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Lanthanum Doping in Zinc Oxide for Highly Reliable Thin-Film Transistors on Flexible Substrates by Spray Pyrolysis

https://doi.org/10.1021/acsami.0c05151
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/adfm.201001089openalex-snapshot
Structural and Electrical Characterization of ZnO Films Grown by Spray Pyrolysis and Their Application in Thin‐Film Transistors
inferredcites →https://doi.org/10.1002/adfm.201402684openalex-snapshot
High‐Mobility ZnO Thin Film Transistors Based on Solution‐processed Hafnium Oxide Gate Dielectrics
inferredcites →https://doi.org/10.1002/adfm.201700437openalex-snapshot
Highly Robust Bendable Oxide Thin‐Film Transistors on Polyimide Substrates via Mesh and Strip Patterning of Device Layers
inferredcites →https://doi.org/10.1002/adfm.201904632openalex-snapshot
A Review of Low‐Temperature Solution‐Processed Metal Oxide Thin‐Film Transistors for Flexible Electronics
inferredcites →https://doi.org/10.1002/adma.200600961openalex-snapshot
A General Route to Printable High‐Mobility Transparent Amorphous Oxide Semiconductors
inferredcites →https://doi.org/10.1002/adma.200803584openalex-snapshot
High‐Performance Zinc Oxide Transistors and Circuits Fabricated by Spray Pyrolysis in Ambient Atmosphere
inferredcites →https://doi.org/10.1002/adma.200902450openalex-snapshot
Role of Gallium Doping in Dramatically Lowering Amorphous‐Oxide Processing Temperatures for Solution‐Derived Indium Zinc Oxide Thin‐Film Transistors
inferredcites →https://doi.org/10.1002/adma.201003935openalex-snapshot
High‐Mobility Low‐Voltage ZnO and Li‐Doped ZnO Transistors Based on ZrO2 High‐k Dielectric Grown by Spray Pyrolysis in Ambient Air
inferredcites →https://doi.org/10.1002/admi.201900277openalex-snapshot
High Performance of a‐IZTO TFT by Purification of the Semiconductor Oxide Precursor
inferredcites →https://doi.org/10.1002/advs.201500058openalex-snapshot
High Electron Mobility Thin‐Film Transistors Based on Solution‐Processed Semiconducting Metal Oxide Heterojunctions and Quasi‐Superlattices
inferredcites →https://doi.org/10.1002/aelm.201800100openalex-snapshot
Nontoxic, Eco‐friendly Fully Water‐Induced Ternary Zr–Gd–O Dielectric for High‐Performance Transistors and Unipolar Inverters
inferredcites →https://doi.org/10.1002/aelm.201900768openalex-snapshot
Highly Stable, Solution‐Processed Ga‐Doped IZTO Thin Film Transistor by Ar/O 2 Plasma Treatment
inferredcites →https://doi.org/10.1007/s13391-015-5302-8openalex-snapshot
Amorphous LaZnSnO thin films by a combustion solution process and application in thin film transistors
inferredcites →https://doi.org/10.1016/j.mee.2014.01.020openalex-snapshot
Band offsets and electrical stability characterization of Zr-doped ZnO thin-film transistors with a Gd2O3 gate insulator
inferredcites →https://doi.org/10.1016/j.tsf.2017.05.024openalex-snapshot
Effect of Li-doping on low temperature solution-processed indium–zinc oxide thin film transistors
inferredcites →https://doi.org/10.1021/acsaelm.9b00110openalex-snapshot
Low-Voltage-Operating Transistors and Logic Circuits Based on a Water-Driven ZrGdOx Dielectric with Low-Cost ZnSnO
inferredcites →https://doi.org/10.1021/acsami.5b00561openalex-snapshot
ZnO-based Thin Film Transistors Employing Aluminum Titanate Gate Dielectrics Deposited by Spray Pyrolysis at Ambient Air
inferredcites →https://doi.org/10.1021/acsami.5b10520openalex-snapshot
Optimization of a Solution-Processed SiO2 Gate Insulator by Plasma Treatment for Zinc Oxide Thin Film Transistors
inferredcites →https://doi.org/10.1021/acsami.6b06498openalex-snapshot
Enhanced ZnO Thin-Film Transistor Performance Using Bilayer Gate Dielectrics
inferredcites →https://doi.org/10.1021/acsami.7b00435openalex-snapshot
All Inkjet-Printed Metal-Oxide Thin-Film Transistor Array with Good Stability and Uniformity Using Surface-Energy Patterns
inferredcites →https://doi.org/10.1021/acsami.7b10786openalex-snapshot
High-Mobility and Hysteresis-Free Flexible Oxide Thin-Film Transistors and Circuits by Using Bilayer Sol–Gel Gate Dielectrics
inferredcites →https://doi.org/10.1021/acsami.8b17700openalex-snapshot
Highly Flexible and Transparent Memristive Devices Using Cross-Stacked Oxide/Metal/Oxide Electrode Layers
inferredcites →https://doi.org/10.1021/acsami.9b02935openalex-snapshot
Stretchable Polymer Gate Dielectric by Ultraviolet-Assisted Hafnium Oxide Doping at Low Temperature for High-Performance Indium Gallium Tin Oxide Transistors
inferredcites →https://doi.org/10.1021/acsami.9b03865openalex-snapshot
Boosting Carrier Mobility in Zinc Oxynitride Thin-Film Transistors via Tantalum Oxide Encapsulation
inferredcites →https://doi.org/10.1021/acsomega.7b00552openalex-snapshot
Sol–Gel PMMA–ZrO2 Hybrid Layers as Gate Dielectric for Low-Temperature ZnO-Based Thin-Film Transistors
inferredcites →https://doi.org/10.1021/am402153gopenalex-snapshot
Boron-Doped Peroxo-Zirconium Oxide Dielectric for High-Performance, Low-Temperature, Solution-Processed Indium Oxide Thin-Film Transistor
inferredcites →https://doi.org/10.1021/am501153wopenalex-snapshot
