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Exceptionally Uniform and Scalable Multilayer MoS<sub>2</sub> Phototransistor Array Based on Large-Scale MoS<sub>2</sub> Grown by RF Sputtering, Electron Beam Irradiation, and Sulfurization
Ultraflat Sub-10 Nanometer Gap Electrodes for Two-Dimensional Optoelectronic Devices
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no DOI — not checkedThe Road for 2D Semiconductors in the Silicon Age
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no DOI — not checkedUniversal mechanical exfoliation of large-area 2D crystals
no DOI — not checkedCentimeter-scale Green Integration of Layer-by-Layer 2D TMD vdW Heterostructures on Arbitrary Substrates by Water-Assisted Layer Transfer
no DOI — not checkedref23
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no DOI — not checkedBatch production of 6-inch uniform monolayer molybdenum disulfide catalyzed by sodium in glass
no DOI — not checkedControllable Growth of Large-Size Crystalline MoS2 and Resist-Free Transfer Assisted with a Cu Thin Film
no DOI — not checkedRaman Spectroscopy of Suspended MoS2
no DOI — not checkedref37
no DOI — not checkedSurface roughness induced electron mobility degradation in InAs nanowires
no DOI — not checkedRational Design on Wrinkle-Less Transfer of Transition Metal Dichalcogenide Monolayer by Adjustable Wettability-Assisted Transfer Method
no DOI — not checkedref41
no DOI — not checkedSelf-Assembly of Three-Dimensional Metal Islands: Nonstrained versus Strained Islands
no DOI — not checkedFast transient charging at the graphene/ SiO2 interface causing hysteretic device characteristics
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no DOI — not checkedFast and slow transient charging in various III-V field-effect transistors with atomic-layer-deposited-Al2O3 gate dielectric
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