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An effective strategy for the preparation of intrinsic low- k and ultralow-loss dielectric polysiloxanes at high frequency by introducing trifluoromethyl groups into the polymers
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
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Hot-pressing sintered BN-SiO2 composite ceramics with excellent thermal conductivity and dielectric properties for high frequency substrate
inferredcites →https://doi.org/10.1016/j.progpolymsci.2003.08.003openalex-snapshot
Oligo- and polysiloxanes
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An Intrinsically Microporous Network Polymer with Good Dielectric Properties at High Frequency
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Facile Strategy for Intrinsic Low- k Dielectric Polymers: Molecular Design Based on Secondary Relaxation Behavior
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Synthesis of a Novel Poly(binaphthylene ether) Containing Trifluoromethyl Groups with a Low Dielectric Constant
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Postpolymerization of Functional Organosiloxanes: An Efficient Strategy for Preparation of Low-k Material with Enhanced Thermostability and Mechanical Properties
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inferredcites →https://doi.org/10.1039/c3ra44991bopenalex-snapshot
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inferredcites →https://doi.org/10.1039/c8py00407bopenalex-snapshot
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inferredcites →https://doi.org/10.1039/c8tc06236fopenalex-snapshot
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What points at this work
Incoming claims: where this work appears in other papers’ reference lists and arguments.
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