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https://doi.org/10.2139/ssrn.4606368
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
inferredcites →https://doi.org/10.1006/jcph.1995.1039openalex-extracted
Fast Parallel Algorithms for Short-Range Molecular Dynamics
inferredcites →https://doi.org/10.1016/j.apsusc.2003.08.086openalex-extracted
The revolution in SiGe: impact on device electronics
inferredcites →https://doi.org/10.1016/j.apsusc.2018.06.098openalex-extracted
Molecular dynamics study of the effect of point defects on the stress at the Si/Ge interface
inferredcites →https://doi.org/10.1016/j.jallcom.2015.03.155openalex-extracted
Segregation of Ge in B and Ge codoped Czochralski-Si crystal growth
inferredcites →https://doi.org/10.1016/j.jcrysgro.2004.04.018openalex-extracted
Distribution of Ge in high concentration Ge-doped Czochralski-Si crystal
inferredcites →https://doi.org/10.1016/j.matchar.2019.06.014openalex-extracted
Effect of cooling rate on the microstructure of rapidly solidified SiGe
inferredcites →https://doi.org/10.1016/j.mser.2013.01.002openalex-extracted
Impurity engineering of Czochralski silicon
inferredcites →https://doi.org/10.1016/j.solmat.2011.04.033openalex-extracted
Germanium-doped Czochralski silicon for photovoltaic applications
inferredcites →https://doi.org/10.1016/s0022-0248(96)00672-0openalex-extracted
Effective segregation coefficient and steady state segregation coefficient of germanium in Czochralski silicon
inferredcites →https://doi.org/10.1021/acs.cgd.1c00586openalex-extracted
Hidden State of Si50Ge50 Nanoparticles During Rapid Solidification
inferredcites →https://doi.org/10.1063/1.1433185openalex-extracted
Structural and optical properties of silicon–germanium alloy nanoparticles
inferredcites →https://doi.org/10.1063/1.1698728openalex-extracted
The Distribution of Solute in Crystals Grown from the Melt. Part I. Theoretical
inferredcites →https://doi.org/10.1063/1.5006944openalex-extracted
Atomistic simulations of carbon diffusion and segregation in liquid silicon
inferredcites →https://doi.org/10.1063/5.0051245openalex-extracted
A general approach for calculating melt–solid impurity segregation coefficients based on thermodynamic integration
inferredcites →https://doi.org/10.1073/pnas.0906943106openalex-extracted
Diameter-dependent dopant location in silicon and germanium nanowires
inferredcites →https://doi.org/10.1088/1674-4926/37/8/081001openalex-extracted
Research progress of Si-based germanium materials and devices
inferredcites →https://doi.org/10.1103/physrevb.31.5262openalex-extracted
Computer simulation of local order in condensed phases of silicon
inferredcites →https://doi.org/10.1103/physrevb.39.5566openalex-extracted
Modeling solid-state chemistry: Interatomic potentials for multicomponent systems
inferredcites →https://doi.org/10.1103/physrevb.56.12243openalex-extracted
Molecular-dynamics study of surface segregation in liquid semiconductor alloys
inferredcites →https://doi.org/10.1103/physrevlett.96.166805openalex-extracted
Surface Segregation and Backscattering in Doped Silicon Nanowires
inferredcites →https://doi.org/10.1143/jjap.2.212openalex-extracted
Diffusion Coefficients of Impurities in Silicon Melt
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inferred← citeshttps://doi.org/10.2139/ssrn.5397710openalex-snapshot
Anomalous Uphill Diffusion During Heat Treatment of Si-30 Wt% Ge Alloy
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