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Surface Reaction Mechanisms during Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide

https://doi.org/10.1021/jp903669c
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What this work says

Outgoing claims: the papers this work cites, builds on, or argues with.

inferredcites →https://doi.org/10.1002/1521-3862(20020116)8:1<21::aid-cvde21>3.0.co;2-0openalex-snapshot
Reaction Mechanism Studies on Titanium Isopropoxide–Water Atomic Layer Deposition Process
inferredcites →https://doi.org/10.1002/cvde.200306289openalex-snapshot
Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water
inferredcites →https://doi.org/10.1002/cvde.200606546openalex-snapshot
Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
inferredcites →https://doi.org/10.1016/0040-6090(93)90172-lopenalex-snapshot
Growth of titanium dioxide thin films by atomic layer epitaxy
inferredcites →https://doi.org/10.1016/0390-6035(82)90059-1openalex-snapshot
Infrared spectroscopic identification of species arising from reactive adsorption of carbon oxides on metal oxide surfaces
inferredcites →https://doi.org/10.1016/j.apsusc.2003.10.053openalex-snapshot
TiO2 atomic layer deposition on ZrO2 particles using alternating exposures of TiCl4 and H2O
inferredcites →https://doi.org/10.1016/j.surfcoat.2007.04.076openalex-snapshot
Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films
inferredcites →https://doi.org/10.1016/s0039-6028(97)00863-7openalex-snapshot
Evidence for bicarbonate formation on vacuum annealed TiO2(110) resulting from a precursor-mediated interaction between CO2 and H2O
inferredcites →https://doi.org/10.1016/s0040-6090(00)00890-7openalex-snapshot
Effect of water dose on the atomic layer deposition rate of oxide thin films
inferredcites →https://doi.org/10.1016/s0166-9834(00)84358-4openalex-snapshot
FT-IR characterization of the surface acidity of different titanium dioxide anatase preparations
inferredcites →https://doi.org/10.1016/s0167-5729(02)00100-0openalex-snapshot
The surface science of titanium dioxide
inferredcites →https://doi.org/10.1016/s0169-4332(00)00274-9openalex-snapshot
Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
inferredcites →https://doi.org/10.1021/ac60218a034openalex-snapshot
Infrared Spectra of Transition Metal Alkoxides.
inferredcites →https://doi.org/10.1021/cm00032a023openalex-snapshot
Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin films
inferredcites →https://doi.org/10.1021/cm011046+openalex-snapshot
In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water
inferredcites →https://doi.org/10.1021/ic9709436openalex-snapshot
Vibrational Spectra and Molecular Association of Titanium Tetraisopropoxide
inferredcites →https://doi.org/10.1021/j100001a051openalex-snapshot
Photooxidation of CH3Cl on TiO2(110) Single Crystal and Powdered TiO2 Surfaces
inferredcites →https://doi.org/10.1021/j100221a014openalex-snapshot
Characterization of species adsorbed on oxidized and reduced anatase
inferredcites →https://doi.org/10.1021/j100679a007openalex-snapshot
Infrared study of the surface of titanium dioxides. I. Hydroxyl groups
inferredcites →https://doi.org/10.1021/j100679a008openalex-snapshot
Infrared study of the surface of titanium dioxides. II. Acidic and basic properties
inferredcites →https://doi.org/10.1021/j100823a011openalex-snapshot
INFRARED STUDIES OF THE SURFACE HYDROXYL GROUPS ON TITANIUM DIOXIDE, AND OF THE CHEMISORPTION OF CARBON MONOXIDE AND CARBON DIOXIDE
inferredcites →https://doi.org/10.1021/jp057437jopenalex-snapshot
FTIR Spectroscopy Combined with Isotope Labeling and Quantum Chemical Calculations to Investigate Adsorbed Bicarbonate Formation Following Reaction of Carbon Dioxide with Surface Hydroxyl Groups on Fe2O3and Al2O3
inferredcites →https://doi.org/10.1021/jp8028616openalex-snapshot
Surface Reaction Mechanisms during Ozone-Based Atomic Layer Deposition of Titanium Dioxide
inferredcites →https://doi.org/10.1021/jp804296aopenalex-snapshot
Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
inferredcites →https://doi.org/10.1021/jp9536763openalex-snapshot
Surface Chemistry for Atomic Layer Growth
inferredcites →https://doi.org/10.1021/jp9844718openalex-snapshot
Interaction of Carbon Monoxide with Anatase Surfaces at High Temperatures: Optimization of a Carbon Monoxide Sensor
inferredcites →https://doi.org/10.1021/la001723zopenalex-snapshot
Investigation of CO and CO2 Adsorption on Tetragonal and Monoclinic Zirconia
inferredcites →https://doi.org/10.1063/1.1427430openalex-snapshot
Infrared response of vitreous titanium dioxide films with anatase short-range order
inferredcites →https://doi.org/10.1063/1.1560858openalex-snapshot
Determination of texture by infrared spectroscopy in titanium oxide–anatase thin films
inferredcites →https://doi.org/10.1063/1.1812832openalex-snapshot
High dielectric constant TiO2 thin films on a Ru electrode grown at 250 °C by atomic-layer deposition
inferredcites →https://doi.org/10.1063/1.1940727openalex-snapshot
Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
inferredcites →https://doi.org/10.1063/1.2940598openalex-snapshot
Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy
inferredcites →https://doi.org/10.1080/05704926708547582openalex-snapshot
Internal Reflection Spectroscopy
inferredcites →https://doi.org/10.1088/0022-3727/42/7/073001openalex-snapshot
In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
inferredcites →https://doi.org/10.1088/0268-1242/20/8/043openalex-snapshot
Dielectric and infrared properties of TiO 2 films containing anatase and rutile
inferredcites →https://doi.org/10.1149/1.1805502openalex-snapshot
Characteristics of TiO[sub 2] Films Prepared by ALD With and Without Plasma
inferredcites →https://doi.org/10.1149/1.2737629openalex-snapshot
Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

What points at this work

Incoming claims: where this work appears in other papers’ reference lists and arguments.

inferred← citeshttps://doi.org/10.2139/ssrn.4602612openalex-extracted
Investigations of the Growth Mechanisms of Anatase Tio2 Thin Films Deposited by Pulsed Electron Cyclotron Wave Resonance Plasma at Low Substrate Temperature
inferred← citeshttps://doi.org/10.1002/9783527639915.ch4openalex-snapshot
Sol–Gel Chemistry and Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1002/9783527694822.ch1openalex-snapshot
Basics of Atomic Layer Deposition: Growth Characteristics and Conformality
inferred← citeshttps://doi.org/10.1002/cvde.201207033openalex-snapshot
Room‐Temperature ALD of Metal Oxide Thin Films by Energy‐Enhanced ALD
inferred← citeshttps://doi.org/10.1002/cvde.201207039openalex-snapshot
Atmospheric Pressure Plasma ALD of Titanium Oxide
inferred← citeshttps://doi.org/10.1002/cvde.201507196openalex-snapshot
Ozone‐Based Atomic Layer Deposition of Gd2O3 from Tris(isopropyl‐cyclopentadienyl)gadolinium: Growth Characteristics and Surface Chemistry
inferred← citeshttps://doi.org/10.1002/pssa.202400205openalex-snapshot
Ion Implantation‐Induced Bandgap Modifications in the ALD TiO2 Thin Films
inferred← citeshttps://doi.org/10.1007/978-3-030-80135-9_4openalex-snapshot
Thin Films Characterization and Metrology
inferred← citeshttps://doi.org/10.1007/978-3-319-75199-3_9openalex-snapshot
Functional Nanoporous Titanium Dioxide for Separation Applications: Synthesis Routes and Properties to Performance Analysis
inferred← citeshttps://doi.org/10.1007/978-3-642-54646-4_7openalex-snapshot
Functionalized Inorganic Membranes for High-Temperature CO2/N2 Separation
inferred← citeshttps://doi.org/10.1016/j.apsusc.2013.10.007openalex-snapshot
TiO2 anatase films obtained by direct liquid injection atomic layer deposition at low temperature
inferred← citeshttps://doi.org/10.1016/j.apsusc.2015.09.062openalex-snapshot
Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma
inferred← citeshttps://doi.org/10.1016/j.apsusc.2017.05.264openalex-snapshot
