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From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

https://doi.org/10.1021/acs.chemmater.8b03454

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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

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The selective epitaxial growth of silicon

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Atomic Layer Etching Applications in Nano-Semiconductor Device Fabrication

inferred← citeshttps://doi.org/10.1007/s40042-025-01488-2openalex-snapshot

Inhibitor-free area selective atomic layer deposition of SiO2 thin films by in situ surface cleaning using isotropic SiO2 selective removal

inferred← citeshttps://doi.org/10.1007/s41871-022-00136-8openalex-snapshot

Advances in Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1007/s41918-022-00146-6openalex-snapshot

Atomic Layer Deposition for Electrochemical Energy: from Design to Industrialization

inferred← citeshttps://doi.org/10.1016/b978-0-08-102832-2.00002-5openalex-snapshot

Electrochemical methods assisted with ALD for the synthesis of nanowires

inferred← citeshttps://doi.org/10.1016/b978-0-323-90800-9.00206-7openalex-snapshot

Atomic layer deposition of materials

inferred← citeshttps://doi.org/10.1016/b978-0-323-99537-5.00002-7openalex-snapshot

Nucleation and growth of thin films

inferred← citeshttps://doi.org/10.1016/b978-0-443-27509-8.00007-3openalex-snapshot

Surface Precursor Decomposition for Practical Applications

inferred← citeshttps://doi.org/10.1016/b978-0-443-27509-8.00028-0openalex-snapshot

Defect Chemistry and Associated Organic Functionalization Strategies in Area-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1016/j.apmt.2024.102160openalex-snapshot

Self-isolating electrode deposition process using the area-selective MoO2 and MoO3 atomic layer deposition technique

inferred← citeshttps://doi.org/10.1016/j.apsusc.2019.144307openalex-snapshot

Highly selective atomic layer deposition of MoSiOx using inherently substrate-dependent processes

inferred← citeshttps://doi.org/10.1016/j.apsusc.2020.146621openalex-snapshot

Substrate protection and deprotection with salt films to prevent surface contamination and enable selective atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2020.148247openalex-snapshot

Enhanced selectivity of atomic layer deposited Ru thin films through the discrete feeding of aminosilane inhibitor molecules

inferred← citeshttps://doi.org/10.1016/j.apsusc.2020.148307openalex-snapshot

Understanding the impact of Cu surface pre-treatment on Octadecanethiol-derived self-assembled monolayer as a mask for area-selective deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2022.152679openalex-snapshot

The role of atomic oxygen in the decomposition of self-assembled monolayers during area-selective atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2022.153061openalex-snapshot

Adsorption of sorbitan ester surfactant on copper and Cuprous oxide surfaces: A density functional theory study

inferred← citeshttps://doi.org/10.1016/j.apsusc.2022.154657openalex-snapshot

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

inferred← citeshttps://doi.org/10.1016/j.apsusc.2023.157222openalex-snapshot

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2023.157329openalex-snapshot

Fabrication of sub-5 nm uniform zirconium oxide films on corrugated copper substrates by a scalable polymer brush assisted deposition method

inferred← citeshttps://doi.org/10.1016/j.apsusc.2023.157796openalex-snapshot

Enabling high-quality transparent conductive oxide on 3D printed ZrO2 architectures through atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2023.157864openalex-snapshot

Chemical mechanism of oxidative etching of ruthenium: Insights into continuous versus self-limiting conditions

inferred← citeshttps://doi.org/10.1016/j.apsusc.2024.160033openalex-snapshot

Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs)

inferred← citeshttps://doi.org/10.1016/j.apsusc.2024.160141openalex-snapshot

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

inferred← citeshttps://doi.org/10.1016/j.apsusc.2024.161834openalex-snapshot

Advanced indicone Nanostructuring: Surface engineering with small molecule inhibitors through molecular layer deposition

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.162337openalex-snapshot

Deposition selectivity on oxide versus metal surfaces via catalyzed atomic layer deposition of SiO2 and vapor-dosed phosphonic acid inhibitors

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.162966openalex-snapshot

Site-specific surface reactivity on SnO2: Evaluating selective atomic layer deposition processes

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.164439openalex-snapshot

Low-temperature area-selective MLD of polyurea on OTS-SiO2 nanopatterned substrates fabricated via microcontact printing

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.164841openalex-snapshot

Mechanism of atomic layer deposition of Al2O3 on carbene-derived small molecule inhibitors

