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Directed Assembly of High Molecular Weight Block Copolymers: Highly Ordered Line Patterns of Perpendicularly Oriented Lamellae with Large Periods

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Outgoing claims: the papers this work cites, builds on, or argues with.

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Tunable Block Copolymer/Homopolymer Photonic Crystals
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Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography
inferredcites →https://doi.org/10.1002/adfm.200900121openalex-snapshot
Spontaneous Lamellar Alignment in Thickness‐Modulated Block Copolymer Films
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Block Copolymers as a Tool for Nanomaterial Fabrication
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Highly Oriented and Ordered Arrays from Block Copolymers via Solvent Evaporation
inferredcites →https://doi.org/10.1002/adma.200502651openalex-snapshot
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
inferredcites →https://doi.org/10.1002/adma.200600741openalex-snapshot
Highly Oriented Thin‐Film Microdomain Patterns of Ultrahigh Molecular Weight Block Copolymers via Directional Solidification of a Solvent
inferredcites →https://doi.org/10.1002/adma.200601421openalex-snapshot
Directed Assembly of Lamellae‐ Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates
inferredcites →https://doi.org/10.1002/adma.200602708openalex-snapshot
Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation
inferredcites →https://doi.org/10.1002/adma.200702930openalex-snapshot
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics, and Polymers
inferredcites →https://doi.org/10.1002/adma.200802855openalex-snapshot
Solvent‐Vapor‐Induced Tunability of Self‐Assembled Block Copolymer Patterns
inferredcites →https://doi.org/10.1002/adma.200803302openalex-snapshot
Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns
inferredcites →https://doi.org/10.1002/adma.200901689openalex-snapshot
Patterning and Templating for Nanoelectronics
inferredcites →https://doi.org/10.1002/adma.201001669openalex-snapshot
Graphoepitaxial Assembly of Symmetric Block Copolymers on Weakly Preferential Substrates
inferredcites →https://doi.org/10.1002/marc.200400665openalex-snapshot
Solvent Induced Sphere Development in Symmetric Diblock Copolymer Thin Films
inferredcites →https://doi.org/10.1016/s1369-7021(10)70106-1openalex-snapshot
Self-assembly of block copolymer thin films
inferredcites →https://doi.org/10.1021/ja072929qopenalex-snapshot
Synthesis of High Molecular Weight Comb Block Copolymers and Their Assembly into Ordered Morphologies in the Solid State
inferredcites →https://doi.org/10.1021/la0360815openalex-snapshot
Lateral Nanopatterns in Thin Diblock Copolymer Films Induced by Selective Solvents
inferredcites →https://doi.org/10.1021/la060748gopenalex-snapshot
Side-Chain-Grafted Random Copolymer Brushes as Neutral Surfaces for Controlling the Orientation of Block Copolymer Microdomains in Thin Films
inferredcites →https://doi.org/10.1021/ma00024a002openalex-snapshot
Diffusion of a symmetric block copolymer in a periodic potential
inferredcites →https://doi.org/10.1021/ma00176a037openalex-snapshot
Surface ordering phenomena in block copolymer melts
inferredcites →https://doi.org/10.1021/ma020567vopenalex-snapshot
Pathways toward Electric Field Induced Alignment of Block Copolymers
inferredcites →https://doi.org/10.1021/ma0497761openalex-snapshot
Morphology Development of Ultrathin Symmetric Diblock Copolymer Film via Solvent Vapor Treatment
inferredcites →https://doi.org/10.1021/ma062939wopenalex-snapshot
Surface Modification with Cross-Linked Random Copolymers: Minimum Effective Thickness
inferredcites →https://doi.org/10.1021/ma60078a047openalex-snapshot
Theory of Microphase Separation in Block Copolymers
inferredcites →https://doi.org/10.1021/ma8007338openalex-snapshot
Microdomain Orientation of PS-b-PMMA by Controlled Interfacial Interactions
inferredcites →https://doi.org/10.1021/ma8018393openalex-snapshot
Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains
inferredcites →https://doi.org/10.1021/ma801861hopenalex-snapshot
Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films
inferredcites →https://doi.org/10.1021/ma971349iopenalex-snapshot
Morphological Development in Solvent-Cast Polystyrene−Polybutadiene−Polystyrene (SBS) Triblock Copolymer Thin Films
inferredcites →https://doi.org/10.1021/nl061669sopenalex-snapshot
Large Area, 38 nm Half-Pitch Grating Fabrication by Using Atomic Spacer Lithography from Aluminum Wire Grids
inferredcites →https://doi.org/10.1021/nl101637fopenalex-snapshot
One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy
inferredcites →https://doi.org/10.1021/nl2016224openalex-snapshot
Highly Tunable Self-Assembled Nanostructures from a Poly(2-vinylpyridine-b-dimethylsiloxane) Block Copolymer
inferredcites →https://doi.org/10.1021/nl203445hopenalex-snapshot
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing
inferredcites →https://doi.org/10.1021/nl203488aopenalex-snapshot
Density Doubling of Block Copolymer Templated Features
inferredcites →https://doi.org/10.1021/nn101212qopenalex-snapshot
Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning
inferredcites →https://doi.org/10.1021/nn102387copenalex-snapshot
Fast Assembly of Ordered Block Copolymer Nanostructures through Microwave Annealing
inferredcites →https://doi.org/10.1038/nature01775openalex-snapshot
Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
inferredcites →https://doi.org/10.1038/nmat2032openalex-snapshot
Broad-wavelength-range chemically tunable block-copolymer photonic gels
inferredcites →https://doi.org/10.1038/nmat997openalex-snapshot
Self-assembly of functional nanostructures from ABC triblock copolymers
inferredcites →https://doi.org/10.1063/1.458879openalex-snapshot
Self-consistent theory of block copolymer blends: Neutral solvent
inferredcites →https://doi.org/10.1088/0957-4484/16/9/076openalex-snapshot
Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography
inferredcites →https://doi.org/10.1103/physreva.46.7765openalex-snapshot
Defect dynamics and coarsening dynamics in smectic-Cfilms
inferredcites →https://doi.org/10.1126/science.1067794openalex-snapshot
Functional Materials Based on Self-Assembly of Polymeric Supramolecules
inferredcites →https://doi.org/10.1126/science.1106604openalex-snapshot
A Generalized Approach to the Modification of Solid Surfaces
inferredcites →https://doi.org/10.1126/science.1111041openalex-snapshot
Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures
inferredcites →https://doi.org/10.1126/science.1157626openalex-snapshot
Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly
inferredcites →https://doi.org/10.1126/science.1159352openalex-snapshot
Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates
inferredcites →https://doi.org/10.1126/science.1162950openalex-snapshot
Evolution of Block Copolymer Lithography to Highly Ordered Square Arrays
inferredcites →https://doi.org/10.1126/science.1168108openalex-snapshot
Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order
inferredcites →https://doi.org/10.1126/science.1193369openalex-snapshot
Block Copolymer Self-Assembly–Directed Single-Crystal Homo- and Heteroepitaxial Nanostructures
inferredcites →https://doi.org/10.1126/science.275.5305.1458openalex-snapshot
Controlling Polymer-Surface Interactions with Random Copolymer Brushes
inferredcites →https://doi.org/10.1126/science.276.5317.1401openalex-snapshot
Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter
inferredcites →https://doi.org/10.1126/science.290.5496.1558openalex-snapshot
Mechanisms of Ordering in Striped Patterns
inferredcites →https://doi.org/10.1126/science.290.5499.2126openalex-snapshot
Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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Disclosing Topographical and Chemical Patterns in Confined Films of High Molecular Weight Block Copolymers Under Controlled Solvothermal Annealing
inferred← citeshttps://doi.org/10.1002/adfm.201401529openalex-snapshot
Eliminating the Trade‐Off between the Throughput and Pattern Quality of Sub‐15 nm Directed Self‐Assembly via Warm Solvent Annealing
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Vertical Orientation of Nanodomains on Versatile Substrates through Self‐Neutralization Induced by Star‐Shaped Block Copolymers
