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X-ray photoelectron spectroscopy study of high-k CeO2/La2O3 stacked dielectrics
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
inferredcites →https://doi.org/10.1007/s10562-009-0177-7openalex-snapshot
Effect of La2O3 on Ru/CeO2-La2O3 Catalyst for Ammonia Synthesis
inferredcites →https://doi.org/10.1016/j.cattod.2007.06.005openalex-snapshot
The SMSI between supported platinum and CeO2–ZrO2–La2O3 mixed oxides in oxidative atmosphere
inferredcites →https://doi.org/10.1016/j.jallcom.2008.08.050openalex-snapshot
Photoluminescence enhancement induced by nanoparticles from La2O3 and CeO2 doped diamond-like carbon films
inferredcites →https://doi.org/10.1016/j.jcrysgro.2012.06.050openalex-snapshot
Stoichiometry–structure correlation of epitaxial Ce1−Pr O2− (x=0−1) thin films on Si(111)
inferredcites →https://doi.org/10.1016/j.mee.2006.01.271openalex-snapshot
On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors
inferredcites →https://doi.org/10.1016/j.microrel.2010.02.001openalex-snapshot
Advantage of further scaling in gate dielectrics below 0.5nm of equivalent oxide thickness with La2O3 gate dielectrics
inferredcites →https://doi.org/10.1016/j.microrel.2011.10.009openalex-snapshot
Improving the electrical characteristics of MOS transistors with CeO2/La2O3 stacked gate dielectric
inferredcites →https://doi.org/10.1016/j.vacuum.2011.06.023openalex-snapshot
Effects of aluminum doping on lanthanum oxide gate dielectric films
inferredcites →https://doi.org/10.1016/j.vacuum.2011.09.010openalex-snapshot
Properties of CeOx/La2O3 gate dielectric and its effects on the MOS transistor characteristics
inferredcites →https://doi.org/10.1016/s0022-3697(99)00218-8openalex-snapshot
Determination of Ce4+/Ce3+ in electron-beam-damaged CeO2 by electron energy-loss spectroscopy
inferredcites →https://doi.org/10.1016/s0169-4332(99)00577-2openalex-snapshot
Study of CeO2 XPS spectra by factor analysis: reduction of CeO2
inferredcites →https://doi.org/10.1016/s0169-4332(99)00597-8openalex-snapshot
XPS study of oxidation processes of CeOx defective layers
inferredcites →https://doi.org/10.1063/1.3445874openalex-snapshot
Annealing effects on a high-k lanthanum oxide film on Si (001) analyzed by aberration-corrected transmission electron microscopy/scanning transmission electron microscopy and electron energy loss spectroscopy
inferredcites →https://doi.org/10.1063/1.4768943openalex-snapshot
Current conduction and stability of CeO2/La2O3 stacked gate dielectric
inferredcites →https://doi.org/10.1116/1.1577569openalex-snapshot
X-ray photoelectron spectroscopy study of electrodeposited nanostructured CeO2 films
inferredcites →https://doi.org/10.1149/05005.0013ecstopenalex-snapshot
Introduction of New Materials into CMOS Devices
inferredcites →https://doi.org/10.1149/1.3268128openalex-snapshot
XPS Study of the Bonding Properties of Lanthanum Oxide/Silicon Interface with a Trace Amount of Nitrogen Incorporation
inferredcites →https://doi.org/10.1149/1.3633293openalex-snapshot
(Invited) XPS Study on Chemical Bonding States of high-κ/high-μ Gate Stacks for Advanced CMOS
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