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.165129openalex-snapshot

Area selective deposition of tungsten and ruthenium using a tungsten precursor inhibitor

inferred← citeshttps://doi.org/10.1016/j.apsusc.2025.165699openalex-snapshot

Inherently area-selective atomic layer deposition for the fabrication of 2D and 3D nanostructures

inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.166294openalex-snapshot

A computational study for screening high-selectivity inhibitors in area-selective atomic layer deposition on amorphous surfaces

inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.166554openalex-snapshot

First-principles mechanism of TDMAH adsorption on pristine and laser-functionalized graphene toward area-selective atomic layer deposition of HfO2

inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.167569openalex-snapshot

Inducing chemical selectivity in the atomic layer deposition (ALD) of oxide films via gas-phase silylation using N-(trimethylsilyl)dimethylamine (TMSDMA)

inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.167696openalex-snapshot

Area-selective atomic layer deposition of ruthenium using O2 plasma-enhanced self-assembled monolayers

inferred← citeshttps://doi.org/10.1016/j.apsusc.2026.168274openalex-snapshot

Inherent area-selective atomic layer deposition of ZnO films on SiO2 over metals as non-growth substrates

inferred← citeshttps://doi.org/10.1016/j.ccr.2026.217768openalex-snapshot

Advances in area-selective atomic layer deposition: surface chemistry, challenges, and future perspectives

inferred← citeshttps://doi.org/10.1016/j.cej.2024.150760openalex-snapshot

Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation

inferred← citeshttps://doi.org/10.1016/j.cej.2025.164236openalex-snapshot

Quantitative modeling of substrate velocity effects on deposition efficiency and precursor consumption in spatial ALD

inferred← citeshttps://doi.org/10.1016/j.ceramint.2025.04.001openalex-snapshot

High-quality BeO films fabricated using discrete feeding plasma-enhanced atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.ces.2026.123422openalex-snapshot

Multiscale modeling of area-selective atomic layer deposition of SiO2 on Al2O3 and SiO2 surfaces with intermediate etching steps

inferred← citeshttps://doi.org/10.1016/j.cherd.2022.09.051openalex-snapshot

Atomistic-mesoscopic modeling of area-selective thermal atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.cherd.2023.06.057openalex-snapshot

Multi-objective optimization for inherently selective atomic layer deposition of zirconia on silicon and not on copper

inferred← citeshttps://doi.org/10.1016/j.cinorg.2025.100100openalex-snapshot

A review of coating tin oxide electron transport layer for optimizing the performance of perovskite solar cells

inferred← citeshttps://doi.org/10.1016/j.commatsci.2022.111919openalex-snapshot

Growth mechanism study of boron nitride atomic layer deposition by experiment and density functional theory

inferred← citeshttps://doi.org/10.1016/j.compchemeng.2023.108400openalex-snapshot

Computational fluid dynamics modeling of a discrete feed atomic layer deposition reactor: Application to reactor design and operation

inferred← citeshttps://doi.org/10.1016/j.dche.2026.100324openalex-snapshot

Run-to-Run control of Area-Selective Atomic Layer Deposition of SiO2 on Al2O3 and SiO2 surfaces with intermediate etching steps

inferred← citeshttps://doi.org/10.1016/j.fuel.2021.122584openalex-snapshot

Deposition of Pt clusters onto MOFs-derived CeO2 by ALD for selective hydrogenation of furfural

inferred← citeshttps://doi.org/10.1016/j.ica.2021.120782openalex-snapshot

From metal vapor to supported single atoms, clusters and nanoparticles: Recent advances to heterogeneous catalysts

inferred← citeshttps://doi.org/10.1016/j.ijmachtools.2024.104173openalex-snapshot

Area selective deposition for bottom-up atomic-scale manufacturing

inferred← citeshttps://doi.org/10.1016/j.inoche.2025.115787openalex-snapshot

Hafnium disulfide dichalcogenide material: A review of structural insights, functional properties, applications and future directions

inferred← citeshttps://doi.org/10.1016/j.jallcom.2025.185360openalex-snapshot

All-Photonic Tunable Molecular Transistor Analog Based on Trivalent Lanthanide Ions Luminescence

inferred← citeshttps://doi.org/10.1016/j.jcat.2021.09.015openalex-snapshot

Identifying higher oxygenate synthesis sites in Cu catalysts promoted and stabilized by atomic layer deposited Fe2O3

inferred← citeshttps://doi.org/10.1016/j.jpowsour.2022.232154openalex-snapshot

Area-selective atomic layer deposition of titanium oxide and nitride on vertically aligned carbon nanotubes patterned by Aerosol Jet Printing for 3D Microsupercapacitors

inferred← citeshttps://doi.org/10.1016/j.matchemphys.2024.130145openalex-snapshot

