On the public citation graph

Thin zirconium nitride films prepared by plasma-enhanced CVD

0 signed · 56 inferred · view as graph

Inferred edges come from two machine sources: sweeps of open repository metadata (mostly SSRN and Zenodo), and a bulk OpenAlex citation snapshot. Every row below is labelled with the one it came from. Neither is a complete citation index — absence here is not evidence of absence.

Is this your work? Sign in with ORCID and put your name on the claims that are yours.

Claim with ORCID

Reference health. See whether every reference in this work resolves to a known work and none has been retracted — and get a dated CiteStamped badge you can embed.

See reference health

What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1007/bf00626163openalex-snapshot

Die colorimetrische Bestimmung von Zirkonium mit Arsenazo III(I)

inferredcites →https://doi.org/10.1016/0040-6090(87)90171-4openalex-snapshot

Reactive arc vapor ion deposition of TiN, ZrN and HfN

inferredcites →https://doi.org/10.1016/0040-6090(88)90007-7openalex-snapshot

Variations in the reflectance of TiN, ZrN and HfN

inferredcites →https://doi.org/10.1016/0042-207x(86)90265-4openalex-snapshot

The use of optical emission spectroscopy for process control in triode ion plating with ZrN

inferredcites →https://doi.org/10.1016/0168-583x(88)90685-4openalex-snapshot

Defect structure and superconducting transition temperature of ion-irradiated refractory metal carbides and nitrides

inferredcites →https://doi.org/10.1016/0257-8972(86)90040-xopenalex-snapshot

Plasma-assisted vapor deposition processes and some applications

inferredcites →https://doi.org/10.1016/b978-0-08-018786-0.50001-4openalex-snapshot

Comprehensive Inorganic Chemistry

inferredcites →https://doi.org/10.1063/1.344080openalex-snapshot

Synthesis of sheet conductive layers on the surface of some insulator ceramics (TiO2, ZrO2, HfO2) by multipulse CO2-laser irradiation in an ammonia atmosphere

inferredcites →https://doi.org/10.1063/1.98459openalex-snapshot

New type cryogenic thermometer using sputtered Zr-N films

inferredcites →https://doi.org/10.1063/1.99891openalex-snapshot

Epitaxial growth of ZrN on Si(100)

inferredcites →https://doi.org/10.1103/physrevb.32.8312openalex-snapshot

Zirconium nitride—a new material for Josephson junctions

inferredcites →https://doi.org/10.1116/1.573651openalex-snapshot

Reactively sputtered nitrides and carbides of titanium, zirconium, and hafnium

inferredcites →https://doi.org/10.1116/1.573652openalex-snapshot

Characterization of hard nitride and carbide titanium and zirconium coatings on high‐speed steel cutting tool inserts

inferredcites →https://doi.org/10.1116/1.573933openalex-snapshot

Reactive radio frequency sputter deposition of higher nitrides of titanium, zirconium, and hafnium

inferredcites →https://doi.org/10.1116/1.574062openalex-snapshot

A review of the present state of art in hard coatings grown from the vapor phase

inferredcites →https://doi.org/10.1116/1.583653openalex-snapshot

Refractory metal nitride rectifying contacts on GaAs

inferredcites →https://doi.org/10.1149/1.2134060openalex-snapshot

Low Temperature Deposition of Metal Nitrides by Thermal Decomposition of Organometallic Compounds

inferredcites →https://doi.org/10.3131/jvsj.14.325openalex-snapshot

Preparation of Zr-N Thin Film Resistors Using Reactive Evaporation Apparatus

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

inferred← citeshttps://doi.org/10.2139/ssrn.4530197openalex-extracted

inferred← citeshttps://doi.org/10.1002/9783527615858.ch1openalex-snapshot

Introduction

inferred← citeshttps://doi.org/10.1002/zaac.200400271openalex-snapshot

Nanostructured ZrO2 and Zr‐C‐N Coatings from Chemical Vapor Deposition of Metal‐Organic Precursors

inferred← citeshttps://doi.org/10.1007/bf00332578openalex-snapshot

Use of langmuir probes for monitoring of precursor concentrations during plasma activated chemical vapor deposition of hard coatings

inferred← citeshttps://doi.org/10.1007/bf01538404openalex-snapshot

Formation of hafnium carbide thin films by plasma enhanced chemical vapor deposition from bis(η-cyclopentadienyl)dimethylhafnium as precursor

inferred← citeshttps://doi.org/10.1007/bf01650735openalex-snapshot

Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium

inferred← citeshttps://doi.org/10.1007/bf02719504openalex-snapshot

Fourier transform infrared spectroscopy studies on thermal decomposition of tetrakis-dimethyl-amido zirconium for chemical vapor deposition of ZrN

inferred← citeshttps://doi.org/10.1016/0168-583x(93)96165-9openalex-snapshot

Behavior of nitrogen implanted into Zr at high fluence

inferred← citeshttps://doi.org/10.1016/0257-8972(93)90219-eopenalex-snapshot

Deposition of hard material coatings using an organometallic precursor

inferred← citeshttps://doi.org/10.1016/0257-8972(95)08242-5openalex-snapshot

Zirconium carbonitride films produced by plasma-assisted metal organic chemical vapour deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2009.05.097openalex-snapshot