inferred← citeshttps://doi.org/10.1002/adfm.201601471openalex-snapshot
Hierarchical Directed Self‐Assembly of Diblock Copolymers for Modified Pattern Symmetry
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An In Situ Grazing Incidence X‐Ray Scattering Study of Block Copolymer Thin Films During Solvent Vapor Annealing
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Fabrication of Ordered, Large Scale, Horizontally‐Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach
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Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
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Complex High‐Aspect‐Ratio Metal Nanostructures by Secondary Sputtering Combined with Block Copolymer Self‐Assembly
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Multilaminate Energy Storage Films from Entropy‐Driven Self‐Assembled Supramolecular Nanocomposites
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Flow‐Induced Microdomain Alignment During Block Copolymer Graphoepitaxy
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Polymerization Rate Considerations for High Molecular Weight Polyisoprene‐b‐Polystyrene‐b‐Poly(N,N‐dimethylacrylamide) Triblock Polymers Synthesized Via Sequential Reversible Addition‐Fragmentation Chain Transfer (RAFT) Reactions
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Developing Anisotropy in Self‐Assembled Block Copolymers: Methods, Properties, and Applications
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Functionalization Enhanced Phase Separation in PS‐ b ‐PVP Derived Polyzwitterionic Block Copolymers
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Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films
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Current Enhancement of Ultrathin GaAs Solar Cells with Rear Light Scattering Structures Using Block Copolymers
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Photopatterning of Cross‐Linkable Epoxide‐Functionalized Block Copolymers and Dual‐Tone Nanostructure Development for Fabrication Across the Nano‐ and Microscales
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Controlling Self‐Assembly in Gyroid Terpolymer Films By Solvent Vapor Annealing
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Constructing a Comprehensive Nanopattern Library through Morphological Transitions of Block Copolymer Surface Micelles via Direct Solvent Immersion
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Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist
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Directed Self-assembly of Vertical PS-b-PMMA Nanodomains Grown on Multilayered Polyelectrolyte Films
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Directed self-oriented self-assembly of block copolymers using chemically modified surfaces
inferred← citeshttps://doi.org/10.1016/j.apmt.2021.101006openalex-snapshot
Symmetry-breaking in double gyroid block copolymer films by non-affine distortion
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High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
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Imprint strategy for directed self-assembly of block copolymers
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Enabling future nanomanufacturing through block copolymer self-assembly: A review
inferred← citeshttps://doi.org/10.1016/j.physrep.2021.07.005openalex-snapshot
Block copolymer thin films
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Influence of liquid crystalline formation on the phase behavior of side-chain liquid crystalline block copolymers
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Thickness-dependent ordering of perpendicularly oriented lamellae in PS-b-PMMA thin films
inferred← citeshttps://doi.org/10.1016/j.polymer.2016.06.069openalex-snapshot
Block copolymer thin films: Characterizing nanostructure evolution with in situ X-ray and neutron scattering
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Effect of solvent selectivity on supramolecular assemblies of block copolymer by solvent-vapor annealing
