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Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering
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What this work says
Outgoing claims: the papers this work cites, builds on, or argues with.
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Pulsed rf magnetron sputtered alumina thin films
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XPS study of sputtered alumina thin films
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Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering
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DC breakdown characteristics of high temperature polymer films
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Dielectric breakdown of polyimide films: Area, thickness and temperature dependence
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inferredcites →https://doi.org/10.1142/s2010135x13500173openalex-snapshot
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Synthesis of α-Al 2 O 3 thin films using reactive high-power impulse magnetron sputtering
What points at this work
Incoming claims: where this work appears in other papers’ reference lists and arguments.
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Dense Al2o3 Films Prepared by High Power Impulse Magnetron Sputtering at Pulsed Kv Bias
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Room Temperature Wafer Bonding of Glass Using Aluminum Oxide Intermediate Layer
inferred← citeshttps://doi.org/10.1016/j.apsusc.2019.06.202openalex-snapshot
Layered Al2O3-SiO2 and Al2O3-Ta2O5 thin-film composites for high dielectric strength, deposited by pulsed direct current and radio frequency magnetron sputtering
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