In situ infrared spectroscopy study of the surface reactions during the atomic layer deposition of TiO2 on GaAs (100) surfaces
inferred← citeshttps://doi.org/10.1016/j.ccr.2013.06.015openalex-snapshot
Energy-enhanced atomic layer deposition for more process and precursor versatility
inferred← citeshttps://doi.org/10.1016/j.ceramint.2018.09.263openalex-snapshot
Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor
inferred← citeshttps://doi.org/10.1016/j.elecom.2009.11.026openalex-snapshot
Atomic layer deposition of TiO2 nanotubes and its improved electrostatic capacitance
inferred← citeshttps://doi.org/10.1016/j.molstruc.2010.03.087openalex-snapshot
Infrared and near-infrared spectroscopic probing of atomic layer deposition processes
inferred← citeshttps://doi.org/10.1016/j.surfcoat.2017.07.056openalex-snapshot
Room-temperature plasma-enhanced atomic layer deposition of ZnO: Film growth dependence on the PEALD reactor configuration
inferred← citeshttps://doi.org/10.1021/acs.chemmater.4c00667openalex-snapshot
Reactant-Dependent, 108× Conductivity Modulation in Plasma-Enhanced Atomic Layer Deposition for Black TiO2 Films
inferred← citeshttps://doi.org/10.1021/acs.chemmater.7b01358openalex-snapshot
Atomic Layer Deposition of SiCxNy Using Si2Cl6 and CH3NH2 Plasma
inferred← citeshttps://doi.org/10.1021/acs.jpcc.1c07980openalex-snapshot
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
inferred← citeshttps://doi.org/10.1021/acs.jpcc.6b09468openalex-snapshot
Probing the Interfacial Chemistry of Ultrathin ALD-Grown TiO2 Films: An In-Line XPS Study
inferred← citeshttps://doi.org/10.1021/acsaelm.0c00388openalex-snapshot
Enhancement of Dielectric Properties of Nanoscale HfO 2 Thin Films Via Atomic Layer Bombardment
inferred← citeshttps://doi.org/10.1021/acsami.5b01531openalex-snapshot
Low-Temperature Conformal Atomic Layer Deposition of SiN x Films Using Si 2 Cl 6 and NH 3 Plasma
inferred← citeshttps://doi.org/10.1021/acsami.5c18670openalex-snapshot
Area-Selective Atomic Layer Deposition of SiO 2 on SiO 2 with Alkanethiol Functionalized Cu as the Nongrowth Surface
inferred← citeshttps://doi.org/10.1021/acsami.8b01392openalex-snapshot
A Three-Step Atomic Layer Deposition Process for SiNx Using Si2Cl6, CH3NH2, and N2 Plasma
inferred← citeshttps://doi.org/10.1021/am200541popenalex-snapshot
In Situ Gas-Phase Hydrosilylation of Plasma-Synthesized Silicon Nanocrystals
inferred← citeshttps://doi.org/10.1021/cm103052topenalex-snapshot
Mechanism of Self-catalytic Atomic Layer Deposition of Silicon Dioxide Using 3-Aminopropyl Triethoxysilane, Water, and Ozone
inferred← citeshttps://doi.org/10.1021/cm400164aopenalex-snapshot
In Situ Infrared Spectroscopic Study of Atomic Layer-Deposited TiO 2 Thin Films by Nonaqueous Routes
inferred← citeshttps://doi.org/10.1021/jp1013303openalex-snapshot
Comparative Study of Titanium Dioxide Atomic Layer Deposition on Silicon Dioxide and Hydrogen-Terminated Silicon
inferred← citeshttps://doi.org/10.1021/jp907266copenalex-snapshot
Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
inferred← citeshttps://doi.org/10.1021/la101485aopenalex-snapshot
Surface Reaction Mechanisms during Ozone and Oxygen Plasma Assisted Atomic Layer Deposition of Aluminum Oxide
inferred← citeshttps://doi.org/10.1021/la201136kopenalex-snapshot
Influence of Surface Temperature on the Mechanism of Atomic Layer Deposition of Aluminum Oxide Using an Oxygen Plasma and Ozone
inferred← citeshttps://doi.org/10.1038/s41598-020-66409-8openalex-snapshot
Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
inferred← citeshttps://doi.org/10.1039/d0cp00395fopenalex-snapshot
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
inferred← citeshttps://doi.org/10.1039/d2cc01967aopenalex-snapshot
Extending growth inhibition during area-selective atomic layer deposition of Al 2 O 3 on aminosilane-functionalized SiO 2
inferred← citeshttps://doi.org/10.1063/1.4757907openalex-snapshot
Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
inferred← citeshttps://doi.org/10.1063/5.0102518openalex-snapshot
