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Relative angle determinable stitching interferometry for hard x-ray reflective optics
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
inferredcites →https://doi.org/10.1016/s0168-9002(01)00446-6openalex-snapshot
SPring-8 RIKEN beamline III for coherent X-ray optics
inferredcites →https://doi.org/10.1038/44791openalex-snapshot
High-efficiency multilevel zone plates for keV X-rays
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Influence of environmental changes on degradation of chiral pollutants in soils
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Elliptical x-ray microprobe mirrors by differential deposition
inferredcites →https://doi.org/10.1063/1.1510573openalex-snapshot
Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining
inferredcites →https://doi.org/10.1063/1.1569405openalex-snapshot
Microstitching interferometry for x-ray reflective optics
inferredcites →https://doi.org/10.1063/1.1606531openalex-snapshot
Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining
inferredcites →https://doi.org/10.1107/s0909049502012578openalex-snapshot
Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror
inferredcites →https://doi.org/10.1107/s090904950401283xopenalex-snapshot
Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics
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Retrieval of Earth observation data in visible and near-infrared bands
inferredcites →https://doi.org/10.1117/12.448496openalex-snapshot
Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics
inferredcites →https://doi.org/10.1117/12.450227openalex-snapshot
Submicron focusing of hard x rays with reflecting surfaces at the ESRF
inferredcites →https://doi.org/10.1117/12.453622openalex-snapshot
Precision optical asphere fabrication by plasma jet chemical etching (PJCE) and ion beam figuring
inferredcites →https://doi.org/10.1143/jjap.42.7129openalex-snapshot
Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining
inferredcites →https://doi.org/10.1364/ao.38.005468openalex-snapshot
Improvements in the accuracy and the repeatability of long trace profiler measurements
inferredcites →https://doi.org/10.1364/ao.39.002122openalex-snapshot
Interference imaging for aspheric surface testing
What points at this work
Incoming claims: where this work appears in other papers’ reference lists and arguments.
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Beamlines for Materials Science
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Measurement of Freeform Optical Surfaces: Trade‐Off between Accuracy and Dynamic Range
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Stitching interferometric metrology for steeply curved x‐ray mirrors
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Fabrication of Ultraprecisely Figured Mirror for Nano Focusing Hard-x-ray
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Focusing Mirror for Coherent Hard X-Rays
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Investigation of the Surface Removal Process of Silicon Carbide in Elastic Emission Machining
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Ion Beam Figuring System for Synchrotron X-Ray Mirrors Achieving Sub-0.2-µrad and Sub-0.5-nm Root Mean Square
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Alignment aberrations compensation for near-cylinder surface stitching interferometry with near-null Computer-Generated Hologram based on Legendre-Fourier polynomials
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One-dimensional surface profile retrieval from grazing incidence images under coherent X-ray illumination
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In-situ metrology for the optimization of bent crystals used in hard-X-ray monochromators: Comparison between measurement and simulation
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One-dimensional sub-10-nm hard X-ray focusing using laterally graded multilayer mirror
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Current status of the NSLS-II optical metrology laboratory
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Absolute calibration of optical flats using the three-flat test by considering the relative humidity change
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Development of a high-performance gantry system for a new generation of optical slope measuring profilers
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Stitching interferometry for synchrotron mirror metrology at National Synchrotron Light Source II (NSLS-II)
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Wavefront preserving X-ray optics for Synchrotron and Free Electron Laser photon beam transport systems
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Multilevel-type multilayer X-ray lens (Fresnel zone plate) by sputter deposition
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Optical Metrology for X-ray Optics at the Hefei Advanced Light Facility (HALF)
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Generation of 1020 W cm−2 hard X-ray laser pulses with two-stage reflective focusing system
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Focusing of X-ray free-electron laser pulses with reflective optics
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Breaking the 10 nm barrier in hard-X-ray focusing
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Speckle-based curvature optical metrology
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Ellipsoidal mirror for two-dimensional 100-nm focusing in hard X-ray region
