Molecular Orbital Studies of Zinc Oxide Chemical Vapor Deposition: Gas-Phase Hydrolysis of Diethyl Zinc, Elimination Reactions, and Formation of Dimers and Tetramers
Inferred edges come from two machine sources: sweeps of open repository
metadata (mostly SSRN and Zenodo), and a bulk OpenAlex citation snapshot. Every row below is
labelled with the one it came from. Neither is a complete citation index — absence here is not
evidence of absence.
Is this your work? Sign in with ORCID and put your name on the
claims that are yours.
Reference health. See whether every reference in this work resolves to a
known work and none has been retracted — and get a dated CiteStamped
badge you can embed.
Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition: TiClm(NH2)n, TiClm(NH2)nNH, and TiClm(NH2)nN. An ab Initio Molecular Orbital Study
DFT Study on the Gas‐Phase Potential Energy Surface Crossing Mechanism of ZnO Formation from Diethylzinc and Triplet Oxygen during Metal‐Organic Chemical Vapor Deposition
Determination of the surface reactivity of growth species in the AP-MOCVD of ZnO from DEZ and H2O and thermal analysis of the “captured” intermediate species
Inference on the Production Mechanism of ZnO Thin Films from Activated Water and Dimethylzinc Molecules
Editorial review for independent work. ICSAC — the Institute for Complexity
Science and Advanced Computing — runs a structured editorial panel for researchers
publishing outside journals, and publishes on CiteStamp rails. Submission is free
and goes through ORCID: icsacinstitute.org/submit.