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Synthesis and characterization of poly(4-vinylpyridine)-block-poly(2,2,2-trifluoroethyl methacrylate) for manipulating periodic nanostructured architectures
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Tuning the morphology of block copolymer self-assembly-directed ultra-large porous carbons for electrochemical energy storage applications
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Microdomain homogeneity evaluation of perpendicular lamellar structures in block copolymer films: X-ray scattering and IR nanospectroscopy analyses
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Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication
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Restructuring in block copolymer thin films: In situ GISAXS investigations during solvent vapor annealing
inferred← citeshttps://doi.org/10.1016/j.snb.2021.131240openalex-snapshot
Poly(ethyleneoxide-block-methylmethacrylate) derived recessed nanodisc electrode array as an ultrasensitive electrochemical sensing platform for immunosensor
inferred← citeshttps://doi.org/10.1021/acs.chemmater.6b02967openalex-snapshot
Nanopatterning via Solvent Vapor Annealing of Block Copolymer Thin Films
inferred← citeshttps://doi.org/10.1021/acs.chemmater.6c01540openalex-snapshot
Evaporation-Induced Self-Assembly: Multiple Solvent-Dependent Pathways in High-χ Block Copolymers
inferred← citeshttps://doi.org/10.1021/acs.chemmater.7b01151openalex-snapshot
Competitive Interactions of π–π Junctions and Their Role on Microphase Separation of Chiral Block Copolymers
inferred← citeshttps://doi.org/10.1021/acs.langmuir.0c02261openalex-snapshot
Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm)
inferred← citeshttps://doi.org/10.1021/acs.langmuir.3c01988openalex-snapshot
Density Multiplication of Highly Periodic Sub-5 nm Supramolecular Dendrimer Cylinders on Block Copolymer Lamellar-Assisted High-Resolution Patterns
inferred← citeshttps://doi.org/10.1021/acs.langmuir.5b03419openalex-snapshot
Directed Self-Assembly of Block Copolymer Micelles onto Topographically Patterned Surface
inferred← citeshttps://doi.org/10.1021/acs.langmuir.6b01365openalex-snapshot
Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces
inferred← citeshttps://doi.org/10.1021/acs.langmuir.6c00489openalex-snapshot
Engineering Assembly Kinetics and Line Roughness in Solvent Vapor-Annealed Block Copolymer/Homopolymer Blends
inferred← citeshttps://doi.org/10.1021/acs.macromol.0c00274openalex-snapshot
Structure Memory Photonic Crystals Prepared by Hierarchical Self-Assembly of Semicrystalline Bottlebrush Block Copolymers
inferred← citeshttps://doi.org/10.1021/acs.macromol.0c01233openalex-snapshot
Dewetting-Induced Alignment and Ordering of Cylindrical Mesophases in Thin Block Copolymer Films
inferred← citeshttps://doi.org/10.1021/acs.macromol.0c02026openalex-snapshot
Large-Grained Cylindrical Block Copolymer Morphologies by One-Step Room-Temperature Casting
inferred← citeshttps://doi.org/10.1021/acs.macromol.0c02543openalex-snapshot
Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing
inferred← citeshttps://doi.org/10.1021/acs.macromol.3c01652openalex-snapshot
Engineering Self-Assembled Domain Asymmetry in Solvent Vapor Annealed Block Copolymer–Homopolymer Blend Films
inferred← citeshttps://doi.org/10.1021/acs.macromol.4c02262openalex-snapshot
Molecular Design of a Discrete Oligosaccharide-block-Oligodimethylsiloxane System: Toward Microphase Separation with 1 nm Domain Size and Angstrom-Scale Size Control
inferred← citeshttps://doi.org/10.1021/acs.macromol.5b02188openalex-snapshot
Optimized Solvent Vapor Annealing for Long-Range Perpendicular Lamellae in PS-b-PMMA Films
inferred← citeshttps://doi.org/10.1021/acs.macromol.6b00863openalex-snapshot
Ultrahigh Molecular Weight Linear Block Copolymers: Rapid Access by Reversible-Deactivation Radical Polymerization and Self-Assembly into Large Domain Nanostructures
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Preferential Wetting Effects on Order-to-Disorder Transition in Polystyrene-b-poly(2-vinylpyridine) Films: A Reconsideration on Thickness Dependence
inferred← citeshttps://doi.org/10.1021/acs.macromol.9b02296openalex-snapshot