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Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors
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Multi-frame blind deconvolution using X-ray microscope images of an in-plane rotating sample
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Nearly diffraction-limited X-ray focusing with variable-numerical-aperture focusing optical system based on four deformable mirrors
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50-nm-resolution full-field X-ray microscope without chromatic aberration using total-reflection imaging mirrors
inferred← citeshttps://doi.org/10.1063/1.1922827openalex-snapshot
Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50nm
inferred← citeshttps://doi.org/10.1063/1.2216870openalex-snapshot
At-wavelength figure metrology of hard x-ray focusing mirrors
inferred← citeshttps://doi.org/10.1063/1.2349594openalex-snapshot
Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level
inferred← citeshttps://doi.org/10.1063/1.2358699openalex-snapshot
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inferred← citeshttps://doi.org/10.1063/1.2964928openalex-snapshot
Focusing mirror for x-ray free-electron lasers
inferred← citeshttps://doi.org/10.1063/1.4929323openalex-snapshot
Development of ion beam figuring system with electrostatic deflection for ultraprecise X-ray reflective optics
inferred← citeshttps://doi.org/10.1063/1.4950714openalex-snapshot
Stitching interferometry for ellipsoidal x-ray mirrors
inferred← citeshttps://doi.org/10.1063/1.4950745openalex-snapshot
Stitching methods at the European Synchrotron Radiation Facility (ESRF)
inferred← citeshttps://doi.org/10.1063/1.4960593openalex-snapshot
Compensation of X-ray mirror shape-errors using refractive optics
inferred← citeshttps://doi.org/10.1063/1.5026440openalex-snapshot
Systematic-error-free wavefront measurement using an X-ray single-grating interferometer
inferred← citeshttps://doi.org/10.1063/1.5061930openalex-snapshot
Surface shape determination with a stitching Michelson interferometer and accuracy evaluation
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Optimal deformation procedure for hybrid adaptive x-ray mirror based on mechanical and piezo-driven bending system
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Fabrication of soft x-ray monolithic Wolter mirror based on surface scanning measurement using touch probe
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Fabrication of ultrashort sub-meter-radius x-ray mirrors using dynamic stencil deposition with figure correction
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Mechanical design of a parallel flexure-based RADSI instrument for curved x-ray mirror metrology
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Improving the quality of x-ray mirrors: An inter-lab, optical metrology collaboration to guide deterministic polishing
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LTP-corrected stitching interferometer achieving sub-nanometer accuracy for x-ray mirror metrology
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How 100-pm figure errors in x-ray mirrors affect the image of 100-keV undulator radiation
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Zero-method scanning-probe profilometer for steeply curved aspheric x-ray mirrors
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Improvements in optical metrology for high-performance variable-line-spacing x-ray gratings
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Magnetorheological methods for nanofinishing – a review
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A Precision Grazing-incidence Angle Error Measurement of a Hard X-ray Condenser Mirror Using Single-grating Interferometry
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Advancement of Hard X-ray Nano-focusing Ellipsoidal Mirror at SPring-8
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Simulation and Experimental Study of Wavefront Measurement Accuracy of the Pencil-Beam Method
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Advanced abrasive-based nano-finishing processes: challenges, principles and recent applications
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Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors
inferred← citeshttps://doi.org/10.1088/1361-6501/adc6a4openalex-snapshot
High-precision reconstruction of second- and high-order reference errors based on sub-aperture stitching interferometry
inferred← citeshttps://doi.org/10.1088/1361-6501/ae3c39openalex-snapshot
A rapid evaluation method for relative angle determinable stitching interferometry (RADSI) measurement errors based on cumulative-sum (CS) of angle measurement errors (AME)
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Short-wavelength free-electron laser sources and science: a review *
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Measurements for static shape control optimization of silicon mirror using nonlinear piezoceramic actuators
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Stitching interferometric measurement system for hard x-ray nanofocusing mirrors
inferred← citeshttps://doi.org/10.1088/1742-6596/425/5/052022openalex-snapshot
Micro-focusing of hard x-ray free electron laser radiation using Kirkpatrick-Baez mirror system
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Direct determination of the wave field of an x-ray nanobeam
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A Shack–Hartmann measuring head for the two-dimensional characterization of X-ray mirrors
