in Nanoscience

resolves10.1002/1521-4095(200108)13:15<1152::AID-ADMA1152>3.0.CO;2-5

Graphoepitaxy of Spherical Domain Block Copolymer Films

resolves10.1038/nmat1211

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resolves10.1021/nl049209r

Ordered Block-Copolymer Assembly Using Nanoimprint Lithography

resolves10.1126/science.1165174

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resolves10.1103/PhysRevLett.82.2602

Polymers on Nanoperiodic, Heterogeneous Surfaces

resolves10.1002/1616-3028(20020517)12:5<333::AID-ADFM333>3.0.CO;2-C

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resolves10.1002/adma.200601625

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resolves10.1002/adma.200304906

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resolves10.1021/ma00099a045

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resolves10.1103/PhysRevLett.79.3018

Observed Substrate Topography-Mediated Lateral Patterning of Diblock Copolymer Films

resolves10.1103/PhysRevLett.72.2899

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resolves10.1021/ma050286y

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resolves10.1021/ma021367m

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resolves10.1021/ma047562d

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resolves10.1021/nn7004415

A Simple Route to Highly Oriented and Ordered Nanoporous Block Copolymer Templates

resolves10.1021/nl0805110

From Nanorings to Nanodots by Patterning with Block Copolymers

resolves10.1002/adfm.200304374

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resolves10.1002/adma.200701997

Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films

The 2 references without a DOI — listed, not checked

no DOI — not checkedF. S. Bates, G. H. Fredrickson, Phys. Today52, 32 (1999).

no DOI — not checkedThis work was supported by the U.S. Department of Energy (DOE) under contracts DE-FG-0296ER45612 (to T.P.R. S.P. and S.H.) DE-FG-0296ER42126 (T.P.R.) and DE-AC02-05CH11231 (T.X.); by the NSF-supported Materials Research Science and Engineering Center [DMR-0820506 (J.X. and B.K.); and by the Nanoscale Science and Engineering Center (DMI-0531171 (D.L.)] at the University of Massachusetts Amherst. Use of the Advanced Light Source Berkeley National Laboratory was supported by the DOE Office of Science Office of Basic Energy Sciences under contract DE-AC02-05CH11231. U.J. acknowledges the support of the Korea Science and Engineering Foundation through grant R11-2007-050-02004-0. The authors are also most indebted to the insightful comments of one referee whose persistence substantially enhanced our arguments.

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