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Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

https://doi.org/10.1116/1.3528940
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/ppap.200931601openalex-snapshot
High Temporal Resolution Ion Energy Distribution Functions in HIPIMS Discharges
inferredcites →https://doi.org/10.1016/j.surfcoat.2009.05.048openalex-snapshot
Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering
inferredcites →https://doi.org/10.1016/j.surfcoat.2009.11.013openalex-snapshot
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
inferredcites →https://doi.org/10.1016/j.surfcoat.2009.12.013openalex-snapshot
The structure and properties of chromium nitride coatings deposited using dc, pulsed dc and modulated pulse power magnetron sputtering
inferredcites →https://doi.org/10.1016/j.tsf.2006.04.051openalex-snapshot
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
inferredcites →https://doi.org/10.1016/s0040-6090(99)00148-0openalex-snapshot
State of the art in large area vacuum coatings on glass
inferredcites →https://doi.org/10.1016/s0042-207x(01)00475-4openalex-snapshot
Influence of high power densities on the composition of pulsed magnetron plasmas
inferredcites →https://doi.org/10.1016/s0257-8972(00)00990-7openalex-snapshot
Time-resolved Langmuir probe measurements at the substrate position in a pulsed mid-frequency DC magnetron plasma
inferredcites →https://doi.org/10.1016/s0257-8972(01)01058-1openalex-snapshot
Characterisation studies of the pulsed dual cathode magnetron sputtering process for oxide films
inferredcites →https://doi.org/10.1016/s0257-8972(97)00516-1openalex-snapshot
Mid frequency sputtering — a novel tool for large area coating
inferredcites →https://doi.org/10.1016/s0257-8972(99)00292-3openalex-snapshot
A novel pulsed magnetron sputter technique utilizing very high target power densities
inferredcites →https://doi.org/10.1063/1.1148430openalex-snapshot
Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system
inferredcites →https://doi.org/10.1063/1.1310578openalex-snapshot
Comparison between fast-sweep Langmuir probe and triple probe for fluctuations measurements
inferredcites →https://doi.org/10.1063/1.1425447openalex-snapshot
Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma
inferredcites →https://doi.org/10.1063/1.1714492openalex-snapshot
Instantaneous Direct-Display System of Plasma Parameters by Means of Triple Probe
inferredcites →https://doi.org/10.1063/1.1800011openalex-snapshot
Handbook of Basic Atomic Spectroscopic Data
inferredcites →https://doi.org/10.1063/1.1808481openalex-snapshot
A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges
inferredcites →https://doi.org/10.1063/1.2159555openalex-snapshot
Influence of pulse duration on the plasma characteristics in high-power pulsed magnetron discharges
inferredcites →https://doi.org/10.1063/1.2362575openalex-snapshot
On the deposition rate in a high power pulsed magnetron sputtering discharge
inferredcites →https://doi.org/10.1063/1.2697052openalex-snapshot
Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion
inferredcites →https://doi.org/10.1063/1.2769805openalex-snapshot
Time-resolved triple probe investigations of a pulsed magnetron discharge
inferredcites →https://doi.org/10.1088/0022-3727/40/7/037openalex-snapshot
Process characteristics and film properties upon growth of TiOxfilms by high power pulsed magnetron sputtering
inferredcites →https://doi.org/10.1088/0963-0252/14/3/015openalex-snapshot
Plasma dynamics in a highly ionized pulsed magnetron discharge
inferredcites →https://doi.org/10.1088/1367-2630/8/4/047openalex-snapshot
Influence of substrate conditions on the temporal behaviour of plasma parameters in a pulsed dc magnetron discharge
inferredcites →https://doi.org/10.1116/1.2735968openalex-snapshot
Deposition of zinc oxide layers by high-power impulse magnetron sputtering
inferredcites →https://doi.org/10.1116/1.574434openalex-snapshot
Charge transport in magnetrons
inferredcites →https://doi.org/10.1116/1.581706openalex-snapshot
Using pulsed direct current power for reactive sputtering of Al2O3

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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inferred← citeshttps://doi.org/10.1002/ctpp.202400017openalex-snapshot
Studies on the spatial evolution of pulsed helium plasma
inferred← citeshttps://doi.org/10.1007/s10894-014-9815-1openalex-snapshot
Triple Probe Measurements in Transient Plasma of Pulsed Capacitive Discharge
inferred← citeshttps://doi.org/10.1007/s11837-011-0092-4openalex-snapshot
Recent advances in modulated pulsed power magnetron sputtering for surface engineering
inferred← citeshttps://doi.org/10.1016/b978-0-12-812454-3.00007-3openalex-snapshot
Hardware and power management for high power impulse magnetron sputtering
inferred← citeshttps://doi.org/10.1016/b978-0-12-812454-3.00008-5openalex-snapshot
Electron dynamics in high power impulse magnetron sputtering discharges
inferred← citeshttps://doi.org/10.1016/j.diamond.2025.113105openalex-snapshot