Optimization of atomic layer deposited Pt-shell thickness of PtCu3@Pt/C catalyst for oxygen reduction reaction

inferred← citeshttps://doi.org/10.1016/j.mcat.2024.114013openalex-snapshot

Effect of loading method on catalytic performance of Pt/CeO2 system for CO oxidation

inferred← citeshttps://doi.org/10.1016/j.mee.2022.111888openalex-snapshot

Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

inferred← citeshttps://doi.org/10.1016/j.mee.2023.112001openalex-snapshot

Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer

inferred← citeshttps://doi.org/10.1016/j.mejo.2026.107092openalex-snapshot

Investigation of convex/concave channel shaping with confined charge trap nitride for high-reliability 3D NAND flash applications

inferred← citeshttps://doi.org/10.1016/j.memsci.2026.126137openalex-snapshot

Precise modulation of ion-ion selectivity in nanoporous graphene membranes using atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.mssp.2022.107258openalex-snapshot

Low-resistivity ruthenium metal thin films grown via atomic layer deposition using dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium(II) and oxygen

inferred← citeshttps://doi.org/10.1016/j.nwnano.2024.100048openalex-snapshot

Preventing unwanted atomic layer deposition by liquid sealing

inferred← citeshttps://doi.org/10.1016/j.scib.2020.01.016openalex-snapshot

Surface functionalization on nanoparticles via atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.solmat.2022.111869openalex-snapshot

Temporal and spatial atomic layer deposition of Al-doped zinc oxide as a passivating conductive contact for silicon solar cells

inferred← citeshttps://doi.org/10.1016/j.surfcoat.2026.133341openalex-snapshot

Advancing atomic layer deposition through artificial intelligence: Generative modeling and predictive analytics for TiO2 growth rate prediction from TDMAT/O3

inferred← citeshttps://doi.org/10.1016/j.surfin.2022.102280openalex-snapshot

Inhibitory property of lithium phosphorus oxynitride surface grown by atomic layer deposition

inferred← citeshttps://doi.org/10.1016/j.surfin.2023.103477openalex-snapshot

Atomic layer deposition of TiO2 nanolayer coated Vectran fabrics with enhanced UV-blocking performance and structural colors

inferred← citeshttps://doi.org/10.1016/j.surfin.2025.106588openalex-snapshot

Area-selective atomic layer deposition of Al2O3 thin films for metal versus dielectric selectivity using vapor-dosed alkanethiols

inferred← citeshttps://doi.org/10.1016/j.surfin.2025.107552openalex-snapshot

Tailoring surface chemistry for area-selective HfO2 films: Experimental and DFT insights

inferred← citeshttps://doi.org/10.1016/j.surfin.2025.108196openalex-snapshot

Photocatalytic TiO2 surface combined with lithography defined area-selective deposition of Ru: Selectivity and defect formation mechanisms

inferred← citeshttps://doi.org/10.1016/j.surfin.2026.108519openalex-snapshot

Area-selective atomic layer deposition of TiO₂ on ZnO using stearic acid monolayers: insights into selectivity loss using friction force microscopy for growth inhibition studies

inferred← citeshttps://doi.org/10.1016/j.susc.2019.121479openalex-snapshot

Influence of surface etching and oxidation on the morphological growth of Al2O3 by ALD

inferred← citeshttps://doi.org/10.1016/j.susc.2024.122580openalex-snapshot

H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum

inferred← citeshttps://doi.org/10.1016/j.susc.2025.122711openalex-snapshot

Adsorption of trimethylaluminum on period 4 and 5 transition metal surfaces

inferred← citeshttps://doi.org/10.1016/j.vacuum.2021.110686openalex-snapshot

Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silicon without deposition on copper: The role of precursor

inferred← citeshttps://doi.org/10.1021/acs.accounts.5c00316openalex-snapshot

Design and Engineering of Semiconductor–Organic Interfaces: Multilayer Synthesis on the Si(001) Surface Based on Cyclooctyne Chemistry

inferred← citeshttps://doi.org/10.1021/acs.accounts.8b00012openalex-snapshot

The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c00722openalex-snapshot

Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c00838openalex-snapshot

A Selective Toolbox for Nanofabrication

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c00898openalex-snapshot

Area-Selective Molecular Layer Deposition of Polyimide on Cu through Cu-Catalyzed Formation of a Crystalline Interchain Polyimide

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c01379openalex-snapshot

Vacuum Ultraviolet-Enhanced Oxidation—A Route to the Atomic Layer Etching of Palladium Metal

