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Dense Al2o3 Films Prepared by High Power Impulse Magnetron Sputtering at Pulsed Kv Bias

https://doi.org/10.2139/ssrn.4838111
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inferredcites →https://doi.org/10.1016/j.electacta.2019.04.187openalex-extracted
Self-enhanced electrical performance and less defective electrode/film structure for Al2O3 capacitor via interfacial anodic oxidation
inferredcites →https://doi.org/10.1016/j.surfcoat.2006.01.033openalex-extracted
Structure-property correlations in aluminum oxide thin films grown by reactive AC magnetron sputtering
inferredcites →https://doi.org/10.1016/j.surfcoat.2007.05.061openalex-extracted
Pulsed DC magnetron sputtered Al2O3 films and their hardness
inferredcites →https://doi.org/10.1016/j.surfcoat.2008.05.034openalex-extracted
TEM investigation of alpha alumina films deposited at low temperature
inferredcites →https://doi.org/10.1016/j.surfcoat.2023.129648openalex-extracted
Tuning the characteristics of Al2O3 thin films using different pulse configurations: Mid-frequency, high-power impulse magnetron sputtering, and their combination
inferredcites →https://doi.org/10.1016/j.tsf.2007.08.123openalex-extracted
Hysteresis-free reactive high power impulse magnetron sputtering
inferredcites →https://doi.org/10.1016/j.tsf.2014.07.053openalex-extracted
Structural, optical and mechanical properties of amorphous and crystalline alumina thin films
inferredcites →https://doi.org/10.1016/j.tsf.2018.07.004openalex-extracted
Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering
inferredcites →https://doi.org/10.1016/j.tsf.2023.139893openalex-extracted
On the relationship between texture characteristics and residual stress levels: An X-ray diffraction study on α-Al2O3 hard coatings
inferredcites →https://doi.org/10.1016/j.tsf.2023.140135openalex-extracted
Effects of deposition temperature on the mechanical and structural properties of amorphous Al–Si–O thin films prepared by radio frequency magnetron sputtering
inferredcites →https://doi.org/10.1016/j.vacuum.2011.08.006openalex-extracted
Etch characteristics of TiN/Al2O3 thin film by using a Cl2/Ar adaptive coupled plasma
inferredcites →https://doi.org/10.1016/j.vacuum.2014.07.024openalex-extracted
Nanopattern formation in UV laser treated a-AlOx and nc-Al/AlOx layers
inferredcites →https://doi.org/10.1016/j.vacuum.2018.01.009openalex-extracted
Low-temperature deposition of nanocrystalline Al2O3 films by ion source-assisted magnetron sputtering
inferredcites →https://doi.org/10.1016/j.vacuum.2019.04.060openalex-extracted
Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering
inferredcites →https://doi.org/10.1016/j.vacuum.2021.110741openalex-extracted
A novel and efficient technology of depositing Al2O3 film for OLEDs thin film encapsulation
inferredcites →https://doi.org/10.1016/s0257-8972(99)00087-0openalex-extracted
Deposition of aluminium oxide thin films by reactive magnetron sputtering
inferredcites →https://doi.org/10.1039/b419153fopenalex-extracted
Sol–gel coatings for corrosion protection of metals
inferredcites →https://doi.org/10.1063/1.4799199openalex-extracted
Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
inferredcites →https://doi.org/10.1080/10408436.2021.1922357openalex-extracted
A review of recent developments in aluminum gallium oxide thin films and devices
inferredcites →https://doi.org/10.1116/1.4709451openalex-extracted
Characterization studies of aluminum oxide barrier coatings on polymeric substrates
inferredcites →https://doi.org/10.1116/1.5143273openalex-extracted
Synthesis of AlOx thin films by atmospheric-pressure mist chemical vapor deposition for surface passivation and electrical insulator layers
inferredcites →https://doi.org/10.1116/1.581669openalex-extracted
Control of the structure and properties of aluminum oxide coatings deposited by pulsed magnetron sputtering
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