Wet Brush Homopolymers as “Smart Solvents” for Rapid, Large Period Block Copolymer Thin Film Self-Assembly
inferred← citeshttps://doi.org/10.1021/acs.nanolett.7b00226openalex-snapshot
Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics
inferred← citeshttps://doi.org/10.1021/acs.nanolett.9b05189openalex-snapshot
Strain-Dependent Nanowrinkle Confinement of Block Copolymers
inferred← citeshttps://doi.org/10.1021/acsami.1c23865openalex-snapshot
Soft-Shear-Aligned Vertically Oriented Lamellar Block Copolymers for Template-Free Sub-10 nm Patterning and Hybrid Nanostructures
inferred← citeshttps://doi.org/10.1021/acsami.2c05911openalex-snapshot
Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns
inferred← citeshttps://doi.org/10.1021/acsami.4c05715openalex-snapshot
Assembling Vertical Block Copolymer Nanopores via Solvent Vapor Annealing on Homopolymer-Functionalized Substrates
inferred← citeshttps://doi.org/10.1021/acsami.4c18920openalex-snapshot
Printed Thin Magnetic Films via Ternary Hybrid Diblock Copolymer Films Containing Magnetic Iron Oxide and Nickel Nanoparticles
inferred← citeshttps://doi.org/10.1021/acsami.5b06259openalex-snapshot
Direct Immersion Annealing of Thin Block Copolymer Films
inferred← citeshttps://doi.org/10.1021/acsami.5b08162openalex-snapshot
Enhancing the Directed Self-assembly Kinetics of Block Copolymers Using Binary Solvent Mixtures
inferred← citeshttps://doi.org/10.1021/acsami.6b01767openalex-snapshot
Fast Fabrication of Sub-200-nm Nanogrooves Using Liquid Crystal Material
inferred← citeshttps://doi.org/10.1021/acsami.7b06228openalex-snapshot
Flexible Plasmonic Color Filters Fabricated via Nanotransfer Printing with Nanoimprint-Based Planarization
inferred← citeshttps://doi.org/10.1021/acsami.9b12817openalex-snapshot
Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation
inferred← citeshttps://doi.org/10.1021/acsanm.1c00582openalex-snapshot
Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication
inferred← citeshttps://doi.org/10.1021/acsapm.1c00680openalex-snapshot
From Lab to Fab: Enabling Enhanced Control of Block Polymer Thin-Film Nanostructures
inferred← citeshttps://doi.org/10.1021/acsmacrolett.1c00677openalex-snapshot
Pathway-Dependent Grain Coarsening of Block Copolymer Patterns under Controlled Solvent Evaporation
inferred← citeshttps://doi.org/10.1021/acsmacrolett.6c00016openalex-snapshot
Rapid Substrate Neutralization via Side-Chain Hydroxylated Copolymers for Efficient Vertical Alignment of Block Copolymers
inferred← citeshttps://doi.org/10.1021/acsnano.6b03857openalex-snapshot
Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns
inferred← citeshttps://doi.org/10.1021/acsnano.7b00322openalex-snapshot
Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moire Superstructures
inferred← citeshttps://doi.org/10.1021/acsnano.7b06154openalex-snapshot
Rapid Ordering in “Wet Brush” Block Copolymer/Homopolymer Ternary Blends
inferred← citeshttps://doi.org/10.1021/am502542kopenalex-snapshot
Optical and Conductive Properties of As-Synthesized Organic-Capped TiO2 Nanorods Highly Dispersible in Polystyrene-block-poly(methyl methacrylate) Diblock Copolymer
inferred← citeshttps://doi.org/10.1021/jacs.5c03175openalex-snapshot
Designing Highly Conductive Anion Exchange Membranes: Tuning Domain Continuity with ABC Block Copolymer Self-Assembly
inferred← citeshttps://doi.org/10.1021/jacs.8b00694openalex-snapshot
Exploiting Molecular Weight Distribution Shape to Tune Domain Spacing in Block Copolymer Thin Films
inferred← citeshttps://doi.org/10.1021/ma401112yopenalex-snapshot
Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication
inferred← citeshttps://doi.org/10.1021/ma402131jopenalex-snapshot
Unidirectional Alignment of Block Copolymer Films Induced by Expansion of a Permeable Elastomer during Solvent Vapor Annealing
inferred← citeshttps://doi.org/10.1021/ma402416gopenalex-snapshot
Co-Assembly of A–B Diblock Copolymers with B′-type Nanoparticles in Thin Films: Effect of Copolymer Composition and Nanoparticle Shape
inferred← citeshttps://doi.org/10.1021/ma500633bopenalex-snapshot
Lamellar Diblock Copolymer Thin Films during Solvent Vapor Annealing Studied by GISAXS: Different Behavior of Parallel and Perpendicular Lamellae