A toolbox for easy entry low wavenumber in situ atomic layer deposition transmission FTIR spectroscopy studies
inferred← citeshttps://doi.org/10.1063/5.0116732openalex-snapshot
Atomic layer deposition of conductive and semiconductive oxides
inferred← citeshttps://doi.org/10.1080/10408436.2012.693460openalex-snapshot
In SituStudies on Reaction Mechanisms in Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1088/0268-1242/27/7/074010openalex-snapshot
In situALD experiments with synchrotron radiation photoelectron spectroscopy
inferred← citeshttps://doi.org/10.1088/0957-4484/26/2/024003openalex-snapshot
Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
inferred← citeshttps://doi.org/10.1088/0957-4484/27/30/305701openalex-snapshot
Relationships among growth mechanism, structure and morphology of PEALD TiO 2 films: the influence of O 2 plasma power, precursor chemistry and plasma exposure mode
inferred← citeshttps://doi.org/10.1088/1361-6463/abbc98openalex-snapshot
Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films
inferred← citeshttps://doi.org/10.1088/1361-6641/aa78ceopenalex-snapshot
Titanium dioxide thin films by atomic layer deposition: a review
inferred← citeshttps://doi.org/10.1116/1.3609974openalex-snapshot
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
inferred← citeshttps://doi.org/10.1116/1.3625565openalex-snapshot
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
inferred← citeshttps://doi.org/10.1116/1.3669522openalex-snapshot
Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozone
inferred← citeshttps://doi.org/10.1116/1.3670404openalex-snapshot
In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.3683057openalex-snapshot
Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
inferred← citeshttps://doi.org/10.1116/1.4798385openalex-snapshot
Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
inferred← citeshttps://doi.org/10.1116/1.4831915openalex-snapshot
Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
inferred← citeshttps://doi.org/10.1116/1.4922588openalex-snapshot
Low temperature temporal and spatial atomic layer deposition of TiO2 films
inferred← citeshttps://doi.org/10.1116/1.4973923openalex-snapshot
Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
inferred← citeshttps://doi.org/10.1116/1.5043309openalex-snapshot
Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
inferred← citeshttps://doi.org/10.1116/1.5113631openalex-snapshot
Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
inferred← citeshttps://doi.org/10.1143/jjap.51.031102openalex-snapshot
In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2 on Silicon Substrate
inferred← citeshttps://doi.org/10.1149/1.3301664openalex-snapshot
Conformality of Al[sub 2]O[sub 3] and AlN Deposited by Plasma-Enhanced Atomic Layer Deposition
inferred← citeshttps://doi.org/10.1186/s11671-015-0790-xopenalex-snapshot
Structure and photoluminescence of the TiO2 films grown by atomic layer deposition using tetrakis-dimethylamino titanium and ozone
inferred← citeshttps://doi.org/10.1366/13-06995openalex-snapshot
Time-Resolved Surface Infrared Spectroscopy during Atomic Layer Deposition
inferred← citeshttps://doi.org/10.3389/fmech.2020.551085openalex-snapshot
An Experimental and Theoretical Study of the Impact of the Precursor Pulse Time on the Growth Per Cycle and Crystallinity Quality of TiO2 Thin Films Grown by ALD and PEALD Technique
inferred← citeshttps://doi.org/10.3390/ma13132931openalex-snapshot
Atmospheric Pressure Plasma Deposition of TiO2: A Review
inferred← citeshttps://doi.org/10.3390/ma8115425openalex-snapshot
Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
inferred← citeshttps://doi.org/10.7567/jjap.51.031102openalex-snapshot
In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2on Silicon Substrate
inferred← citeshttps://doi.org/10.7567/jjap.57.06ja01openalex-snapshot
Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?
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