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Optics for coherent X-ray applications
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Nanofocusing of X-ray free-electron lasers by grazing-incidence reflective optics
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Hybrid height and slope figuring method for grazing-incidence reflective optics
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Legendre Polynomial Filtered Microstitching Interferometry for Mid-Frequency Form Error of X-Ray Flat Mirrors With Sub-Nanometer Peak-to-Valley Accuracy
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Reliable before-fabrication forecasting of expected surface slope distributions for x-ray optics
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Correlation analysis of surface slope metrology measurements of high quality x-ray optics
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Development of achromatic full-field hard x-ray microscopy with two monolithic imaging mirrors
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Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope
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Development of relative angle determinable stitching interferometry for high-accuracy x-ray focusing mirrors
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Surface slope metrology of highly curved x-ray optics with an interferometric microscope
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The ALS OSMS: Optical Surface Measuring System for high accuracy two-dimensional slope metrology with state-of-the-art x-ray mirrors
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Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with aspheric x-ray optics
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Towards new generation long trace profiler LTP-2020: system design with different sensors in different operation modes
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Performance of plane wavefront Fizeau interferometers in power spectral density measurements with tilted plane optics
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Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics
inferred← citeshttps://doi.org/10.1117/12.3028501openalex-snapshot
Application of steeply curved free-form x-ray mirror fabrication process to a high-precision plane surface
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Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror
inferred← citeshttps://doi.org/10.1117/12.795643openalex-snapshot
Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm
inferred← citeshttps://doi.org/10.1117/12.860405openalex-snapshot
Development of a one-dimensional Wolter mirror for an advanced Kirkpatrick-Baez mirror
inferred← citeshttps://doi.org/10.1117/12.892987openalex-snapshot
Development of a one-dimensional Wolter mirror for achromatic full-field x-ray microscopy
inferred← citeshttps://doi.org/10.1134/s102745101904027xopenalex-snapshot
Kirkpatrick–Baez and Wolter X-Ray Focusing Optics (Review)
inferred← citeshttps://doi.org/10.1143/jjap.44.l539openalex-snapshot
Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors
inferred← citeshttps://doi.org/10.1149/1.2220068openalex-snapshot
Effect of Particle Morphology on Removal Rate and Surface Topography in Elastic Emission Machining
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An overview of magnetorheological polishing fluid applied in nano-finishing of components
inferred← citeshttps://doi.org/10.1364/ao.433143openalex-snapshot
Simulation and measurement of systematic errors of stitching interferometry for high precision X-ray mirrors with large radius of curvature
inferred← citeshttps://doi.org/10.1364/ao.516190openalex-snapshot
Stitching interferometry for long X-ray mirrors with lateral multi-shift-based absolute calibration
inferred← citeshttps://doi.org/10.1364/ao.56.000967openalex-snapshot
Simulation of concave–convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope
inferred← citeshttps://doi.org/10.1364/ao.56.009193openalex-snapshot
Stitching test of large flats by using two orthogonally arranged wavefront interferometers
inferred← citeshttps://doi.org/10.1364/ao.58.008658openalex-snapshot
Absolute metrology method of the x-ray mirror with speckle scanning technique
inferred← citeshttps://doi.org/10.1364/fio.2005.jwa10openalex-snapshot
Focusing Hard X-rays to Sub-50 nm Size by Elliptically Figured Mirror
inferred← citeshttps://doi.org/10.1364/fio.2005.jwa9openalex-snapshot
Stitching Interferometry for Surface Figure Measurement of X-ray Reflective Optics
inferred← citeshttps://doi.org/10.1364/fio.2008.fwn1openalex-snapshot
Optical Metrology Requirements for Coherence-Preserving and Next-Generation X-Ray Mirrors
inferred← citeshttps://doi.org/10.1364/fio.2009.fthg3openalex-snapshot
10nm-Level Focusing of Hard X-Rays by KB Mirrors
inferred← citeshttps://doi.org/10.1364/oe.18.015807openalex-snapshot
Improving the lateral resolution of a multi-sensor profile measurement method by non-equidistant sensor spacing
inferred← citeshttps://doi.org/10.1364/oe.20.010310openalex-snapshot
Hard-X-ray imaging optics based on four aspherical mirrors with 50 nm resolution
inferred← citeshttps://doi.org/10.1364/oe.20.024977openalex-snapshot
Wavefront measurement for a hard-X-ray nanobeam using single-grating interferometry
inferred← citeshttps://doi.org/10.1364/oe.23.009746openalex-snapshot
Achromatic and high-resolution full-field X-ray microscopy based on total-reflection mirrors