inferred← citeshttps://doi.org/10.1021/ma500716fopenalex-snapshot
Substrate-Independent Lamellar Orientation in High-Molecular-Weight Polystyrene-b-poly(methyl methacrylate) Films: Neutral Solvent Vapor and Thermal Annealing Effect
inferred← citeshttps://doi.org/10.1021/mz400269kopenalex-snapshot
Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing
inferred← citeshttps://doi.org/10.1021/mz500484kopenalex-snapshot
Controlled Nanopores by Supramolecular Assembly of End-Functionalized Dendrimer and Homopolymer Blend
inferred← citeshttps://doi.org/10.1021/nl4021683openalex-snapshot
Solvothermal Annealing of Block Copolymer Thin Films
inferred← citeshttps://doi.org/10.1021/nn401877gopenalex-snapshot
Macroscopic Vertical Alignment of Nanodomains in Thin Films of Semiconductor Amphiphilic Block Copolymers
inferred← citeshttps://doi.org/10.1021/nn401968topenalex-snapshot
Conversion of Bilayers of PS-b-PDMS Block Copolymer into Closely Packed, Aligned Silica Nanopatterns
inferred← citeshttps://doi.org/10.1021/nn402639gopenalex-snapshot
On the Self-Assembly of Brush Block Copolymers in Thin Films
inferred← citeshttps://doi.org/10.1021/nn403847zopenalex-snapshot
Membranes with Highly Ordered Straight Nanopores by Selective Swelling of Fast Perpendicularly Aligned Block Copolymers
inferred← citeshttps://doi.org/10.1021/nn5009098openalex-snapshot
Deconvoluting the Mechanism of Microwave Annealing of Block Copolymer Thin Films
inferred← citeshttps://doi.org/10.1021/nn505886zopenalex-snapshot
Probing the Effect of Molecular Nonuniformity in Directed Self-Assembly of Diblock Copolymers in Nanoconfined Space
inferred← citeshttps://doi.org/10.1038/pj.2016.9openalex-snapshot
Controlling the microdomain orientation in block copolymer thin films via cross-linkable random copolymer neutral layer
inferred← citeshttps://doi.org/10.1038/s41598-019-54648-3openalex-snapshot
Self-Assembly in ultrahigh molecular weight sphere-forming diblock copolymer thin films under strong confinement
inferred← citeshttps://doi.org/10.1038/s44287-024-00017-wopenalex-snapshot
Intelligent block copolymer self-assembly towards IoT hardware components
inferred← citeshttps://doi.org/10.1038/srep36326openalex-snapshot
Giant Gyroid and Templates from High-Molecular-Weight Block Copolymer Self-assembly
inferred← citeshttps://doi.org/10.1039/c3sm51083bopenalex-snapshot
Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large
inferred← citeshttps://doi.org/10.1039/c5nr02038gopenalex-snapshot
Solvent-like ligand-coated ultrasmall cadmium selenide nanocrystals: strong electronic coupling in a self-organized assembly
inferred← citeshttps://doi.org/10.1039/c7me00062fopenalex-snapshot
Inverting the design path for self-assembled block copolymers
inferred← citeshttps://doi.org/10.1039/c7me00069copenalex-snapshot
Beyond native block copolymer morphologies
inferred← citeshttps://doi.org/10.1039/c7me00106aopenalex-snapshot
Spatially-controllable and uniform photochemical transfer printing of block copolymer nanopatterns
inferred← citeshttps://doi.org/10.1039/c7nr07178gopenalex-snapshot
Bimodal phase separated block copolymer/homopolymer blends self-assembly for hierarchical porous metal nanomesh electrodes
inferred← citeshttps://doi.org/10.1039/c7sm01083dopenalex-snapshot
Domain swelling in ARB-type triblock copolymers via self-adjusting effective dispersity
inferred← citeshttps://doi.org/10.1039/c7tc02562aopenalex-snapshot
A versatile approach to different colored photonic films generated from block copolymers and their conversion into polymer-grafted nanoplatelets
inferred← citeshttps://doi.org/10.1039/c9cp00949copenalex-snapshot
Hybrid line–dot nanopatterns from directed self-assembly of diblock copolymers by trenches
inferred← citeshttps://doi.org/10.1039/c9ra09043fopenalex-snapshot
Real-time and in situ observation of structural evolution of giant block copolymer thin film under solvent vapor annealing by atomic force microscopy
inferred← citeshttps://doi.org/10.1039/c9sm01322aopenalex-snapshot
Automated solvent vapor annealing with nanometer scale control of film swelling for block copolymer thin films
inferred← citeshttps://doi.org/10.1039/d0nr01244kopenalex-snapshot
