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Growth Kinetics and Crystallization Behavior of TiO[sub 2] Films Prepared by Plasma Enhanced Atomic Layer Deposition

https://doi.org/10.1149/1.2955724
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/sia.1296openalex-snapshot
Alteration of Ti 2p XPS spectrum for titanium oxide by low‐energy Ar ion bombardment
inferredcites →https://doi.org/10.1016/j.apsusc.2003.10.053openalex-snapshot
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
inferredcites →https://doi.org/10.1016/j.apsusc.2006.03.002openalex-snapshot
Superior thermal stability of Ta/TaN bi-layer structure for copper metallization
inferredcites →https://doi.org/10.1016/s0169-4332(00)00274-9openalex-snapshot
Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
inferredcites →https://doi.org/10.1016/s0169-4332(00)00842-4openalex-snapshot
Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism
inferredcites →https://doi.org/10.1021/cm00032a023openalex-snapshot
Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films
inferredcites →https://doi.org/10.1021/cm011046+openalex-snapshot
In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water
inferredcites →https://doi.org/10.1063/1.1473668openalex-snapshot
Gamma-ray-irradiation effects on the leakage current and reliability of sputtered TiO2 gate oxide in metal–oxide–semiconductor capacitors
inferredcites →https://doi.org/10.1063/1.2748312openalex-snapshot
Localized switching mechanism in resistive switching of atomic-layer-deposited TiO2 thin films
inferredcites →https://doi.org/10.1063/1.2757008openalex-snapshot
Impact of O3 feeding time on TiO2 films grown by atomic layer deposition for memory capacitor applications
inferredcites →https://doi.org/10.1063/1.2798384openalex-snapshot
Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O
inferredcites →https://doi.org/10.1116/1.2172941openalex-snapshot
Characteristics of atomic layer deposited TiO2 films and their photocatalytic activity
inferredcites →https://doi.org/10.1149/1.1805502openalex-snapshot
Characteristics of TiO[sub 2] Films Prepared by ALD With and Without Plasma
inferredcites →https://doi.org/10.1149/1.1938108openalex-snapshot
TiCl[sub 4] as a Precursor in the TiN Deposition by ALD and PEALD
inferredcites →https://doi.org/10.1149/1.1943589openalex-snapshot
Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor Applications
inferredcites →https://doi.org/10.1149/1.2168389openalex-snapshot
Diffusion Barrier Properties of Atomic Layer Deposited Ultrathin Ta[sub 2]O[sub 5] and TiO[sub 2] Films
inferredcites →https://doi.org/10.1149/1.2186427openalex-snapshot
Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors
inferredcites →https://doi.org/10.1149/1.2794289openalex-snapshot
Type of Plasmas and Microstructures of TiO[sub 2] Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

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Crystalline as-deposited TiO 2 anatase thin films grown from TDMAT and water using thermal atomic layer deposition with in situ layer-by-layer air annealing
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Oxide films
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Plasma‐Enhanced Chemical Vapor Deposition
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Precursors for ALD Processes
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High‐Performance Nanostructured Flexible Capacitor by Plasma‐Induced Low‐Temperature Atomic Layer Annealing
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Mechatronic Spatial Atomic Layer Deposition for Closed‐Loop and Customizable Process Control
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Multilayer Film Fabrication Using Flow Injection Coupled with Electrochemical Deposition
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TiO2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer
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Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition
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Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
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Microstructure and electrical properties of thin HfO2 deposited by plasma-enhanced atomic layer deposition
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Atomic layer deposition of TiO2 from tetrakis-dimethylamido-titanium and ozone
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Atomic Layer Deposition
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Infrared study on room-temperature atomic layer deposition of TiO2 using tetrakis(dimethylamino)titanium and remote-plasma-excited water vapor
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Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
