Reference health

Mechanism of copper diffusion over the Si(110) surface

https://doi.org/10.1134/1.1507271
CiteStamped reference-health badge
14/14 checkable references clean · checked 2026-07-23

Every reference with a DOI in the deposited reference list resolved to a known work in Crossref or DataCite at the dated check, and none carried a retraction, withdrawal, or removal notice.

6 without a DOI — not checked. A reference deposited without a DOI is never matched by title or guessed at; it stays outside the checked set, and this line discloses that.

The 14 checked references that resolve
resolves10.1016/0039-6028(85)90365-6
7 × 7 Si(111)Cu interfaces: Combined LEED, AES and EELS measurements
resolves10.1063/1.343227
Initial epitaxial growth of copper silicide on Si{111} studied by low-energy electron microscopy and photoemission electron microscopy
resolves10.1116/1.572947
Thermally induced structural and compositional modification of the Cu/Si(111)-7×7 interface
resolves10.1103/PhysRevB.34.521
Metastability of the Si(111)/Cu interface: A spatially resolved Auger line-shape spectroscopy investigation
resolves10.1016/0039-6028(86)90281-5
Atomic bonding at the SiAu and SiCu interfaces
resolves10.1103/PhysRevB.38.12696
Examination of the cu/si(111) 5×5 structure by scanning tunneling microscopy
resolves10.1103/PhysRevB.42.1674
Electronic and atomic structure of the Cu/Si(111) quasi-5×5 overlayer
resolves10.1103/PhysRevB.34.2945
Surface states of ordered Au, Ag, and Cu overlayers on Si(111) studied by inverse photoemission
resolves10.1016/0039-6028(95)00765-2
Surface structures and growth mode for the Cu/Si(110) surfaces depending on heat treatment
resolves10.1016/0039-6028(89)90619-5
Effect of nickel on clean silicon surfaces: Transport and structure
resolves10.1007/BF00617708
Transition metals in silicon
resolves10.1103/PhysRevLett.81.1243
Intrinsic Diffusion Coefficient of Interstitial Copper in Silicon
resolves10.1103/PhysRevLett.75.4460
Bulk versus Surface Transport of Nickel and Cobalt on Silicon
resolves10.1016/S0039-6028(96)01150-8
Co interaction with clean silicon surfaces
The 6 references without a DOI — listed, not checked
no DOI — not checkedA. E. Dolbak, R. A. Zhachuk, and B. Z. Ol’shanetskii, Fiz. Tekh. Poluprovodn. (St. Petersburg) 35, 1063 (2001) [Semiconductors 35, 1018 (2001)].
no DOI — not checkedP. W. Palmberg, G. E. Riach, R. E. Weber, and N. C. Mac-Donnald, Handbook of Auger Electron Spectroscopy (Physical Electronics Industries, Eden Prairie, 1972).
no DOI — not checkedA. E. Dolbak, B. Z. Olshanetsky, and S. A. Teys, Phys. Low-Dimens. Struct. 11/12, 41 (1999).
no DOI — not checkedA. E. Dolbak, B. Z. Olshanetsky, and R. A. Zhachuk, Phys. Low-Dimens. Struct. 9/10, 97 (1998).
no DOI — not checkedA. E. Dolbak, B. Z. Ol’shanetskii, S. A. Tiis, and R. A. Zhachuk, Pis’ma Zh. Éksp. Teor. Fiz. 66, 611 (1997) [JETP Lett. 66, 643 (1997)].
no DOI — not checkedA. E. Dolbak, B. Z. Ol’shanetskii, and S. A. Tiis, Pis’ma Zh. Éksp. Teor. Fiz. 69, 423 (1999) [JETP Lett. 69, 459 (1999)].
What this badge says. CiteStamped means the CHECKABLE references of this work were clean at the dated check: each resolved to a known work in a public registry, and none carried a retraction notice at that time. It says nothing about the quality, findings, or importance of the work itself, and nothing about references deposited without a DOI.

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