Effect Of Channel Layer Thickness On The Performance Of Indium–Zinc–Tin Oxide Thin Film Transistors Manufactured By Inkjet Printing
inferredcites →https://doi.org/10.1021/am506937sopenalex-snapshot
Fully Transparent and Rollable Electronics
inferredcites →https://doi.org/10.1021/jacs.6b02309openalex-snapshot
Carbohydrate-Assisted Combustion Synthesis To Realize High-Performance Oxide Transistors
inferredcites →https://doi.org/10.1038/nature03090openalex-snapshot
Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
inferredcites →https://doi.org/10.1038/nmat2914openalex-snapshot
Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol–gel on chip’ process
inferredcites →https://doi.org/10.1038/s41928-019-0342-yopenalex-snapshot
Hybrid organic–metal oxide multilayer channel transistors with high operational stability
inferredcites →https://doi.org/10.1039/c5ra21022dopenalex-snapshot
Space charge-induced unusually-high mobility of a solution-processed indium oxide thin film transistor with an ethylene glycol incorporated aluminum oxide gate dielectric
inferredcites →https://doi.org/10.1039/c8tc00899jopenalex-snapshot
Low-temperature fabrication of solution-processed hafnium oxide gate insulator films using a thermally purified solution process
inferredcites →https://doi.org/10.1063/1.3206917openalex-snapshot
High performance ZnO-thin-film transistor with Ta2O5 dielectrics fabricated at room temperature
inferredcites →https://doi.org/10.1063/1.3238466openalex-snapshot
Electronic properties of ZnO field-effect transistors fabricated by spray pyrolysis in ambient air
inferredcites →https://doi.org/10.1063/1.3340943openalex-snapshot
Investigating addition effect of hafnium in InZnO thin film transistors using a solution process
inferredcites →https://doi.org/10.1063/1.3506503openalex-snapshot
The effect of La in InZnO systems for solution-processed amorphous oxide thin-film transistors
inferredcites →https://doi.org/10.1063/1.3568893openalex-snapshot
Low-voltage ZnO thin-film transistors based on Y2O3 and Al2O3 high-k dielectrics deposited by spray pyrolysis in air
inferredcites →https://doi.org/10.1063/1.4846736openalex-snapshot
Chemical composition and temperature dependent performance of ZnO-thin film transistors deposited by pulsed and continuous spray pyrolysis
inferredcites →https://doi.org/10.1063/1.4869761openalex-snapshot
Effects of Ta incorporation in La2O3 gate dielectric of InGaZnO thin-film transistor
inferredcites →https://doi.org/10.1063/1.4968194openalex-snapshot
Atomic layer deposition of Nb-doped ZnO for thin film transistors
inferredcites →https://doi.org/10.1073/pnas.1501548112openalex-snapshot
Spray-combustion synthesis: Efficient solution route to high-performance oxide transistors
inferredcites →https://doi.org/10.1088/1361-6528/ab1860openalex-snapshot
Solution-processed metal-oxide thin-film transistors: a review of recent developments
inferredcites →https://doi.org/10.1109/jeds.2019.2919424openalex-snapshot
High-Performance Amorphous Zinc–Tin–Oxide Thin-Film Transistors With Low Tin Concentration
inferredcites →https://doi.org/10.1109/led.2012.2188849openalex-snapshot
Low-Temperature Fabrication and Characteristics of Lanthanum Indium Zinc Oxide Thin-Film Transistors
inferredcites →https://doi.org/10.1109/led.2016.2528288openalex-snapshot
Solution-Processed Amorphous In–Zn–Sn Oxide Thin-Film Transistor Performance Improvement by Solution-Processed Y2O3Passivation
inferredcites →https://doi.org/10.1109/led.2018.2791633openalex-snapshot
Remarkable Increase in Field Effect Mobility of Amorphous IZTO Thin-Film Transistors With Purified ZrOxGate Insulator
inferredcites →https://doi.org/10.1109/led.2018.2856760openalex-snapshot
Effect of Doping Fluorine in Offset Region on Performance of Coplanar a-IGZO TFTs
inferredcites →https://doi.org/10.1109/led.2018.2880177openalex-snapshot
Effect of Hf alloy in ZrOx gate insulator for solution processed a-IZTO thin film transistors
inferredcites →https://doi.org/10.1109/ted.2012.2227483openalex-snapshot
High-Performance Solution-Processed ZrInZnO Thin-Film Transistors
inferredcites →https://doi.org/10.1109/ted.2017.2781725openalex-snapshot
Effect of La Addition on the Electrical Characteristics and Stability of Solution-Processed LaInO Thin-Film Transistors With High-${k}$ ZrO2Gate Insulator
inferredcites →https://doi.org/10.1109/ted.2019.2896313openalex-snapshot
Enhanced Stability in Zr-Doped ZnO TFTs With Minor Influence on Mobility by Atomic Layer Deposition
inferredcites →https://doi.org/10.1186/s11671-019-2989-8openalex-snapshot
Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and Ozone
inferredcites →https://doi.org/10.3390/ma11091761openalex-snapshot
Effects of Interfacial Passivation on the Electrical Performance, Stability, and Contact Properties of Solution Process Based ZnO Thin Film Transistors
inferredcites →https://doi.org/10.7567/jjap.55.03cc02openalex-snapshot
Improvement in performance of solution-processed indium–zinc–tin oxide thin-film transistors by UV/O 3 treatment on zirconium oxide gate insulator

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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