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Structural, optical, and electrical properties of TiO2 thin films deposited by ALD: Impact of the substrate, the deposited thickness and the deposition temperature
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Reaction mechanism and film properties of the atomic layer deposition of ZrO2 thin films with a heteroleptic CpZr(N(CH3)2)3 precursor
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Influence of oxidants on the characteristics of atomic layer deposited TiO2 thin films
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Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization
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Atomic layer deposition paves the way for next-generation smart and functional textiles
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Plasma enhanced atomic layer deposition of magnesium oxide as a passivation layer for enhanced photoluminescence of ZnO nanowires
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TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
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Comparisons of alumina barrier films deposited by thermal and plasma atomic layer deposition
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Boosting non-volatile memory performance with exhalative annealing: A novel approach to low-temperature crystallization of hafnia based ferroelectric
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Atomic layer deposition of high-k dielectrics on III–V semiconductor surfaces
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Plasma-enhanced atomic layer deposition of BaTiO3
inferred← citeshttps://doi.org/10.1016/j.solmat.2017.09.030openalex-snapshot
TiO2 as intermediate buffer layer in Cu(In,Ga)Se2 solar cells
inferred← citeshttps://doi.org/10.1016/j.solmat.2026.114178openalex-snapshot
Local edge passivation of laser-scribed cells for compensating cut losses
inferred← citeshttps://doi.org/10.1016/j.susc.2024.122656openalex-snapshot
Time-resolved ambient pressure x-ray photoelectron spectroscopy: Advancing the operando study of ALD chemistry
inferred← citeshttps://doi.org/10.1016/j.tsf.2012.06.061openalex-snapshot
Growth and characterization of epitaxial anatase TiO2(001) on SrTiO3-buffered Si(001) using atomic layer deposition
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Atomic layer deposition of TiO 2 from tetrakis(dimethylamino)titanium and H 2 O
inferred← citeshttps://doi.org/10.1016/j.tsf.2013.10.039openalex-snapshot
Crystallization and semiconductor-metal switching behavior of thin VO2 layers grown by atomic layer deposition
inferred← citeshttps://doi.org/10.1016/j.tsf.2013.10.043openalex-snapshot
Atomic layer deposition of strontium titanate films from Sr(iPr3Cp)2, Ti[N(CH3)2]4 and H2O
inferred← citeshttps://doi.org/10.1016/j.tsf.2014.07.031openalex-snapshot
Platinum thin films with good thermal and chemical stability fabricated by inductively coupled plasma-enhanced atomic layer deposition at low temperatures
inferred← citeshttps://doi.org/10.1016/j.tsf.2017.03.025openalex-snapshot
Residual chlorine in TiO 2 films grown at low temperatures by plasma enhanced atomic layer deposition
inferred← citeshttps://doi.org/10.1016/j.vacuum.2021.110739openalex-snapshot
Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C
inferred← citeshttps://doi.org/10.1021/acs.chemmater.1c00781openalex-snapshot
Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2
inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c00667openalex-snapshot
Reactant-Dependent, 108× Conductivity Modulation in Plasma-Enhanced Atomic Layer Deposition for Black TiO2 Films
inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c02747openalex-snapshot
Atomic Layer Deposition of Lithium Borate and Lithium Borophosphate for Lithium-Ion Batteries
inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c00264openalex-snapshot
Electron-Enhanced Deposition of Titanium-, Silicon- and Tungsten-Containing Films at Low Temperatures Using Volatile Precursors with Various Reactive Background Gases
inferred← citeshttps://doi.org/10.1021/acs.chemmater.6b01209openalex-snapshot
High Conformity and Large Domain Monocrystalline Anatase on Multiwall Carbon Nanotube Core–Shell Nanostructure: Synthesis, Structure, and Interface
inferred← citeshttps://doi.org/10.1021/acs.chemmater.7b05128openalex-snapshot
Understanding the Growth Mechanisms of Multilayered Systems in Atomic Layer Deposition Process
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Quantifying the Extent of Ligand Incorporation and the Effect on Properties of TiO 2 Thin Films Grown by Atomic Layer Deposition Using an Alkoxide or an Alkylamide
inferred← citeshttps://doi.org/10.1021/acs.jpcc.5b08699openalex-snapshot
Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)