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c02370openalex-snapshot

Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c02588openalex-snapshot

Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c02798openalex-snapshot

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c03335openalex-snapshot

ZrO2 Monolayer as a Removable Etch Stop Layer for Thermal Al2O3 Atomic Layer Etching Using Hydrogen Fluoride and Trimethylaluminum

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c03668openalex-snapshot

Area-Selective Molecular Layer Deposition of a Silicon Oxycarbide Low- k Dielectric

inferred← citeshttps://doi.org/10.1021/acs.chemmater.0c04718openalex-snapshot

Role of Precursor Choice on Area-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.1c00823openalex-snapshot

Atomic Layer Nucleation Engineering: Inhibitor-Free Area-Selective Atomic Layer Deposition of Oxide and Nitride

inferred← citeshttps://doi.org/10.1021/acs.chemmater.1c01507openalex-snapshot

Atomic Layer Deposition of Iron, Cobalt, and Nickel Chalcogenides: Progress and Outlook

inferred← citeshttps://doi.org/10.1021/acs.chemmater.1c03436openalex-snapshot

Area-Selective Deposition of Tantalum Nitride with Polymerizable Monolayers: From Liquid to Vapor Phase Inhibitors

inferred← citeshttps://doi.org/10.1021/acs.chemmater.2c00851openalex-snapshot

Surface Acidity-Induced Inherently Selective Atomic Layer Deposition of Tantalum Oxide on Dielectrics

inferred← citeshttps://doi.org/10.1021/acs.chemmater.2c00854openalex-snapshot

Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer

inferred← citeshttps://doi.org/10.1021/acs.chemmater.2c02084openalex-snapshot

Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β-Diketonate Precursors

inferred← citeshttps://doi.org/10.1021/acs.chemmater.2c03046openalex-snapshot

Inhibitor-Free Area-Selective Atomic Layer Deposition with Feature Size Down to Nearly 10 nm

inferred← citeshttps://doi.org/10.1021/acs.chemmater.2c03476openalex-snapshot

Dimension Control of Platinum Nanostructures by Atomic Layer Deposition: From Surface Chemical Reactions to Applications

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c00525openalex-snapshot

Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c00530openalex-snapshot

Self-Aligned Nanopatterning and Controlled Lateral Growth by Dual-Material Orthogonal Area-Selective Deposition of Poly(3,4-ethylenedioxythiophene) and Tungsten

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c00589openalex-snapshot

Where Atomically Precise Catalysts, Optoelectronic Devices, and Quantum Information Technology Intersect: Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c00904openalex-snapshot

Area-Selective Atomic Layer Deposition of Al2O3 with a Methanesulfonic Acid Inhibitor

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c02525openalex-snapshot

Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO 2

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c03158openalex-snapshot

“Dual-Tone” Area-Selective Deposition: Selectivity Inversion of Polymer on Patterned Si/SiO2 Starting Surfaces

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c03161openalex-snapshot

HfO 2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer

inferred← citeshttps://doi.org/10.1021/acs.chemmater.3c03326openalex-snapshot

Theoretical Design Strategies for Area-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c00475openalex-snapshot

Area Selective Deposition of Ru on W/SiO2 Nanopatterns via Sequential Reactant Dosing and Thermal Defect Correction

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c01040openalex-snapshot

Selectivity between SiO2 and SiNx during Thermal Atomic Layer Etching Using Al(CH3)3/HF and Spontaneous Etching Using HF and Effect of HF + NH3 Codosing

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c01133openalex-snapshot

Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c01269openalex-snapshot

An Atomistic Picture of Buildup and Degradation Reactions in Area-Selective Atomic Layer Deposition with a Small Molecule Inhibitor

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c01329openalex-snapshot

Mechanistically Informed Strategies for Site-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c01773openalex-snapshot

Simultaneous Co-localized TiO2 Etching and W Atomic Layer Deposition Using WF6 as a Dual-Functional Reactant

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c02231openalex-snapshot

Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c02521openalex-snapshot

Area-Selective Molecular Layer Deposition of Alucone on Photoresist for Enhanced Pattern Transfer

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c02557openalex-snapshot

Accurately Computed Dimerization Trends of ALD Precursors and Their Impact on Surface Reactivity in Area-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c02902openalex-snapshot

Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c03092openalex-snapshot

Inhibitor-Free Area-Selective Deposition of Titanium Nitride

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c03238openalex-snapshot

HfO 2 Area Selective Deposition via Substrate-Dependent Area Selective Atomic Layer Etching

