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Development and performance of EUV pellicles

https://doi.org/10.1515/aot-2017-0023
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1063/1.4936851openalex-snapshot
Emissivity of freestanding membranes with thin metal coatings
inferredcites →https://doi.org/10.1116/1.3505126openalex-snapshot
High transmission pellicles for extreme ultraviolet lithography reticle protection
inferredcites →https://doi.org/10.1117/12.2015833openalex-snapshot
Investigation of EUV pellicle feasibility
inferredcites →https://doi.org/10.1117/12.2049276openalex-snapshot
Progress on EUV pellicle development
inferredcites →https://doi.org/10.1117/12.2196901openalex-snapshot
Fabrication of a full-size EUV pellicle based on silicon nitride
inferredcites →https://doi.org/10.1117/12.2197454openalex-snapshot
Grid-supported EUV pellicles: A theoretical investigation for added value
inferredcites →https://doi.org/10.1117/12.2218453openalex-snapshot
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
inferredcites →https://doi.org/10.1117/12.2220031openalex-snapshot
EUV lithography imaging using novel pellicle membranes
inferredcites →https://doi.org/10.1117/12.2239882openalex-snapshot
NXE pellicle: development update
inferredcites →https://doi.org/10.1117/12.2241393openalex-snapshot
Development of a novel closed EUV pellicle for EUVL manufacturing
inferredcites →https://doi.org/10.1117/12.2255040openalex-snapshot
Researching new EUV pellicle films for source powers beyond 250 watts
inferredcites →https://doi.org/10.1117/12.2258025openalex-snapshot
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
inferredcites →https://doi.org/10.1117/12.656551openalex-snapshot
EUV pellicle development for mask defect control

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

inferred← citeshttps://doi.org/10.2139/ssrn.4115161openalex-extracted
Renewable Single-Walled Carbon Nanotube Membranes for Extreme Ultraviolet Pellicle Applications
inferred← citeshttps://doi.org/10.1007/s13391-025-00603-6openalex-snapshot
Enhancing Hydrogen Radical Resistance in Graphene-Based EUV Pellicles via Mo and Mo2C Capping Layers
inferred← citeshttps://doi.org/10.1007/s13391-026-00630-xopenalex-snapshot
Development of Extreme Ultraviolet Pellicles Based on Yttrium Core with Amorphous Carbon Capping Layer
inferred← citeshttps://doi.org/10.1016/j.carbon.2019.09.006openalex-snapshot
Single-walled carbon nanotube membranes for optical applications in the extreme ultraviolet range
inferred← citeshttps://doi.org/10.1016/j.carbon.2022.07.014openalex-snapshot
Renewable single-walled carbon nanotube membranes for extreme ultraviolet pellicle applications
inferred← citeshttps://doi.org/10.1016/j.sse.2024.108924openalex-snapshot
Theoretical study of extreme ultraviolet pellicles with nanometer thicknesses
inferred← citeshttps://doi.org/10.1021/acsami.4c18918openalex-snapshot
Freestanding 2D Glasses by Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1088/1361-6463/ae780bopenalex-snapshot
Scan-speed trade-offs in the thermo-mechanical response of EUV pellicles under slit-scan exposure
inferred← citeshttps://doi.org/10.1088/1361-6528/ad902dopenalex-snapshot
Development and optimization of metal silicide EUV pellicle for 400W EUV lithography
inferred← citeshttps://doi.org/10.1117/1.jmm.16.4.041010openalex-snapshot
High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond
inferred← citeshttps://doi.org/10.1117/12.2280579openalex-snapshot
Characterization of pellicle membranes by lab-based spectroscopic reflectance and transmittance measurements in the extreme ultraviolet
inferred← citeshttps://doi.org/10.1117/12.2501804openalex-snapshot
A tool for full area inband EUV transmission mapping of EUV pellicles
inferred← citeshttps://doi.org/10.1117/12.2536344openalex-snapshot
ASML NXE pellicle update
inferred← citeshttps://doi.org/10.1117/12.2682101openalex-snapshot
EUV reticle defectivity: next steps in the EUV scanner and beyond
inferred← citeshttps://doi.org/10.1134/s1027451023060344openalex-snapshot
Measurements of the Thermophysical Characteristics of Thin-Film Metal Filters for Extreme-Ultraviolet Radiation
inferred← citeshttps://doi.org/10.1134/s1063739723700622openalex-snapshot
Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range
inferred← citeshttps://doi.org/10.1142/s1793292024500206openalex-snapshot
Infrared Emissivity–Resistivity Correlation of RU Thin Films for EUV Pellicle Applications
inferred← citeshttps://doi.org/10.31857/s0544126923700539openalex-snapshot
Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range
inferred← citeshttps://doi.org/10.31857/s1028096023120129openalex-snapshot
Measurements of Thermophysical Characteristics of Thin Film Metal Filters for Extreme Ultraviolet Radiation
inferred← citeshttps://doi.org/10.3390/cryst16020150openalex-snapshot
Effect of Grain-Size Control on Mechanical and Optical Properties of ZrSi2 Membranes for Extreme Ultraviolet Pellicles
inferred← citeshttps://doi.org/10.3390/ma16093471openalex-snapshot
Transverse Deflection for Extreme Ultraviolet Pellicles
inferred← citeshttps://doi.org/10.3390/photonics12030266openalex-snapshot
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
inferred← citeshttps://doi.org/10.4028/p-3lu3k9openalex-snapshot
Pinpoint Particle Removal for EUV Pellicle Productivity Enhancement
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