Plasma diagnostic and mechanical properties of tetrahedral amorphous carbon (ta-C) Thin films deposited by varying pulse power and mixed discharge parameters using high-power impulse magnetron sputtering
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2011.10.028openalex-snapshot
Structurally laminated CrN films deposited by multi pulse modulated pulsed power magnetron sputtering
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2011.11.037openalex-snapshot
Thick CrN/AlN superlattice coatings deposited by the hybrid modulated pulsed power and pulsed dc magnetron sputtering
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2012.04.019openalex-snapshot
Pulse management in high power pulsed magnetron sputtering of niobium
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2012.11.053openalex-snapshot
Structure and properties of CrSiN nanocomposite coatings deposited by hybrid modulated pulsed power and pulsed dc magnetron sputtering
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2014.08.043openalex-snapshot
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
inferred← citeshttps://doi.org/10.1016/j.vacuum.2020.109670openalex-snapshot
Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems
inferred← citeshttps://doi.org/10.1021/jp406521vopenalex-snapshot
Advanced Nanocluster Ion Source Based on High-Power Impulse Magnetron Sputtering and Time-Resolved Measurements of Nanocluster Formation
inferred← citeshttps://doi.org/10.1063/1.4838658openalex-snapshot
Time-resolved measurement of plasma parameters by means of triple probe
inferred← citeshttps://doi.org/10.1063/1.4878622openalex-snapshot
Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron
inferred← citeshttps://doi.org/10.1063/1.4921443openalex-snapshot
On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments
inferred← citeshttps://doi.org/10.1063/1.5009796openalex-snapshot
Study of plasma parameters in a pulsed plasma accelerator using triple Langmuir probe
inferred← citeshttps://doi.org/10.1063/5.0179553openalex-snapshot
A hybrid plasma model for Cr thin film deposition by deep oscillation magnetron sputtering
inferred← citeshttps://doi.org/10.1063/5.0319309openalex-snapshot
Electron phase space distribution in a magnetron sputtering discharge
inferred← citeshttps://doi.org/10.1081/e-eplt-120049697openalex-snapshot
High-Power Impulse Magnetron Sputtering (HiPIMS)
inferred← citeshttps://doi.org/10.1088/0741-3335/58/1/014002openalex-snapshot
On reactive high power impulse magnetron sputtering
inferred← citeshttps://doi.org/10.1088/0963-0252/22/4/045012openalex-snapshot
Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering
inferred← citeshttps://doi.org/10.1088/1361-6463/aa7544openalex-snapshot
Triple probe interrogation of spokes in a HiPIMS discharge
inferred← citeshttps://doi.org/10.1088/1361-6463/aa7e6dopenalex-snapshot
Ti atom and Ti ion number density evolution in standard and multi-pulse HiPIMS
inferred← citeshttps://doi.org/10.1088/1361-6463/aa9914openalex-snapshot
Probing the electron density in HiPIMS plasmas by target inserts
inferred← citeshttps://doi.org/10.1088/1361-6595/abb7bdopenalex-snapshot
Physics and technology of magnetron sputtering discharges
inferred← citeshttps://doi.org/10.1088/1361-6595/ac6d0aopenalex-snapshot
Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal
inferred← citeshttps://doi.org/10.1088/1402-4896/aca5c7openalex-snapshot
Time-resolved ion energy distribution functions during a HiPIMS discharge with cathode voltage reversal
inferred← citeshttps://doi.org/10.1109/nems.2013.6559764openalex-snapshot
Development of cluster ion source based on modulated pulse power magnetron sputtering technique
inferred← citeshttps://doi.org/10.1109/tps.2021.3129977openalex-snapshot
Measurement of Plasma Stream Parameters by Triple Probe in a Pulsed Plasma Accelerator
inferred← citeshttps://doi.org/10.1116/1.3691832openalex-snapshot
High power impulse magnetron sputtering discharge
inferred← citeshttps://doi.org/10.1116/1.4914174openalex-snapshot
Direct measurement and modeling of the redirected ion flux in a high-powered pulsed-plasma magnetron
inferred← citeshttps://doi.org/10.1116/6.0003287openalex-snapshot
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS
inferred← citeshttps://doi.org/10.1134/s0018151x19070022openalex-snapshot
Optical Emission and Langmuir Probe Diagnostic Measurements in DC Electrode Pulse Discharge in Nitrogen
inferred← citeshttps://doi.org/10.1134/s1063780x24601974openalex-snapshot
Generation of a Plasma Bunch in a Multichannel Injector of a Pulsed Plasma Accelerator
inferred← citeshttps://doi.org/10.1557/jmr.2012.8openalex-snapshot
An introduction to thin film processing using high-power impulse magnetron sputtering
inferred← citeshttps://doi.org/10.32469/10355/71254openalex-snapshot
Piezoelectric transformer plasma ion source characterization for neutron production
inferred← citeshttps://doi.org/10.3390/coatings15030353openalex-snapshot
Characterization of AlCrN Coated on Tungsten Carbide Substrate by a Continuous Plasma Nitriding-HiPIMS Hybrid Process
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