Adsorption and ordering of amphiphilic rod–coil block copolymers on a substrate: conditions for well-aligned stripe nanopatterns
inferred← citeshttps://doi.org/10.1039/d0ra08730kopenalex-snapshot
Large area Al 2 O 3 –Au raspberry-like nanoclusters from iterative block-copolymer self-assembly
inferred← citeshttps://doi.org/10.1039/d2sm00439aopenalex-snapshot
Solvent-assisted self-assembly of block copolymer thin films
inferred← citeshttps://doi.org/10.1039/d6nr01201aopenalex-snapshot
Decoupling interfacial neutrality and film stability in high- χ PS- b -PDMSB block copolymer thin films
inferred← citeshttps://doi.org/10.1063/5.0152666openalex-snapshot
Solvothermal vapor annealing setup for thin film treatment: A compact design with in situ solvent vapor concentration probe
inferred← citeshttps://doi.org/10.1080/0889311x.2016.1277212openalex-snapshot
Recent applications of synchrotron radiation and neutrons in the study of soft matter
inferred← citeshttps://doi.org/10.1080/15980316.2017.1410500openalex-snapshot
Curvatures of smectic liquid crystals and their applications
inferred← citeshttps://doi.org/10.1088/0953-8984/28/40/403002openalex-snapshot
Rapid ordering of block copolymer thin films
inferred← citeshttps://doi.org/10.1088/0957-4484/25/27/275601openalex-snapshot
Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing
inferred← citeshttps://doi.org/10.1088/1361-6528/aa61c9openalex-snapshot
Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film
inferred← citeshttps://doi.org/10.1088/1361-6528/aa8748openalex-snapshot
Phosphorene-directed self-assembly of asymmetric PS- b -PMMA block copolymer for perpendicularly-oriented sub-10 nm PS nanopore arrays
inferred← citeshttps://doi.org/10.1088/1361-6528/ab8cefopenalex-snapshot
Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
inferred← citeshttps://doi.org/10.1088/1361-6528/ac6315openalex-snapshot
Thin film block copolymer self-assembly for nanophotonics
inferred← citeshttps://doi.org/10.1116/1.4991874openalex-snapshot
Synthesis and self-assembly of low χ block copolymers with large periodicity
inferred← citeshttps://doi.org/10.1116/1.5129667openalex-snapshot
Formation and optical response of self-assembled gold nanoparticle lattices on oxidized silicon synthesized using block copolymers
inferred← citeshttps://doi.org/10.1117/12.2045754openalex-snapshot
Aninsituhard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate
inferred← citeshttps://doi.org/10.1371/journal.pone.0133088openalex-snapshot
Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns
inferred← citeshttps://doi.org/10.1515/epoly-2020-0013openalex-snapshot
Synthesis of amphiphilic poly(ethylene glycol)-block-poly(methyl methacrylate) containing trityl ether acid cleavable junction group and its self-assembly into ordered nanoporous thin films
inferred← citeshttps://doi.org/10.2494/photopolymer.31.479openalex-snapshot
Ordering and Orientation of Giant Nanostructures from High-Molecular-Weight Block Copolymer via Solvent Vapor Annealing Process
inferred← citeshttps://doi.org/10.3390/nano8010032openalex-snapshot
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography
inferred← citeshttps://doi.org/10.3390/polym11081312openalex-snapshot
Temperature-Controlled Solvent Vapor Annealing of Thin Block Copolymer Films
inferred← citeshttps://doi.org/10.3390/polym13132209openalex-snapshot
Fabrication of Nanoscale Oxide Textured Surfaces on Polymers
inferred← citeshttps://doi.org/10.3390/polym14214568openalex-snapshot
Well-Defined Nanostructures by Block Copolymers and Mass Transport Applications in Energy Conversion
inferred← citeshttps://doi.org/10.3390/polym16131943openalex-snapshot
Disclosing Topographical and Chemical Patterns in Confined Films of High-Molecular-Weight Block Copolymers under Controlled Solvothermal Annealing
inferred← citeshttps://doi.org/10.70675/97c22ec6z27f0z4af6zb7a6z1eee15d2f63dopenalex-snapshot
Films minces hybrides de copolymères à bloc et de nanorésonateurs plasmoniques pour la conception de métamatériaux optiques.
inferred← citeshttps://doi.org/10.70675/c8f04190z5766z45abzb061z1efe0d5e2777openalex-snapshot
Développement de procédés de lithographie avancée par auto-assemblage de copolymères à blocs de haute résolution
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