inferred← citeshttps://doi.org/10.1021/acs.jpcc.5b10529openalex-snapshot
Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/acs.jpcc.6c05418openalex-snapshot
ALD of Tantalum and Titanium Phosphates Using Tris(dimethylamino)phosphine
inferred← citeshttps://doi.org/10.1021/acs.langmuir.5b00216openalex-snapshot
Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1021/acsami.6b07350openalex-snapshot
Protected Light-Trapping Silicon by a Simple Structuring Process for Sunlight-Assisted Water Splitting
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Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
inferred← citeshttps://doi.org/10.1021/acsami.8b11557openalex-snapshot
Development of ALD Coatings for Harsh Environment Applications
inferred← citeshttps://doi.org/10.1021/acsami.9b17592openalex-snapshot
Charge Transfer in c-Si(n++)/TiO2(ALD) at the Amorphous/Anatase Transition: A Transient Surface Photovoltage Spectroscopy Study
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Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
inferred← citeshttps://doi.org/10.1021/acsomega.5c06117openalex-snapshot
Role of Nonplasma Oxidizing Agent on the Reaction Step in Atomic Layer Deposition of Titanium Oxide Thin Films
inferred← citeshttps://doi.org/10.1021/am5007222openalex-snapshot
Thermal and Plasma-Enhanced Atomic Layer Deposition of TiN Using TDMAT and NH3 on Particles Agitated in a Rotary Reactor
inferred← citeshttps://doi.org/10.1021/am502298zopenalex-snapshot
Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films
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Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols
inferred← citeshttps://doi.org/10.1021/cm301205popenalex-snapshot
Anisotropic Atomic Layer Deposition Profiles of TiO2 in Hierarchical Silica Material with Multiple Porosity
inferred← citeshttps://doi.org/10.1021/cm303703ropenalex-snapshot
Growth and Crystallization of TiO2 Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
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Dynamical Orientation of Large Molecules on Oxide Surfaces and its Implications for Dye-Sensitized Solar Cells
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Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
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In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry
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Profile Evolution for Conformal Atomic Layer Deposition over Nanotopography
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Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control
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Foldable and washable textile-based OLEDs with a multi-functional near-room-temperature encapsulation layer for smart e-textiles
inferred← citeshttps://doi.org/10.1038/s41598-020-66409-8openalex-snapshot
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
inferred← citeshttps://doi.org/10.1039/c1cs15091jopenalex-snapshot
Tailoring nanoporous materials by atomic layer deposition
inferred← citeshttps://doi.org/10.1039/c3nr00594aopenalex-snapshot
Synthesis of uniformly dispersed anatase nanoparticles inside mesoporous silica thin films via controlled breakup and crystallization of amorphous TiO2 deposited using atomic layer deposition
inferred← citeshttps://doi.org/10.1039/c3ra42928hopenalex-snapshot
Atomic layer deposition-based synthesis of photoactive TiO2 nanoparticle chains by using carbon nanotubes as sacrificial templates
inferred← citeshttps://doi.org/10.1039/c5cp06713hopenalex-snapshot
Optimization of Al 2 O 3 /TiO 2 nanolaminate thin films prepared with different oxide ratios, for use in organic light-emitting diode encapsulation, via plasma-enhanced atomic layer deposition
inferred← citeshttps://doi.org/10.1039/c5dt03840eopenalex-snapshot
Molecular layer deposition of “titanicone”, a titanium-based hybrid material, as an electrode for lithium-ion batteries
inferred← citeshttps://doi.org/10.1039/c5nr02106eopenalex-snapshot
Morphology and crystallinity control of ultrathin TiO 2 layers deposited on carbon nanotubes by temperature-step atomic layer deposition
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Investigation of ultra-thin titania films as hole-blocking contacts for organic photovoltaics
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An efficient PE-ALD process for TiO 2 thin films employing a new Ti-precursor
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Atomic layer deposition for perovskite solar cells: research status, opportunities and challenges
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Plasma-enhanced atomic layer deposition of titanium phosphate as an electrode for lithium-ion batteries
