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E-beam inspection throughput acceleration via Targeted Critical Area Inspection

https://doi.org/10.1109/asmc.2015.7164491

0 signed · 9 inferred · view as graph

Inferred edges come from two machine sources: sweeps of open repository metadata (mostly SSRN and Zenodo), and a bulk OpenAlex citation snapshot. Every row below is labelled with the one it came from. Neither is a complete citation index — absence here is not evidence of absence.

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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1109/asmc.2013.6552748openalex-snapshot

Early detection of systematic patterning problems for a 22nm SOI technology using E-beam hot spot inspection

inferredcites →https://doi.org/10.1109/asmc.2013.6552749openalex-snapshot

Early detection of electrical defects in deep trench capacitors using voltage contrast inspection

inferredcites →https://doi.org/10.1109/iitc.2002.1014878openalex-snapshot

Rapid interconnect development using an area accelerated electron beam inspection methodology

inferredcites →https://doi.org/10.1109/tsm.2007.901826openalex-snapshot

Voltage Contrast for Gate-Leak Failures Detected by Electron Beam Inspection

inferredcites →https://doi.org/10.1109/tsm.2013.2283293openalex-snapshot

Detection of Sub-Design Rule Physical Defects Using E-Beam Inspection

inferredcites →https://doi.org/10.1117/12.918072openalex-snapshot

E-beam inspection system for comparison of wafer and design data

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

inferred← citeshttps://doi.org/10.2139/ssrn.3371939openalex-extracted

Wafer Defect Inspection Optimization: Models, Analysis and Algorithms

inferred← citeshttps://doi.org/10.1109/asmc49169.2020.9185264openalex-snapshot

Creative Use of Vector Scan for Efficient SRAM Inspection

inferred← citeshttps://doi.org/10.1109/tsm.2015.2477941openalex-snapshot

Full-Wafer Voltage Contrast Inspection for Detection of BEOL Defects

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