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c03316openalex-snapshot

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma

inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c03477openalex-snapshot

Computational Ab Initio Approaches for Area-Selective Atomic Layer Deposition: Methods, Status, and Perspectives

inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c01484openalex-snapshot

In Vacuo Studies on the Mechanism of Inherently Area-Selective Atomic Layer Deposition of Iridium

inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c01919openalex-snapshot

Atomic Layer Deposition on Particulate Materials from 1988 through 2023: A Quantitative Review of Technologies, Materials, and Applications

inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c02771openalex-snapshot

Illuminating the Challenges in Extreme Ultraviolet Patterning Materials

inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c03255openalex-snapshot

Area-Selective Atomic Layer Deposition of Ru Using Phenyl Silane Inhibitors: Comparison between Amino and Methoxy Head Groups

inferred← citeshttps://doi.org/10.1021/acs.chemmater.5c03271openalex-snapshot

Opportunities and Challenges of Machine Learning in Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.chemmater.6c00226openalex-snapshot

Scalable Inhibitor-Free Area-Selective Atomic Layer Deposition of High-Quality Nitride Films via Plasma-Driven Nucleation Engineering

inferred← citeshttps://doi.org/10.1021/acs.chemmater.6c00978openalex-snapshot

AI-Driven Inverse Design of Complex Oxide Thin Films for Semiconductor Devices: A Case Study of Hf–Zr–O

inferred← citeshttps://doi.org/10.1021/acs.chemmater.6c01198openalex-snapshot

Alcohol-Mediated Area-Selective Atomic Layer Deposition through Surface Chemical States Modulation

inferred← citeshttps://doi.org/10.1021/acs.chemmater.8b03852openalex-snapshot

Nucleation Enhancement and Area-Selective Atomic Layer Deposition of Ruthenium Using RuO4 and H2 Gas

inferred← citeshttps://doi.org/10.1021/acs.chemmater.9b00193openalex-snapshot

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

inferred← citeshttps://doi.org/10.1021/acs.chemmater.9b00654openalex-snapshot

The Era of Atomic Crafting

inferred← citeshttps://doi.org/10.1021/acs.chemmater.9b01143openalex-snapshot

Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2

inferred← citeshttps://doi.org/10.1021/acs.chemmater.9b02992openalex-snapshot

Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2

inferred← citeshttps://doi.org/10.1021/acs.chemmater.9b04647openalex-snapshot

Inherently Selective Atomic Layer Deposition and Applications

inferred← citeshttps://doi.org/10.1021/acs.jchemed.0c00558openalex-snapshot

Investigating the Relationship between Adhesion Forces and Surface Functionalization Using Atomic Force Microscopy

inferred← citeshttps://doi.org/10.1021/acs.jpca.3c04339openalex-snapshot

Area-Selective Deposition by Cyclic Adsorption and Removal of 1-Nitropropane

inferred← citeshttps://doi.org/10.1021/acs.jpcc.1c09544openalex-snapshot

Real-Time In Situ Parallel Detection of Elements and Molecules with TOFMS during ALD for Chemical Quality Control of Thin Films

inferred← citeshttps://doi.org/10.1021/acs.jpcc.1c10816openalex-snapshot

Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

inferred← citeshttps://doi.org/10.1021/acs.jpcc.2c01311openalex-snapshot

Selective Hydroxylation of In2O3 as A Route to Site-Selective Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.jpcc.2c04117openalex-snapshot

Effect of Nitrogen Doping and Oxidation of Graphene on the Deposition of Platinum from Trimethyl(methylcyclopentadienyl)platinum(IV)

inferred← citeshttps://doi.org/10.1021/acs.jpcc.2c06293openalex-snapshot

Atomic Layer Deposition of HfS2 on Oxide Interfaces: A Model Study on the Initial Nucleation Processes

inferred← citeshttps://doi.org/10.1021/acs.jpcc.3c00965openalex-snapshot

A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition

inferred← citeshttps://doi.org/10.1021/acs.jpcc.3c02262openalex-snapshot

Can We Rationally Design and Operate Spatial Atomic Layer Deposition Systems for Steering the Growth Regime of Thin Films?

inferred← citeshttps://doi.org/10.1021/acs.jpcc.3c03063openalex-snapshot

Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride

inferred← citeshttps://doi.org/10.1021/acs.jpcc.3c06772openalex-snapshot

Atomic Layer Deposition of HfS 2 on Functionalized Self-Assembled Monolayers on Ordered Oxide Surfaces: A Model Study under UHV Conditions

inferred← citeshttps://doi.org/10.1021/acs.jpcc.4c00601openalex-snapshot

Surface Dynamics of Selective Hydration of Rutile TiO2: A Kinetic Monte Carlo Approach

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