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Deposition of Copper by the H2-Assisted Reduction of Cu(tmod)2 in Supercritical Carbon Dioxide: Kinetics and Reaction Mechanism
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
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Surface Oxidation and Reduction of CuO and Cu2O Studied Using XPS and XAES
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Chemical Fluid Deposition: A Hybrid Technique for Low‐Temperature Metallization
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Chemical vapor deposition of metals: Part 1. An overview of CVD processes
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Chemical vapor deposition of metals: Part 2. Overview of selective CVD of Metals
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Thermodynamic investigation of the MOCVD of copper films frombis(2,2,6,6-tetramethyl-3,5-heptadionato)copper(II)
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Solubility of chelating agents and metal-containing compounds in supercritical fluid carbon dioxide
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Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane
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Deposition of Cu films from supercritical fluids using Cu(I) β-diketonate precursors
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Characteristics of copper deposition in a supercritical CO2 fluid
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Reactive Deposition of Conformal Palladium Films from Supercritical Carbon Dioxide Solution
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Reactive Deposition of Metal Thin Films within Porous Supports from Supercritical Fluids
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Alcohol-Assisted Deposition of Copper Films from Supercritical Carbon Dioxide
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Deposition of Gold Films and Nanostructures from Supercritical Carbon Dioxide
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Solubilities of Copper(II) and Chromium(III) .beta.-Diketonates in Supercritical Carbon Dioxide
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Determination of Metal-Chelate Complex Solubilities in Supercritical Carbon Dioxide
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Mechanistic studies of copper thin-film growth from CuI and CuII .beta.-diketonates
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Mechanisms of copper chemical vapor deposition
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Copper metalorganic chemical vapor deposition reactions of hexafluoroacetylacetonate Cu(I) vinyltrimethylsilane and bis (hexafluoroacetylacetonate) Cu(II) adsorbed on titanium nitride
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Toward a Unified Reaction Mechanism for Chemical Vapor Deposition of Copper
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The Role of Gas‐Phase Reactions during Chemical Vapor Deposition of Copper from (hfac)Cu(tmvs)
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Cu CVD from Copper(II) Hexafluoroacetylacetonate: I . A Cold Wall Reactor Design, Blanket Growth Rate, and Natural Selectivity
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The Effect of Adding Hexafluoroacetylacetone on Chemical Vapor Deposition of Copper Using Cu(I) and Cu(II) Precursor Systems
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Film Growth Kinetics of Chemical Vapor Deposition of Copper from Cu ( HFA ) 2
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Vapor Deposition of Metals by Hydrogen Reduction of Metal Chelates
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Incoming claims: where this work appears in other papers’ reference lists and arguments.
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