Effects of substrate bias and nitrogen flow ratio on the surface morphology and binding state of reactively sputtered ZrNx films before and after annealing

inferred← citeshttps://doi.org/10.1016/j.ccr.2012.12.004openalex-snapshot

CVD and precursor chemistry of transition metal nitrides

inferred← citeshttps://doi.org/10.1016/j.ccr.2013.07.025openalex-snapshot

‘Old Chemistries’ for new applications: Perspectives for development of precursors for MOCVD and ALD applications

inferred← citeshttps://doi.org/10.1016/j.mtadv.2023.100430openalex-snapshot

Innovative process to obtain thin films and micro-nanostructured ZrN films from a photo-structurable ZrO2 sol-gel using rapid thermal nitridation

inferred← citeshttps://doi.org/10.1016/j.nimb.2013.01.003openalex-snapshot

Structural, mechanical, electrical and wetting properties of ZrN films deposited by Ar/N2 vacuum arc discharge: Effect of nitrogen partial pressure

inferred← citeshttps://doi.org/10.1016/j.pmatsci.2013.07.001openalex-snapshot

Development of CVD Ti-containing films

inferred← citeshttps://doi.org/10.1016/j.surfcoat.2003.09.013openalex-snapshot

Deposition of hard metal nitride-like coatings in an electron cyclotron resonance discharge

inferred← citeshttps://doi.org/10.1016/j.surfin.2025.106403openalex-snapshot

Plasma functionalization and etching of ABS substrates for enhanced adhesion of decorative ZrN coatings

inferred← citeshttps://doi.org/10.1016/s0169-4332(99)00233-0openalex-snapshot

Zirconium nitrides deposited by dual ion beam sputtering: physical properties and growth modelling

inferred← citeshttps://doi.org/10.1016/s0257-8972(00)00749-0openalex-snapshot

Deposition of TiCN and ZrCN layers on light metals by PACVD method using radio frequency and pulsed-DC plasma

inferred← citeshttps://doi.org/10.1016/s0257-8972(00)00831-8openalex-snapshot

TiCN coatings on aluminum alloy formed by MO-PACVD

inferred← citeshttps://doi.org/10.1016/s0257-8972(01)01174-4openalex-snapshot

Comparison of radio frequency and pulsed-d.c. plasma CVD of TiCNH and ZrCNH layers at low temperature

inferred← citeshttps://doi.org/10.1016/s0257-8972(97)00297-1openalex-snapshot

Low temperature coating of aluminium alloys by plasma-CVD using metallo-organic compounds

inferred← citeshttps://doi.org/10.1016/s0257-8972(98)00803-2openalex-snapshot

Plasma-CVD of TiCN and ZrCN films on light metals

inferred← citeshttps://doi.org/10.1021/acsenergylett.8b01478openalex-snapshot

Plasmonic Core–Shell Zirconium Nitride–Silicon Oxynitride Nanoparticles

inferred← citeshttps://doi.org/10.1021/cg3010147openalex-snapshot

Fabrication of ZrO2 and ZrN Films by Metalorganic Chemical Vapor Deposition Employing New Zr Precursors

inferred← citeshttps://doi.org/10.1021/ic025630bopenalex-snapshot

Synthesis and Structures of Zirconium Amide−Iodide Complexes

inferred← citeshttps://doi.org/10.1039/d4dt01252fopenalex-snapshot

A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction

inferred← citeshttps://doi.org/10.1088/1361-6595/aaa86copenalex-snapshot

Foundations of low-temperature plasma enhanced materials synthesis and etching

inferred← citeshttps://doi.org/10.1088/2053-1583/ac52b3openalex-snapshot

Structures, properties and applications of two-dimensional metal nitrides: from nitride MXene to other metal nitrides

inferred← citeshttps://doi.org/10.1116/1.1776182openalex-snapshot

Effects of substrate bias and nitrogen flow ratio on the resistivity, density, stoichiometry, and crystal structure of reactively sputtered ZrNx thin films

inferred← citeshttps://doi.org/10.1116/1.2735966openalex-snapshot

Effects of substrate bias and nitrogen flow ratio on the resistivity and crystal structure of reactively sputtered ZrNx films at elevated temperature

inferred← citeshttps://doi.org/10.1116/1.4915122openalex-snapshot

Low temperature plasma enhanced atomic layer deposition of conducting zirconium nitride films using tetrakis (dimethylamido) zirconium and forming gas (5% H2 + 95% N2) plasma

inferred← citeshttps://doi.org/10.1117/12.3016633openalex-snapshot

Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO2 sol-gel to obtain micro-nanostructured ZrN

inferred← citeshttps://doi.org/10.1143/jjap.46.l1000openalex-snapshot

Low-Temperature Growth of Highly Crystalline Superconducting ZrN Thin Film on c-GaN Layer by Pulsed Laser Deposition

inferred← citeshttps://doi.org/10.1557/jmr.1994.3019openalex-snapshot

Plasma enhanced chemical vapor deposition of silicon nitride films from a metal-organic precursor

inferred← citeshttps://doi.org/10.1557/proc-410-289openalex-snapshot

Plasma Enhanced Chemical Vapor Deposition of Zirconium Nitride Thin Films

inferred← citeshttps://doi.org/10.2109/jcersj2.20081openalex-snapshot

Preparation of zirconium carbonitride by laser chemical vapor deposition using alkyl-amide precursor as a single source

Editorial review for independent work. ICSAC — the Institute for Complexity Science and Advanced Computing — runs a structured editorial panel for researchers publishing outside journals, and publishes on CiteStamp rails. Submission is free and goes through ORCID: icsacinstitute.org/submit.