inferred← citeshttps://doi.org/10.1364/oe.25.009393openalex-snapshot
One-dimensional stitching interferometry assisted by a triple-beam interferometer
inferred← citeshttps://doi.org/10.1364/oe.26.009882openalex-snapshot
One-dimensional angular-measurement-based stitching interferometry
inferred← citeshttps://doi.org/10.1364/oe.26.017477openalex-snapshot
Nearly diffraction-limited hard X-ray line focusing with hybrid adaptive X-ray mirror based on mechanical and piezo-driven deformation
inferred← citeshttps://doi.org/10.1364/oe.26.020192openalex-snapshot
Repeatability analysis of one-dimensional angular-measurement-based stitching interferometry
inferred← citeshttps://doi.org/10.1364/oe.26.023278openalex-snapshot
Two-dimensional stitching interferometry based on tilt measurement
inferred← citeshttps://doi.org/10.1364/oe.27.003429openalex-snapshot
Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors
inferred← citeshttps://doi.org/10.1364/oe.27.026940openalex-snapshot
Two-dimensional stitching interferometry for self-calibration of high-order additive systematic errors
inferred← citeshttps://doi.org/10.1364/oe.486829openalex-snapshot
Mixed stitching interferometry with correction from one-dimensional profile measurements for high-precision X-ray mirrors
inferred← citeshttps://doi.org/10.1364/oe.493789openalex-snapshot
Propagation-based phase-contrast imaging method for full-field X-ray microscopy using advanced Kirkpatrick–Baez mirrors
inferred← citeshttps://doi.org/10.1364/oe.541002openalex-snapshot
Subaperture moving strategy and related systematic errors in stitching interferometry of X-ray mirrors
inferred← citeshttps://doi.org/10.1364/oe.562946openalex-snapshot
Angle measurement accuracy requirement analysis for the relative angle determinable stitching interferometry (RADSI)
inferred← citeshttps://doi.org/10.1364/oe.574401openalex-snapshot
Fabrication of electroless nickel coated X-ray ellipsoidal mirrors with hybrid metrology method combining CGH and contact profilometer
inferred← citeshttps://doi.org/10.1364/ol.35.003583openalex-snapshot
One-dimensional Wolter optics with a sub-50 nm spatial resolution
inferred← citeshttps://doi.org/10.1364/ol.564791openalex-snapshot
Slope error evaluation method for interferometric test results of X-ray mirrors
inferred← citeshttps://doi.org/10.1364/ol.588584openalex-snapshot
Self-calibrated stitching metrology for X-ray flat mirrors with the power- x term calibrated by grazing-incidence absolute testing
inferred← citeshttps://doi.org/10.1364/optica.386012openalex-snapshot
Compact full-field hard x-ray microscope based on advanced Kirkpatrick–Baez mirrors
inferred← citeshttps://doi.org/10.2184/lsj.35.3_162openalex-snapshot
Ultraprecision Machining Method for Ultraprecise Aspherical Mirror
inferred← citeshttps://doi.org/10.2184/lsj.40.9_691openalex-snapshot
Nanofocusing of X-Ray Free Electron Laser
inferred← citeshttps://doi.org/10.2493/jjspe.75.1387openalex-snapshot
Development of Long Focusing Mirror for X-ray Free Electron Laser
inferred← citeshttps://doi.org/10.2493/jjspe.76.338openalex-snapshot
Development of nanometer level accurate computer-controlled figuring with high spatial resolution and its application to hard X-ray focusing mirror
inferred← citeshttps://doi.org/10.2493/jjspe.83.300openalex-snapshot
Forefront of Development of Ultraprecise X-ray Mirrors for Synchrotron Radiation X-rays
inferred← citeshttps://doi.org/10.2493/jjspe.86.32openalex-snapshot
X-ray Optics and Ultraprecision Machining in Heisei : A Review —Development of Diffraction-Limited X-ray Condenser Mirror as a Cutting-Edge Application of Ultraprecision Machining Methods—
inferred← citeshttps://doi.org/10.2493/jjspe.91.32openalex-snapshot
Breakthroughs to a New Frontier in X-Ray
inferred← citeshttps://doi.org/10.2493/jjspe.92.717openalex-snapshot
Development of a Shape Evaluation Apparatus for Wolter Mirrors in X-ray Telescopes
inferred← citeshttps://doi.org/10.2493/jspe.71.1137openalex-snapshot
Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties
inferred← citeshttps://doi.org/10.2493/jspe.72.884openalex-snapshot
Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution
inferred← citeshttps://doi.org/10.3390/coatings10040357openalex-snapshot
Theoretical and Experimental Study of Particle Distribution from Magnetron Sputtering with Masks for Accurate Thickness Profile Control
inferred← citeshttps://doi.org/10.3390/photonics12111106openalex-snapshot
Stitching Interferometry for X-Ray Mirror Metrology at the Hefei Advanced Light Facility (HALF)
inferred← citeshttps://doi.org/10.3390/s20226660openalex-snapshot
Quantitative X-ray Channel-Cut Crystal Diffraction Wavefront Metrology Using the Speckle Scanning Technique
inferred← citeshttps://doi.org/10.37188/lam.2026.098openalex-snapshot
In-house pipeline from atomic-scale fabrication to at-wavefront validation of synchrotron X-ray nanofocusing mirrors
inferred← citeshttps://doi.org/10.4028/www.scientific.net/kem.516.251openalex-snapshot
Development of Focusing System for X-Ray Free Electron Laser
inferred← citeshttps://doi.org/10.5772/37100openalex-snapshot
Nano-Accuracy Surface Figure Metrology of Precision Optics
inferred← citeshttps://doi.org/10.70675/b3dd7a77z8d35z4625z8974za280795d4f10openalex-snapshot
Development of an extreme ultraviolet laser beamline for at wavelength metrology
inferred← citeshttps://doi.org/10.70675/ea92ca9fz4cb8z433fz80e7z23debcab3ddaopenalex-snapshot
The application of wavefront sensing methods to optical surface metrology
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