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Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor
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What this work says Outgoing claims: the papers this work cites, builds on, or argues with.
inferred cites → https://doi.org/10.1016/j.apsusc.2014.06.027 openalex-snapshot The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics
inferred cites → https://doi.org/10.1021/am200102y openalex-snapshot High-Performance Visible-Light-Driven SnS2/SnO2 Nanocomposite Photocatalyst Prepared via In situ Hydrothermal Oxidation of SnS2 Nanoparticles
inferred cites → https://doi.org/10.1021/am301601s openalex-snapshot Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering
inferred cites → https://doi.org/10.1021/am900838z openalex-snapshot Microstructural, Optical, and Electrical Properties of SnO Thin Films Prepared on Quartz via a Two-Step Method
inferred cites → https://doi.org/10.1021/cm403390j openalex-snapshot Reaction Chemistry during the Atomic Layer Deposition of Sc 2 O 3 and Gd 2 O 3 from Sc(MeCp) 3 , Gd( i PrCp) 3 , and H 2 O
inferred cites → https://doi.org/10.1021/cm503112v openalex-snapshot Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O
inferred cites → https://doi.org/10.1021/jacs.5b01994 openalex-snapshot Low-Temperature Solution-Processed Tin Oxide as an Alternative Electron Transporting Layer for Efficient Perovskite Solar Cells
inferred cites → https://doi.org/10.1021/la0500732 openalex-snapshot In Situ Quadrupole Mass Spectrometry Study of Atomic-Layer Deposition of ZrO2 Using Cp2Zr(CH3)2 and Water
inferred cites → https://doi.org/10.1038/srep09617 openalex-snapshot Low Temperature Processed Complementary Metal Oxide Semiconductor (CMOS) Device by Oxidation Effect from Capping Layer
inferred cites → https://doi.org/10.1063/1.3478213 openalex-snapshot Sputtering formation of p-type SnO thin-film transistors on glass toward oxide complimentary circuits
What points at this work Incoming claims: where this work appears in other papers’ reference lists and arguments.
inferred ← cites https://doi.org/10.1002/admi.202400262 openalex-snapshot Layer‐Engineered Functional Multilayer Thin‐Film Structures and Interfaces through Atomic and Molecular Layer Deposition
inferred ← cites https://doi.org/10.1002/aelm.202201202 openalex-snapshot The Significance of an In Situ ALD Al 2 O 3 Stacked Structure for p‐Type SnO TFT Performance and Monolithic All‐ALD‐Channel CMOS Inverter Applications
inferred ← cites https://doi.org/10.1002/jsid.886 openalex-snapshot High‐performance vacuum‐processed metal oxide thin‐film transistors: A review of recent developments
inferred ← cites https://doi.org/10.1016/j.surfin.2023.103726 openalex-snapshot Horizontally aligned ALD-SnO films grown on SiO2-passivated high-k HfO2 dielectrics for high-mobility and low-power P-channel thin-film transistor
inferred ← cites https://doi.org/10.1021/acs.chemmater.3c02223 openalex-snapshot Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
inferred ← cites https://doi.org/10.1021/acsami.0c21979 openalex-snapshot High Performance of Solution-Processed Amorphous p-Channel Copper-Tin-Sulfur-Gallium Oxide Thin-Film Transistors by UV/O 3 Photocuring
inferred ← cites https://doi.org/10.1021/acsami.1c06038 openalex-snapshot Highly Dense and Stable p-Type Thin-Film Transistor Based on Atomic Layer Deposition SnO Fabricated by Two-Step Crystallization
inferred ← cites https://doi.org/10.1021/acsami.2c02692 openalex-snapshot Understanding the “Anti-Catalyst” Effect with Added CoOx Water Oxidation Catalyst in Dye-Sensitized Photoelectrolysis Cells: Carbon Impurities in Nanostructured SnO2 Are the Culprit
inferred ← cites https://doi.org/10.1021/acsomega.1c05744 openalex-snapshot Novel Heteroleptic Tin(II) Complexes Capable of Forming SnO and SnO2 Thin Films Depending on Conditions Using Chemical Solution Deposition
inferred ← cites https://doi.org/10.1039/d1tc02703d openalex-snapshot Enhancement of electrical performance of atomic layer deposited SnO films via substrate surface engineering
inferred ← cites https://doi.org/10.1039/d2dt02562k openalex-snapshot SnO deposition via water based ALD employing tin( ii ) formamidinate: precursor characterization and process development
inferred ← cites https://doi.org/10.1039/d3se00222e openalex-snapshot Overcoming residual carbon-induced recombination in water-oxidation catalysis: combining a superior catalyst with low-carbon-content atomic layer deposition of SnO 2 for improved catalysis
inferred ← cites https://doi.org/10.1088/1361-6463/ad01c7 openalex-snapshot Impact of air exposure on growth rate and electrical properties of SnO2 thin films by atmospheric pressure spatial atomic layer deposition
inferred ← cites https://doi.org/10.1116/6.0000842 openalex-snapshot Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
inferred ← cites https://doi.org/10.32508/stdjns.v6i3.1182 openalex-snapshot Effect of the sputtering time on the characteristics of p-SnOx:Na films prepared by the reactive direct current magnetron sputtering method
inferred ← cites https://doi.org/10.3390/ma14030690 openalex-snapshot Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition
inferred ← cites https://doi.org/10.3390/nano12162859 openalex-snapshot Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnOx Films at Different Substrate Temperatures
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