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Molecular layer deposition of “vanadicone”, a vanadium-based hybrid material, as an electrode for lithium-ion batteries
inferred← citeshttps://doi.org/10.1039/d1cp00341kopenalex-snapshot
Retention of surface structure causes lower density in atomic layer deposition of amorphous titanium oxide thin films
inferred← citeshttps://doi.org/10.1039/d5ra09703gopenalex-snapshot
Impact of variations in ALD procedure on nanomorphology, protecting properties and chemical stability of thin TiO 2 films
inferred← citeshttps://doi.org/10.1063/1.3490710openalex-snapshot
Implementing TiO2 as gate dielectric for Ge-channel complementary metal-oxide-semiconductor devices by using HfO2/GeO2 interlayer
inferred← citeshttps://doi.org/10.1063/1.3524208openalex-snapshot
Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices
inferred← citeshttps://doi.org/10.1063/1.3579195openalex-snapshot
Semiconductor-metal transition in thin VO2 films grown by ozone based atomic layer deposition
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Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
inferred← citeshttps://doi.org/10.1063/1.4768947openalex-snapshot
Band alignment in Ge/GeOx/HfO2/TiO2 heterojunctions as measured by hard x-ray photoelectron spectroscopy
inferred← citeshttps://doi.org/10.1063/1.4798337openalex-snapshot
Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers
inferred← citeshttps://doi.org/10.1063/1.4863099openalex-snapshot
Fluidized-bed atomic layer deposition reactor for the synthesis of core-shell nanoparticles
inferred← citeshttps://doi.org/10.1063/5.0116732openalex-snapshot
Atomic layer deposition of conductive and semiconductive oxides
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Suppressing substrate oxidation during plasma-enhanced atomic layer deposition on semiconductor surfaces
inferred← citeshttps://doi.org/10.1088/0268-1242/27/7/074012openalex-snapshot
Germanium surface passivation and atomic layer deposition of high- k dielectrics—a tutorial review on Ge-based MOS capacitors
inferred← citeshttps://doi.org/10.1088/0957-4484/24/29/295202openalex-snapshot
In situcontrol of oxygen vacancies in TiO2by atomic layer deposition for resistive switching devices
inferred← citeshttps://doi.org/10.1088/0957-4484/26/2/024003openalex-snapshot
Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
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Cold plasma treatment of catalytic materials: a review
inferred← citeshttps://doi.org/10.1088/1361-6463/ae84d8openalex-snapshot
Enhanced discharge-driven precursor decomposition and crystallinity improvement in TiO 2 films deposited by atmospheric-pressure ultrafast pulsed plasma jet
inferred← citeshttps://doi.org/10.1088/1361-6641/aa78ceopenalex-snapshot
Titanium dioxide thin films by atomic layer deposition: a review
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Platinum growth analysis in atomic layer deposition using in-situ resistance measurement
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Effects of O $_{\bf 2}$ /Ar Ratio and Growth Temperature on Resistive Switching Characteristics of Al/HfO $_{\bm x}$ /ITO Memory Devices
inferred← citeshttps://doi.org/10.1116/1.3256227openalex-snapshot
Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
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Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
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Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
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Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone
inferred← citeshttps://doi.org/10.1116/1.4817718openalex-snapshot
Large effect of titanium precursor on surface reactivity and mechanical strength of electrospun nanofibers coated with TiO2 by atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.4935356openalex-snapshot
Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
inferred← citeshttps://doi.org/10.1116/1.4964693openalex-snapshot
Investigating compositional effects of atomic layer deposition ternary dielectric Ti-Al-O on metal-insulator-semiconductor heterojunction capacitor structure for gate insulation of InAlN/GaN and AlGaN/GaN
inferred← citeshttps://doi.org/10.1116/1.4972252openalex-snapshot
Incorporation of Al or Hf in atomic layer deposition TiO2 for ternary dielectric gate insulation of InAlN/GaN and AlGaN/GaN metal-insulator-semiconductor-heterojunction structure
inferred← citeshttps://doi.org/10.1116/1.5001552openalex-snapshot
Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.5080226openalex-snapshot
Texture and phase variation of ALD PbTiO3 films crystallized by rapid thermal anneal
inferred← citeshttps://doi.org/10.1116/1.5116136openalex-snapshot
Corrosion protection of Cu by atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.5128208openalex-snapshot
