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Chemically Distinct Adsorption of Sulfide Inhibitors for Multi‐Surface Passivation and Area Selective Deposition

https://doi.org/10.1002/smll.74721
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/adma.201101340openalex-snapshot
Control of Graphene Field‐Effect Transistors by Interfacial Hydrophobic Self‐Assembled Monolayers
inferredcites →https://doi.org/10.1002/adma.201703031openalex-snapshot
Wafer‐Scale Synthesis of Reliable High‐Mobility Molybdenum Disulfide Thin Films via Inhibitor‐Utilizing Atomic Layer Deposition
inferredcites →https://doi.org/10.1002/adma.202506699openalex-snapshot
Role of Precursor Miscibility in Area‐Selective Atomic Layer Deposition
inferredcites →https://doi.org/10.1002/admi.202102364openalex-snapshot
Area‐Selective Atomic Layer Deposition Using Vapor Dosing of Short‐Chain Alkanethiol Inhibitors on Metal/Dielectric Surfaces
inferredcites →https://doi.org/10.1016/j.cplett.2005.04.010openalex-snapshot
Self-assembly of hexadecanethiol molecules on gold from the vapour phase as directed by a two-dimensional array of silica beads
inferredcites →https://doi.org/10.1016/j.ijmachtools.2024.104173openalex-snapshot
Area selective deposition for bottom-up atomic-scale manufacturing
inferredcites →https://doi.org/10.1021/acs.chemmater.0c00722openalex-snapshot
Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
inferredcites →https://doi.org/10.1021/acs.chemmater.0c02798openalex-snapshot
Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor
inferredcites →https://doi.org/10.1021/acs.chemmater.2c00513openalex-snapshot
Tuning Molecular Inhibitors and Aluminum Precursors for the Area-Selective Atomic Layer Deposition of Al2O3
inferredcites →https://doi.org/10.1021/acs.chemmater.2c00854openalex-snapshot
Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer
inferredcites →https://doi.org/10.1021/acs.chemmater.3c00904openalex-snapshot
Area-Selective Atomic Layer Deposition of Al2O3 with a Methanesulfonic Acid Inhibitor
inferredcites →https://doi.org/10.1021/acs.chemmater.3c02525openalex-snapshot
Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO 2
inferredcites →https://doi.org/10.1021/acs.chemmater.4c01133openalex-snapshot
Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation
inferredcites →https://doi.org/10.1021/acs.chemmater.8b02774openalex-snapshot
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors
inferredcites →https://doi.org/10.1021/acs.chemmater.8b03454openalex-snapshot
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
inferredcites →https://doi.org/10.1021/acs.chemmater.8b04926openalex-snapshot
Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru
inferredcites →https://doi.org/10.1021/acs.est.5b03646openalex-snapshot
Water Contact Angle Dependence with Hydroxyl Functional Groups on Silica Surfaces under CO 2 Sequestration Conditions
inferredcites →https://doi.org/10.1021/acs.langmuir.1c00212openalex-snapshot
Selective Gas-Phase Functionalization of SiO2 and SiNx Surfaces with Hydrocarbons
inferredcites →https://doi.org/10.1021/acs.langmuir.1c02211openalex-snapshot
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
inferredcites →https://doi.org/10.1021/acs.langmuir.6b00651openalex-snapshot
Thiol Adsorption on and Reduction of Copper Oxide Particles and Surfaces
inferredcites →https://doi.org/10.1021/acsami.0c08873openalex-snapshot
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
inferredcites →https://doi.org/10.1021/acsami.6b09960openalex-snapshot
Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal–Dielectric Patterns
inferredcites →https://doi.org/10.1021/cm0486666openalex-snapshot
Investigation of Self-Assembled Monolayer Resists for Hafnium Dioxide Atomic Layer Deposition
inferredcites →https://doi.org/10.1021/cr900056bopenalex-snapshot
Atomic Layer Deposition: An Overview
inferredcites →https://doi.org/10.1021/ja00067a048openalex-snapshot
The .beta.-hydride elimination mechanism in adsorbed alkyl groups
inferredcites →https://doi.org/10.1063/1.1323224openalex-snapshot
Improved tangent estimate in the nudged elastic band method for finding minimum energy paths and saddle points
inferredcites →https://doi.org/10.1063/1.1329672openalex-snapshot
A climbing image nudged elastic band method for finding saddle points and minimum energy paths
inferredcites →https://doi.org/10.1063/1.2786994openalex-snapshot
Density functional theory study of β-hydride elimination of ethyl on flat and stepped Cu surfaces
inferredcites →https://doi.org/10.1063/1.5028407openalex-snapshot
Oxidation mechanism of thin Cu films: A gateway towards the formation of single oxide phase
inferredcites →https://doi.org/10.1063/5.0236994openalex-snapshot
Sub-ambient water wettability of hydrophilic and hydrophobic SiO2 surfaces
inferredcites →https://doi.org/10.1103/physrevb.47.558openalex-snapshot
Ab initio molecular dynamics for liquid metals
inferredcites →https://doi.org/10.1103/physrevb.49.14251openalex-snapshot
Ab initio molecular-dynamics simulation of the liquid-metal–amorphous-semiconductor transition in germanium
inferredcites →https://doi.org/10.1103/physrevb.50.17953openalex-snapshot
Projector augmented-wave method
inferredcites →https://doi.org/10.1103/physrevb.54.11169openalex-snapshot
Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set
inferredcites →https://doi.org/10.1103/physrevb.59.1758openalex-snapshot
From ultrasoft pseudopotentials to the projector augmented-wave method
inferredcites →https://doi.org/10.1109/iitc/mam57687.2023.10154817openalex-snapshot
Area-Selective Atomic Layer Deposition of Ruthenium Thin Films Using Aldehyde Inhibitors
inferredcites →https://doi.org/10.1116/6.0000840openalex-snapshot
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
inferredcites →https://doi.org/10.1116/6.0004954openalex-snapshot
Role of idealized surface representations in computational area-selective atomic layer deposition: Assessing trimethoxypropylsilane blocking performance for Al2O3 deposition with crystalline SiO2

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inferred← backgroundhttps://doi.org/10.5281/zenodo.17234053zenodo-depositor-declared
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