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Unearthing [3‐(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al2O3: Synthesis, Characterization and ALD Process Development
Plasma Chemical Study of a RF Discharge Containing Aluminum Tri‐Isopropoxide Using MIR Absorption Spectroscopy Based on External‐Cavity Quantum Cascade Lasers
Thickness evaluation of AlOx barrier layers for encapsulation of flexible PV modules in industrial environments by normal reflectance and machine learning
Effects of surface pretreatment and deposition conditions on the gas permeation properties and flexibility of Al2O3 films on polymer substrates by atomic layer deposition
Post-deposition annealing process as a defect-driven tool for tuning the chemical and electron properties of sol–gel spin-coated aluminium oxide thin layers
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials
Synthesis and characterization of a fluorinated oligosiloxane-containing encapsulation material for organic field-effect transistors, prepared via a non-hydrolytic sol–gel process
Growth behavior and improved water–vapor-permeation-barrier properties of 10-nm-thick single Al2O3 layer grown via cyclic chemical vapor deposition on organic light-emitting diodes
Effect of bias frequency variation on the characteristics of SiOX thin films deposited by atmospheric pressure chemical vapor deposition using a double discharge system
Gas diffusion barrier characteristics of Al2O3/alucone films formed using trimethylaluminum, water and ethylene glycol for organic light emitting diode encapsulation
Performance improvement of inverted organic solar cells by adding ultrathin Al 2 O 3 as an electron selective layer and a plasma enhanced chemical vapor deposition of SiO x encapsulating layer
SiOx:C/SiO2-like gas barrier multilayer thin films deposited by radio frequency magnetron sputtering-based plasma polymerization system
showing the first 200 of 392
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