Role of plasma properties in controlling crystallinity and phase in oxide films grown by plasma-enhanced atomic layer epitaxy
inferred← citeshttps://doi.org/10.1116/6.0005362openalex-snapshot
Effects of oxidant selection for atomic layer deposition on impurity removal and crystallinity of as-grown Hf1− x Zr x O2 thin films
inferred← citeshttps://doi.org/10.1117/12.2052362openalex-snapshot
A comparison of scattering and non-scattering anti-reflection designs for back contacted polycrystalline thin film silicon solar cells in superstrate configuration
inferred← citeshttps://doi.org/10.1143/jjap.50.085502openalex-snapshot
Photocatalytic Functional Coating of TiO2 Thin Film Deposited by Cyclic Plasma Chemical Vapor Deposition at Atmospheric Pressure
inferred← citeshttps://doi.org/10.1149/1.3125287openalex-snapshot
Self-Limiting Deposition of Anatase TiO[sub 2] at Low Temperature by Pulsed PECVD
inferred← citeshttps://doi.org/10.1149/1.3133169openalex-snapshot
Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide
inferred← citeshttps://doi.org/10.1149/1.3551461openalex-snapshot
Effective Electrical Passivation of Ge(100) for HfO2 Gate Dielectric Layers Using O2 Plasma
inferred← citeshttps://doi.org/10.1149/1.3559770openalex-snapshot
TiO2/HfO2 Bi-Layer Gate Stacks Grown by Atomic Layer Deposition for Germanium-Based Metal-Oxide-Semiconductor Devices Using GeOxNy Passivation Layer
inferred← citeshttps://doi.org/10.1149/2.006203sslopenalex-snapshot
Improved Thermal Stability and Electrical Performance by Using PEALD Ultrathin Al2O3 Film with Ta as Cu Diffusion Barrier on Low k Dielectrics
inferred← citeshttps://doi.org/10.1149/2.035301jssopenalex-snapshot
Understanding the Interface Reactions of Rutile TiO2Grown by Atomic Layer Deposition on Oxidized Ruthenium
inferred← citeshttps://doi.org/10.1149/2162-8777/aba4f4openalex-snapshot
Band Line-up Investigation of Atomic Layer Deposited TiAlO and GaAlO on GaN
inferred← citeshttps://doi.org/10.1186/s11671-015-0790-xopenalex-snapshot
Structure and photoluminescence of the TiO2 films grown by atomic layer deposition using tetrakis-dimethylamino titanium and ozone
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High index contrast photonic platforms for on-chip Raman spectroscopy
inferred← citeshttps://doi.org/10.1364/ol.40.005371openalex-snapshot
Atomic layer deposited second-order nonlinear optical metamaterial for back-end integration with CMOS-compatible nanophotonic circuitry
inferred← citeshttps://doi.org/10.1366/13-06995openalex-snapshot
Time-Resolved Surface Infrared Spectroscopy during Atomic Layer Deposition
inferred← citeshttps://doi.org/10.3390/coatings10070692openalex-snapshot
Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
inferred← citeshttps://doi.org/10.3390/coatings10080712openalex-snapshot
Adsorption of Titanium Halides on Nitride and Oxide Surfaces during Atomic Layer Deposition: A DFT Study
inferred← citeshttps://doi.org/10.3390/coatings7080118openalex-snapshot
Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
inferred← citeshttps://doi.org/10.3390/nano13060976openalex-snapshot
Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
inferred← citeshttps://doi.org/10.3740/mrsk.2026.36.3.119openalex-snapshot
Performance Enhancement of TiO2-Based Capacitors via Plasma-Enhanced Atomic Layer Deposition and Plasma Pre-Treatment
inferred← citeshttps://doi.org/10.3762/bjnano.13.103openalex-snapshot
Role of titanium and organic precursors in molecular layer deposition of “titanicone” hybrid materials
inferred← citeshttps://doi.org/10.3788/aos250600openalex-snapshot
PEALD沉积Al2O3薄膜的中高频形貌演化规律
inferred← citeshttps://doi.org/10.3897/aldj.1.101276openalex-snapshot
Transformation kinetics for low temperature post-deposition crystallization of TiO 2 thin films prepared via atomic layer deposition (ALD) from tetrakis(dimethylamino)titanium(IV) (TDMAT) and water
inferred← citeshttps://doi.org/10.70675/10591ce1z903ez4cffza9cbz544df9b5e69fopenalex-snapshot
Low-temperature synthesis of alumina and titania by atomic layer deposition for application to the encapsulation of organic devices
inferred← citeshttps://doi.org/10.70675/76b3886cz082az49cfza134z7ed8fbceb5eeopenalex-snapshot
The growth and application of thin films grown by Atomic Layer Deposition (ALD)
inferred← citeshttps://doi.org/10.70675/81869cc0zcbe2z4a88z9362z119185fdffe0openalex-snapshot
Synthèse par ALD et caractérisation de couches extractrices d'électrons pour application dans les cellules solaires à base de pérovskite
inferred← citeshttps://doi.org/10.70675/905415c5zd045z426ezace9z9fc140c1a619openalex-snapshot
Fonctionnalisation de surface par "atomic layer deposition" pour la réalisation de dispositifs électrochimiques de stockage et de production de l'énergie
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