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Composition-Dependent Mechanical Behavior of Silicon Nitride Thin Films: Investigating Fracture Toughness in Silicon-Rich PECVD SiN Passivation Layers

https://doi.org/10.2139/ssrn.5708249
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Annealing effects on aSiNx grown by PECVD using different gas mixtures
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A new method to evaluate the fracture toughness of thin films
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Shape identification and particles size distribution from basic shape parameters using ImageJ
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Photoluminescence and excitation energy transfer in non-stoichiometric silicon nitride
inferredcites →https://doi.org/10.1016/j.surfcoat.2012.11.014openalex-snapshot
Effect of gas temperature on the structural and optoelectronic properties of a-Si:H thin films deposited by PECVD
inferredcites →https://doi.org/10.1016/j.surfcoat.2014.08.018openalex-snapshot
Toughness enhancement of nanostructured hard coatings: Design strategies and toughness measurement techniques
inferredcites →https://doi.org/10.1016/j.tsf.2006.01.043openalex-snapshot
An energy method to analyze through thickness thin film fracture during indentation
inferredcites →https://doi.org/10.1016/j.tsf.2007.07.047openalex-snapshot
Mechanical properties of amorphous and microcrystalline silicon films
inferredcites →https://doi.org/10.1016/j.tsf.2008.07.014openalex-snapshot
Celebrating the 100th anniversary of the Stoney equation for film stress: Developments from polycrystalline steel strips to single crystal silicon wafers
inferredcites →https://doi.org/10.1016/j.tsf.2009.03.043openalex-snapshot
Effect of residual stresses on mechanical properties and interface adhesion strength of SiN thin films
inferredcites →https://doi.org/10.1016/j.tsf.2009.07.143openalex-snapshot
A comparative micro-cantilever study of the mechanical behavior of silicon based passivation films
inferredcites →https://doi.org/10.1016/j.tsf.2010.03.031openalex-snapshot
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiNx:H films
inferredcites →https://doi.org/10.1016/j.tsf.2011.09.036openalex-snapshot
Toughness evaluation of hard coatings and thin films
inferredcites →https://doi.org/10.1016/j.tsf.2014.11.070openalex-snapshot
Effect of the stoichiometry of Si-rich silicon nitride thin films on their photoluminescence and structural properties
inferredcites →https://doi.org/10.1016/j.tsf.2017.02.027openalex-snapshot
Origin of visible photoluminescence from Si-rich and N-rich silicon nitride films
inferredcites →https://doi.org/10.1016/j.vacuum.2015.08.002openalex-snapshot
Annealing and excitation dependent photoluminescence of silicon rich silicon nitride films with silicon quantum dots
inferredcites →https://doi.org/10.1016/s1359-6454(01)00328-7openalex-snapshot
Effects of the substrate on the determination of thin film mechanical properties by nanoindentation
inferredcites →https://doi.org/10.1021/acsaelm.2c00623openalex-snapshot
Intrinsic Mechanical Properties of Free-Standing SiNx Thin Films Depending on PECVD Conditions for Controlling Residual Stress
inferredcites →https://doi.org/10.1021/acsami.6b06417openalex-snapshot
Environmentally Assisted Cracking in Silicon Nitride Barrier Films on Poly(ethylene terephthalate) Substrates
inferredcites →https://doi.org/10.1021/jp905748jopenalex-snapshot
Sintering, Coalescence, and Compositional Changes of Hydrogen-Terminated Silicon Nanoparticles as a Function of Temperature
inferredcites →https://doi.org/10.1038/srep18523openalex-snapshot
Photoluminescence and electronic transitions in cubic silicon nitride
inferredcites →https://doi.org/10.1063/1.1622552openalex-snapshot
Applications of UV-Raman Spectroscopy to Microelectronic Materials and Devices
inferredcites →https://doi.org/10.1063/1.1814429openalex-snapshot
Quantum confinement effect of silicon nanocrystals in situ grown in silicon nitride films
inferredcites →https://doi.org/10.1063/1.2749283openalex-snapshot
Evolution with the annealing treatments of the photoluminescence mechanisms in a-SiNx:H alloys prepared by reactive evaporation
inferredcites →https://doi.org/10.1063/1.3501133openalex-snapshot
First and second-order Raman scattering in Si nanostructures within silicon nitride
inferredcites →https://doi.org/10.1088/0268-1242/15/7/201openalex-snapshot
Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices
inferredcites →https://doi.org/10.1109/jmems.2009.2039697openalex-snapshot
What is the Young's Modulus of Silicon?
inferredcites →https://doi.org/10.1557/jmr.1992.1564openalex-snapshot
An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments
inferredcites →https://doi.org/10.1557/jmr.1999.0042openalex-snapshot
Substrate effects on nanoindentation mechanical property measurement of soft films on hard substrates
inferredcites →https://doi.org/10.1557/jmr.2009.0144openalex-snapshot
Determining the elastic modulus and hardness of an ultra-thin film on a substrate using nanoindentation
inferredcites →https://doi.org/10.1557/jmr.2012.319openalex-snapshot
A new approach to determine wedge-indented interfacial toughness in soft-film hard-substrate systems with application to low-k films on Si substrate
inferredcites →https://doi.org/10.3390/surfaces1010006openalex-snapshot
Material Structure and Mechanical Properties of Silicon Nitride and Silicon Oxynitride Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
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