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Surface Passivation of HfO₂ by Silane Coupling Agents for Ultra‑High Selectivity Etching of Si₃N₄/SiO₂/HfO₂ Stacks in Phosphoric Acid
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Outgoing claims: the papers this work cites, builds on, or argues with.
inferredcites →https://doi.org/10.1002/slct.202402646openalex-snapshot
Phosphoric Acid Wet Etching of Sandwiched Silicon Nitride Nanolayers
inferredcites →https://doi.org/10.1007/s10853-019-04119-xopenalex-snapshot
Abnormal redeposition of silicate from Si3N4 etching onto SiO2 surfaces in flash memory manufacturing
inferredcites →https://doi.org/10.1007/s11270-012-1186-5openalex-snapshot
Adsorption of Phosphate from Aqueous Solution Using an Iron–Zirconium Binary Oxide Sorbent
inferredcites →https://doi.org/10.1016/j.apsusc.2013.04.064openalex-snapshot
Study on preparation method for short-chain alkylsiloxane self-assembled monolayers and the diffusion behavior of copper on silica surfaces
inferredcites →https://doi.org/10.1016/j.apsusc.2022.155143openalex-snapshot
Passivation of poly-Si surface using vinyl and epoxy group additives for selective Si3N4 etching in H3PO4 solution
inferredcites →https://doi.org/10.1016/j.apsusc.2023.158118openalex-snapshot
Effect of addition of amino acids with hydrophilic side chains to low-concentration H3PO4 for improvement of Si3N4 etching kinetics and oxide regrowth phenomena on multi-layered Si3N4/SiO2 structures
inferredcites →https://doi.org/10.1016/j.colsurfa.2006.10.028openalex-snapshot
Adsorption of phosphate at the aluminum (hydr)oxides–water interface: Role of the surface acid–base properties
inferredcites →https://doi.org/10.1016/j.ijpharm.2018.08.034openalex-snapshot
Methacrylated chitosan as a polymer with enhanced mucoadhesive properties for transmucosal drug delivery
inferredcites →https://doi.org/10.1016/j.jcis.2009.03.019openalex-snapshot
Removal of phosphate from water by a Fe–Mn binary oxide adsorbent
inferredcites →https://doi.org/10.1016/j.jiec.2021.07.001openalex-snapshot
Understanding of Si3N4-H3PO4 reaction chemistry for the control of Si3N4 dissolution kinetics
inferredcites →https://doi.org/10.1016/j.mee.2013.12.027openalex-snapshot
Selective wet etching of Si3N4/SiO2 in phosphoric acid with the addition of fluoride and silicic compounds
inferredcites →https://doi.org/10.1016/j.watres.2013.05.044openalex-snapshot
Strong adsorption of phosphate by amorphous zirconium oxide nanoparticles
inferredcites →https://doi.org/10.1021/acs.jpcb.5b09684openalex-snapshot
Mechanism of Efficient Proton Conduction in Diphosphoric Acid Elucidated via First-Principles Simulation and NMR
inferredcites →https://doi.org/10.1021/acsomega.4c06878openalex-snapshot
Electrical Properties of Schottky Devices from HfO2 and ZnO/HfO2 Thin Films: Morphological, Structural, and Optical Investigations
inferredcites →https://doi.org/10.1021/acssuschemeng.1c06192openalex-snapshot
Addition of Carboxylic Acids to Superheated Water for the Environmentally Benign Removal of Silicon Nitrides
inferredcites →https://doi.org/10.1021/es202924fopenalex-snapshot
Kinetics of Calcium Phosphate Nucleation and Growth on Calcite: Implications for Predicting the Fate of Dissolved Phosphate Species in Alkaline Soils
inferredcites →https://doi.org/10.1021/la701839sopenalex-snapshot
Effects of Graft Densities and Chain Lengths on Separation of Bioactive Compounds by Nanolayered Thermoresponsive Polymer Brush Surfaces
inferredcites →https://doi.org/10.1021/la802234xopenalex-snapshot
How To Prevent the Loss of Surface Functionality Derived from Aminosilanes
inferredcites →https://doi.org/10.1038/s41578-022-00431-2openalex-snapshot
The fundamentals and applications of ferroelectric HfO2
inferredcites →https://doi.org/10.1038/s41586-025-09793-3openalex-snapshot
Ferroelectric transistors for low-power NAND flash memory
inferredcites →https://doi.org/10.1088/1361-6641/ac16e6openalex-snapshot
Air-spacers as analog-performance booster for 5 nm-node N-channel nanosheet transistor
inferredcites →https://doi.org/10.1098/rsif.2008.0398openalex-snapshot
Nanoscale adhesion, friction and wear studies of biomolecules on silane polymer-coated silica and alumina-based surfaces
inferredcites →https://doi.org/10.1116/6.0000395openalex-snapshot
Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching
inferredcites →https://doi.org/10.1149/1.2779363openalex-snapshot
Maintaining a Stable Etch Selectivity between Silicon Nitride and Silicon Dioxide in a Hot Phosphoric Acid Bath
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