Every reference with a DOI in the deposited reference list resolved to a known
work in Crossref or DataCite at the dated check, and none carried a retraction,
withdrawal, or removal notice.
The 49 checked references that resolve
resolves10.1063/1.356306Electrical and optical properties of TiO2 anatase thin films
resolves10.1364/AO.40.002177Low-loss dielectric mirror with ion-beam-sputtered TiO_2–SiO_2 mixed films
resolves10.1143/JJAP.34.L751Electrically Pumped CdZnSe/ZnSe Blue-Green Vertical-Cavity Surface-Emitting Lasers
resolves10.1143/JJAP.38.6034Structural and Electrical Properties of Crystalline TiO<sub>2</sub> Thin Films Formed by Metalorganic Decomposition
resolves10.1109/16.554800MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics
resolves10.1038/238037a0Electrochemical Photolysis of Water at a Semiconductor Electrode
resolves10.1038/353737a0A low-cost, high-efficiency solar cell based on dye-sensitized colloidal TiO2 films
resolves10.1080/10934529909376905Protection of marbles against corrosion and microbial corrosion with TiO<sub>2</sub>coatings
resolves10.1246/cl.1995.185Selective Killing of a Single Cancerous T24 Cell with TiO2 Semiconducting Microelectrode under Irradiation
resolves10.1021/jp9844718Interaction of Carbon Monoxide with Anatase Surfaces at High Temperatures: Optimization of a Carbon Monoxide Sensor
resolves10.1016/0040-6090(95)06555-5Fabrication of titanium oxide thin films by controlled growth with sequential surface chemical reactions
resolves10.1021/la010174+Atomic Layer Deposition of Thin Films Using O<sub>2</sub> as Oxygen Source
resolves10.1016/j.tsf.2005.07.121Characteristics of TiOx films prepared by chemical vapor deposition using tetrakis-dimethyl-amido-titanium and water
resolves10.1063/1.2798384Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O
resolves10.1021/cm020357xAtomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
resolves10.1116/1.3669522Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone
resolves10.1149/1.2979986Ti Source Precursors for Atomic Layer Deposition of TiO2, STO and BST
resolves10.1021/jp903669cSurface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide
resolves10.3938/jkps.59.452Low-temperature Atomic Layer Deposition of TiO2, Al2O3, and ZnO Thin Films
resolves10.1149/1.2955724Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition
resolves10.1021/cm0104708Kinetic and Mechanistic Studies of the Thermal Decomposition of Ti(N(CH<sub>3</sub>)<sub>2</sub>)<sub>4</sub> during Chemical Vapor Deposition by in Situ Molecular Beam Mass Spectrometry
resolves10.1103/PhysRevB.52.7771Urbach tail of anatase<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">TiO</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>
resolves10.1002/sia.1296Alteration of Ti 2p XPS spectrum for titanium oxide by low‐energy Ar ion bombardment
resolves10.1021/jp057261lDefect Chemistry, Surface Structures, and Lithium Insertion in Anatase TiO<sub>2</sub>
resolves10.1021/jp065744zPhotoluminescence Characteristics of TiO<sub>2</sub> and Their Relationship to the Photoassisted Reaction of Water/Methanol Mixture
resolves10.1021/jp301680dLocation of Hole and Electron Traps on Nanocrystalline Anatase TiO<sub>2</sub>
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