Every reference with a DOI in the deposited reference list resolved to a known
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A Compact Virtual-Source Model for Carbon Nanotube FETs in the Sub-10-nm Regime—Part II: Extrinsic Elements, Performance Assessment, and Design Optimization
Growth and Performance of Yttrium Oxide as an Ideal High-κ Gate Dielectric for Carbon-Based Electronics
The 10 references without a DOI — listed, not checked
no DOI — not checkedW. M. Holt in IEEE International Solid-State Circuits Conference (ISSCC) 2016 IEEE International (IEEE 2016); 10.1109/ISSCC.2016.7417888.
no DOI — not checkedK. J. Kuhn et al . in Electron Devices Meeting (IEDM) 2012 IEEE International (IEEE 2012); 10.1109/IEDM.2012.6479001.
no DOI — not checkedM. Luisier et al . in International Electron Devices Meeting (IEDM) 2012 IEEE International (IEEE 2012); 10.1109/IEDM.2011.6131531.
no DOI — not checkedA. D. Franklin et al . in International Electron Devices Meeting (IEDM) 2012 IEEE International (IEEE 2012); 10.1109/IEDM.2012.6478979.
no DOI — not checkedS. Natarajan et al . in International Electron Devices Meeting (IEDM) 2014 IEEE International (IEEE 2014); 10.1109/IEDM.2014.7046976.
no DOI — not checkedC. Auth et al . in Symposium on VLSI Technology 2012 IEEE International (IEEE 2012); 10.1109/VLSIT.2012.6242496.
no DOI — not checkedS. Migita et al . in International Electron Devices Meeting (IEDM) 2012 IEEE International (IEEE 2012); 10.1109/IEDM.2012.6479006.
no DOI — not checkedH. Lee et al . in Symposium on VLSI Technology 2006 IEEE International (IEEE 2006); 10.1109/VLSIT.2006.1705215.
no DOI — not checkedB. Yu et al . in 2002 IEEE International (IEEE 2002); 10.1109/IEDM.2002.1175825.
no DOI — not checkedInternational Technology Roadmap for Semiconductors (2013 edition); www.itrs2.net/2013-itrs.html.
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